公开(公告)号：US20110011991A1

公开(公告)日：2011-01-20

申请号：US12666614

申请日：2009-11-06

Applicant: Ki-Beom Lee

Inventor： Ki-Beom Lee

IPC: F16M11/24

CPC classification number: D06F57/08 ,  D06F81/04

Abstract: Disclosed herein is a height adjustment apparatus which is constructed such that the height of an upper board placed thereon is easily adjusted only by lifting the upper board. To achieve the above-mentioned purpose, the height adjustment apparatus includes an actuating unit which controls the height of the apparatus, and a frame unit which is coupled to the actuating unit and is adjusted in height by contraction or extension.

Abstract translation: 这里公开了一种高度调节装置，其被构造成仅通过提升上板容易地调节放置在其上的上板的高度。 为了实现上述目的，高度调节装置包括控制装置的高度的致动单元和联接到致动单元并且通过收缩或延伸来调节高度的框架单元。

公开(公告)号：US20090224777A1

公开(公告)日：2009-09-10

申请号：US12279066

申请日：2007-02-15

Applicant: Byung-Uk Kim ,  Ki-Beom Lee ,  Yong-Woo Kim ,  Mi-Sun Park ,  Jin-Sup Hong ,  Wy-Yong Kim

Inventor： Byung-Uk Kim ,  Ki-Beom Lee ,  Yong-Woo Kim ,  Mi-Sun Park ,  Jin-Sup Hong ,  Wy-Yong Kim

IPC: G01R31/302 ,  G06F19/00

CPC classification number: G02F1/1309

Abstract: A system for testing a flat panel display having a flat display panel assembly includes a testing stage for arranging tie flat display panel assembly, a measuring apparatus being disposed on the testing stage and for measuring a spectrum of a transmitted light passing through a measuring region of the flat display panel assembly from a light source, a transporting apparatus for moving the measuring apparatus at a constant acceleration on the testing stage, a defect informing apparatus being electrically connected to the measuring apparatus and for informing an existence of defect, a type of defect, and a severity of defect by processing an electrical signal of the spectrum transmitted from the measuring apparatus.

Abstract translation: 一种用于测试具有平面显示面板组件的平板显示器的系统，包括用于布置平面显示面板组件的测试台，测量装置设置在测试台上，并用于测量通过测量区域的测量区域的透射光的光谱 来自光源的平面显示面板组件，用于在测试台上以恒定加速度移动测量装置的传送装置，与测量装置电连接并用于通知缺陷的存在的缺陷通知装置，缺陷的类型 以及通过处理从测量装置发送的频谱的电信号的缺陷的严重性。

公开(公告)号：US20080224092A1

公开(公告)日：2008-09-18

申请号：US12075966

申请日：2008-03-14

Applicant: Jong-Hyun CHOUNG ,  Hong-Sick PARK ,  Sun-Young HONG ,  Bong-Kyun KIM ,  Byeong-Jin LEE ,  Ji-Sun LEE ,  Ki-Beom LEE ,  Sam-Young CHO ,  Byung-Soo KU ,  Hyun-Cheol SHIN ,  Kwi-Hong PARK ,  Won-Guk SEO

Inventor： Jong-Hyun CHOUNG ,  Hong-Sick PARK ,  Sun-Young HONG ,  Bong-Kyun KIM ,  Byeong-Jin LEE ,  Ji-Sun LEE ,  Ki-Beom LEE ,  Sam-Young CHO ,  Byung-Soo KU ,  Hyun-Cheol SHIN ,  Kwi-Hong PARK ,  Won-Guk SEO

IPC: C09K13/08 ,  C09K13/00

CPC classification number: C23F1/14 ,  H01L21/32134

Abstract: An etchant for a metal is described. In one example, the etchant includes ammonium persulfate ((NH4)2S2O8), an azole compound and water. The etchant does not include hydrogen peroxide. Thus, the etchant may etch a metal layer including copper so that an etched copper layer has a tapered profile. Furthermore, the etchant may have a high stability to maintain etching ability for a longer time. Thus, manufacturing margins may be improved so that manufacturing costs may be reduced.

Abstract translation: 描述了金属的蚀刻剂。 在一个实例中，蚀刻剂包括过硫酸铵（（NH 3）2 S 2 O 2 O 8）， 唑化合物和水。 蚀刻剂不包括过氧化氢。 因此，蚀刻剂可以蚀刻包括铜的金属层，使得蚀刻的铜层具有锥形轮廓。 此外，蚀刻剂可能具有高的稳定性，以保持较长时间的蚀刻能力。 因此，可以提高制造裕度，从而可以降低制造成本。

公开(公告)号：US07307259B2

公开(公告)日：2007-12-11

申请号：US11075806

申请日：2005-03-10

Applicant: Ki-Beom Lee ,  Jae-Ku Lee ,  Mi-Sun Park ,  Jong-Min Kim ,  Min-Gun Lee

Inventor： Ki-Beom Lee ,  Jae-Ku Lee ,  Mi-Sun Park ,  Jong-Min Kim ,  Min-Gun Lee

IPC: G01J5/02

CPC classification number: G01N21/359 ,  G01N1/2035 ,  G01N21/05 ,  G03F7/00 ,  H01L21/67086 ,  Y10T436/12

Abstract: A system and a method for controlling the multi-component composition such as photoresist, stripper, developer, etchant, thinner, rinser/cleaner and etch bead remover, for a lithography process, which is used for manufacturing a semiconductor device, a liquid crystal display device and so on, are disclosed. The system includes a composition circulator for withdrawing the composition from a storage tank retaining the composition for a lithography process, and for recycling the withdrawn composition to the storage tank, through a flow cell; a composition analyzer for measuring an absorbance of the composition passing through the flow cell, and for calculating the concentration of at least one component of the composition from the measured absorbance; a component supplier for supplying a deficient component to the storage tank when a concentration of the deficient component is below a predetermined level; and a controller for controlling the component supplier to adjust the concentration of each component of the composition according to the absorbance.

Abstract translation: 用于制造半导体器件的光刻工艺的用于控制多组分组合物的系统和方法，例如光致抗蚀剂，剥离剂，显影剂，蚀刻剂，更薄的，清洗剂/清洁剂和蚀刻珠粒去除剂，液晶显示器 设备等，被公开。 该系统包括组合物循环器，用于从保留用于光刻工艺的组合物的储存容器中取出组合物，并通过流动池将抽出的组合物再循环到储罐; 用于测量通过流动池的组合物的吸光度并根据测量的吸光度计算组合物的至少一种组分的浓度的组成分析器; 当所述缺陷部件的浓度低于预定水平时，将供应不足的部件供应到所述储罐的部件供应器; 以及控制器，用于控制组件供应商根据吸光度调节组合物各组分的浓度。

公开(公告)号：US07112795B2

公开(公告)日：2006-09-26

申请号：US10276703

申请日：2001-03-27

Applicant: Ki-Beom Lee ,  Mi-Sun Park ,  Jong-Min Kim ,  Byung-Uk Kim ,  Chang-Il Oh

Inventor： Ki-Beom Lee ,  Mi-Sun Park ,  Jong-Min Kim ,  Byung-Uk Kim ,  Chang-Il Oh

IPC: G01J5/02

CPC classification number: G01N21/359 ,  C23F1/00 ,  C23F1/46 ,  G01N21/3577 ,  G11B23/505 ,  H01L21/32134

Abstract: In a method of controlling a metallic layer etching process for fabricating a semiconductor device or a liquid crystal display device, the composition of the etchant used in etching the metallic layer is first analyzed with the NIR spectrometer. The state of the etchant is then determined by comparing the analyzed composition with the reference composition. In case the life span of the etchant comes to an end, the etchant is replaced with a new etchant. By contrast, in case the life span of the etchant is left over, the etchant is delivered to the next metallic layer etching process. This analysis technique may be applied to the etchant regenerating process in a similar way.

Abstract translation: 在控制用于制造半导体器件或液晶显示器件的金属层蚀刻工艺的方法中，首先用NIR光谱仪分析用于蚀刻金属层的蚀刻剂的组成。 然后通过将分析的组合物与参考组合物进行比较来确定蚀刻剂的状态。 如果蚀刻剂的使用寿命终止，蚀刻剂将被新的蚀刻剂所取代。 相比之下，在蚀刻剂的寿命被遗留的情况下，蚀刻剂被输送到下一个金属层蚀刻工艺。 该分析技术可以以类似的方式应用于蚀刻剂再生过程。

公开(公告)号：US20050202564A1

公开(公告)日：2005-09-15

申请号：US11075806

申请日：2005-03-10

Applicant: Ki-Beom Lee ,  Jae-Ku Lee ,  Mi-Sun Park ,  Jong-Min Kim ,  Min-Gun Lee

Inventor： Ki-Beom Lee ,  Jae-Ku Lee ,  Mi-Sun Park ,  Jong-Min Kim ,  Min-Gun Lee

IPC: G03F7/32 ,  G01N1/20 ,  G03F7/00 ,  G03F7/26 ,  H01L21/027 ,  H01L21/306 ,  G01N35/08

CPC classification number: G01N21/359 ,  G01N1/2035 ,  G01N21/05 ,  G03F7/00 ,  H01L21/67086 ,  Y10T436/12

Abstract: A system and a method for controlling the multi-component composition such as photoresist, stripper, developer, etchant, thinner, rinser/cleaner and etch bead remover, for a lithography process, which is used for manufacturing a semiconductor device, a liquid crystal display device and so on, are disclosed. The system includes a composition circulator for withdrawing the composition from a storage tank retaining the composition for a lithography process, and for recycling the withdrawn composition to the storage tank, through a flow cell; a composition analyzer for measuring an absorbance of the composition passing through the flow cell, and for calculating the concentration of at least one component of the composition from the measured absorbance; a component supplier for supplying a deficient component to the storage tank when a concentration of the deficient component is below a predetermined level; and a controller for controlling the component supplier to adjust the concentration of each component of the composition according to the absorbance.

Abstract translation: 用于制造半导体器件的光刻工艺的用于控制多组分组合物的系统和方法，例如光致抗蚀剂，剥离剂，显影剂，蚀刻剂，更薄的，清洗剂/清洁剂和蚀刻珠粒去除剂，液晶显示器 设备等，被公开。 该系统包括组合物循环器，用于从保留用于光刻工艺的组合物的储存容器中取出组合物，并通过流动池将抽出的组合物再循环到储罐; 用于测量通过流动池的组合物的吸光度并根据测量的吸光度计算组合物的至少一种组分的浓度的组成分析器; 当所述缺陷部件的浓度低于预定水平时，将供应不足的部件供应到所述储罐的部件供应器; 以及控制器，用于控制组件供应商根据吸光度调节组合物各组分的浓度。

公开(公告)号：US08753920B2

公开(公告)日：2014-06-17

申请号：US13195444

申请日：2011-08-01

Applicant: Bo Sung Kim ,  Doo-Hyoung Lee ,  Yeon-Taek Jeong ,  Ki-Beom Lee ,  Young-Min Kim ,  Tae-Young Choi ,  Seon-Pil Jang ,  Kang-Moon Jo

Inventor： Bo Sung Kim ,  Doo-Hyoung Lee ,  Yeon-Taek Jeong ,  Ki-Beom Lee ,  Young-Min Kim ,  Tae-Young Choi ,  Seon-Pil Jang ,  Kang-Moon Jo

IPC: H01L21/36

CPC classification number: H01L21/02628 ,  H01L21/02554 ,  H01L21/02565

Abstract: Provided is a precursor composition for an oxide semiconductor. The precursor composition for the oxide semiconductor includes a metal complex compound formed by a metal ion and an organic ligand, wherein the precursor composition is represented by the following Formula 1. MAn   (Formula 1) Herein, M is a metal ion, A is an organic ligand which includes α-substituted carboxylate, and n is a natural number.

Abstract translation: 提供一种用于氧化物半导体的前体组合物。 用于氧化物半导体的前体组合物包括由金属离子和有机配体形成的金属络合物，其中前体组合物由下式1表示。MAn（式1）这里，M是金属离子，A是 包括α-取代的羧酸酯的有机配体，n是自然数。

公开(公告)号：US08262928B2

公开(公告)日：2012-09-11

申请号：US12777532

申请日：2010-05-11

Applicant: Bong-Kyun Kim ,  Jong-Hyun Choung ,  Byeong-Jin Lee ,  Sun-Young Hong ,  Hong-Sick Park ,  Shi-Yul Kim ,  Ki-Beom Lee ,  Sam-Young Cho ,  Sang-Woo Kim ,  Hyun-Cheol Shin ,  Won-Guk Seo

Inventor： Bong-Kyun Kim ,  Jong-Hyun Choung ,  Byeong-Jin Lee ,  Sun-Young Hong ,  Hong-Sick Park ,  Shi-Yul Kim ,  Ki-Beom Lee ,  Sam-Young Cho ,  Sang-Woo Kim ,  Hyun-Cheol Shin ,  Won-Guk Seo

IPC: H01L33/44 ,  C09K13/08

CPC classification number: C23F1/26 ,  C23F1/18 ,  H01L21/32134 ,  H01L27/124 ,  H01L29/458

Abstract: An etchant includes about 0.1 percent by weight to about 30 percent by weight of ammonium persulfate (NH4)2S2O8, about 0.1 percent by weight to about 10 percent by weight of an inorganic acid, about 0.1 percent by weight to about 10 percent by weight of an acetate salt, about 0.01 percent by weight to about 5 percent by weight of a fluorine-containing compound, about 0.01 percent by weight to about 5 percent by weight of a sulfonic acid compound, about 0.01 percent by weight to about 2 percent by weight of an azole compound, and a remainder of water. Accordingly, the etchant may have high stability to maintain etching ability. Thus, manufacturing margins may be improved so that manufacturing costs may be reduced.

Abstract translation: 蚀刻剂包括约0.1重量％至约30重量％的过硫酸铵（NH 4）2 S 2 O 8，约0.1重量％至约10重量％的无机酸，约0.1重量％至约10重量％的 约0.01重量％至约5重量％的含氟化合物的乙酸盐，约0.01重量％至约5重量％的磺酸化合物，约0.01重量％至约2重量％ 的唑类化合物，剩余的水。 因此，蚀刻剂可能具有高稳定性以保持蚀刻能力。 因此，可以提高制造裕度，从而可以降低制造成本。

公开(公告)号：US20110224335A1

公开(公告)日：2011-09-15

申请号：US13090895

申请日：2011-04-20

Applicant: Sung-Hee Kim ,  Soon-Sung Yoo ,  Jin-Wuk Kim ,  Byung-Geol Kim ,  Byung-Uk Kim ,  Ki-Beom Lee ,  Byong-Hoo Kim ,  Seung-Hyup Shin ,  Jun-Young Song ,  Myoung-Soo Lee

Inventor： Sung-Hee Kim ,  Soon-Sung Yoo ,  Jin-Wuk Kim ,  Byung-Geol Kim ,  Byung-Uk Kim ,  Ki-Beom Lee ,  Byong-Hoo Kim ,  Seung-Hyup Shin ,  Jun-Young Song ,  Myoung-Soo Lee

IPC: C09D11/10

CPC classification number: C09D11/02 ,  B82Y10/00 ,  B82Y40/00 ,  C09D11/033 ,  G03F7/0002

Abstract: Disclosed are an ink composition and a method for fabricating a liquid crystal display (LCD) device using the same, wherein in forming patterns of the LCD device using an imprint lithography and a roll printing, an ink composition with high thermal resistance, consisting of polymer resin and additive both endurable even at a high temperature is used to form fine patterns with constantly maintaining pattern linewidths and line intervals, the ink composition consisting of 5-45% by weight of polymer resin, 5-45% by weight of additive added to retain thermal stability, and 50-90% by weight of organic solvent, wherein the ink composition is endurable even at a high temperature of 90-250° C.

Abstract translation: 公开了一种使用其制造液晶显示（LCD）装置的油墨组合物和方法，其中在使用压印光刻和辊印刷形成LCD装置的图案时，具有由聚合物组成的高耐热性的油墨组合物 即使在高温下也能耐久的树脂和添加剂被用于形成精细图案，并且不断地保持图案线宽和线间隔，油墨组合物由5-45重量％的聚合物树脂组成，5-45重量％的添加剂添加到 保持热稳定性和50-90重量％的有机溶剂，其中油墨组合物即使在90-250℃的高温下也是耐久的。

公开(公告)号：US20200163240A1

公开(公告)日：2020-05-21

申请号：US16593167

申请日：2019-10-04

Applicant: Ki Beom LEE

Inventor： Ki Beom LEE

IPC: H05K5/02

Abstract: According to an embodiment of the present disclosure, there is provided a stand-holder for a portable terminal, the stand-holder comprising: a support portion fixed to a rear surface of the portable terminal; a holding portion; and a coupling portion operatively coupled to each of the support portion and the holding portion. The coupling portion and the support portion are operatively coupled to each other, such that the coupling portion is rotated relative to the support portion. The coupling portion and the holding portion are operatively coupled to each other, such that the holding portion is rotated relative to the coupling portion.