公开(公告)号：US20190058782A1

公开(公告)日：2019-02-21

申请号：US16135440

申请日：2018-09-19

Applicant: Ki Beom LEE

Inventor： Ki Beom LEE

IPC: H04M1/04 ,  H04M1/02

Abstract: According to an embodiment of the present disclosure, there is provided a stand-holder for a portable terminal, the stand-holder including: a support portion fixed to a rear surface of the portable terminal; a holding portion; and a coupling portion configured to couple the support portion and the holding portion, and having both ends.One of the both ends of the coupling portion is rotatably coupled to the support portion to be rotatable relative to the support portion, and the other end of the coupling portion is coupled to the holding portion to enable the holding portion to be rotated.

公开(公告)号：US09481535B2

公开(公告)日：2016-11-01

申请号：US13435626

申请日：2012-03-30

Applicant: Sang-Mi Kim ,  Gug Rae Jo ,  Jae Hyuk Chang ,  Seung-Jun Lee ,  Seung-Min Lee ,  Dae-Young Lee ,  Ki-Beom Lee

Inventor： Sang-Mi Kim ,  Gug Rae Jo ,  Jae Hyuk Chang ,  Seung-Jun Lee ,  Seung-Min Lee ,  Dae-Young Lee ,  Ki-Beom Lee

IPC: D06B23/18 ,  C23C16/54 ,  C23C14/56 ,  B65H18/10 ,  B01J3/02 ,  B01J3/03 ,  B05C11/115

CPC classification number: B65H18/103 ,  B01J3/02 ,  B01J3/03 ,  B05C11/115 ,  B65H2301/41487 ,  B65H2801/61 ,  C23C14/562 ,  C23C14/564 ,  C23C14/568 ,  C23C16/545 ,  D06B23/18

Abstract: A vacuum roll-to-roll device includes: a first chamber; a second chamber neighboring the first chamber; a shutter disposed between the first chamber and the second chamber; a sealing member attached to the shutter; and a roll-type substrate which moves from the first chamber to the second chamber through the sealing member. A thickness of a lateral side of the roll-type substrate decreases in a direction toward an edge thereof.

Abstract translation: 真空卷对卷装置包括：第一室; 邻近第一室的第二室; 设置在所述第一室和所述第二室之间的快门; 附接到所述活门的密封构件; 以及通过密封构件从第一室移动到第二室的辊型基板。 辊型基板的侧面的厚度在朝向其边缘的方向上减小。

公开(公告)号：US20130224455A1

公开(公告)日：2013-08-29

申请号：US13540209

申请日：2012-07-02

Applicant: SEUNG-MIN LEE ,  Hyeong-Suk Yoo ,  Ki-Beom Lee ,  Seung-Jun Lee ,  Jae-Hyuk Chang

Inventor： SEUNG-MIN LEE ,  Hyeong-Suk Yoo ,  Ki-Beom Lee ,  Seung-Jun Lee ,  Jae-Hyuk Chang

IPC: B32B7/02 ,  B32B27/08 ,  C23C14/34 ,  B32B27/06 ,  B05D5/06 ,  C23C16/44

CPC classification number: C23C16/40 ,  B05D1/60 ,  B05D7/04 ,  C23C14/06 ,  C23C14/08 ,  C23C14/12 ,  C23C16/30 ,  Y10T428/2495 ,  Y10T428/31667 ,  Y10T428/31786 ,  Y10T428/31797 ,  Y10T428/31913

Abstract: A method for manufacturing a display substrate includes forming a plastic base substrate. A blocking layer is formed on a surface of the plastic base substrate by depositing a first material and a second material that are distinct. A substrate includes a plastic base substrate and a blocking layer formed at surfaces of the plastic base substrate and having a first layer and a second layer alternatingly. The first layer and second layer include continuously changing component ratio of a first material to a second material. The blocking layer effectively blocks moisture and/or oxygen.

Abstract translation: 一种显示基板的制造方法，包括形成塑料基板。 通过沉积不同的第一材料和第二材料，在塑料基材的表面上形成阻挡层。 基板包括塑料基底基板和形成在塑料基底表面上并且交替地具有第一层和第二层的阻挡层。 第一层和第二层包括第一材料与第二材料的连续变化的组分比。 阻挡层有效地阻止水分和/或氧气。

公开(公告)号：US08354288B2

公开(公告)日：2013-01-15

申请号：US13566239

申请日：2012-08-03

Applicant: Bong-Kyun Kim ,  Jong-Hyun Choung ,  Byeong-Jin Lee ,  Sun-Young Hong ,  Hong-Sick Park ,  Shi-Yul Kim ,  Ki-Beom Lee ,  Sam-Young Cho ,  Sang-Woo Kim ,  Hyun-Cheol Shin ,  Won-Guk Seo

Inventor： Bong-Kyun Kim ,  Jong-Hyun Choung ,  Byeong-Jin Lee ,  Sun-Young Hong ,  Hong-Sick Park ,  Shi-Yul Kim ,  Ki-Beom Lee ,  Sam-Young Cho ,  Sang-Woo Kim ,  Hyun-Cheol Shin ,  Won-Guk Seo

IPC: H01L21/461

CPC classification number: C23F1/26 ,  C23F1/18 ,  H01L21/32134 ,  H01L27/124 ,  H01L29/458

Abstract: An etchant includes about 0.1 percent by weight to about 30 percent by weight of ammonium persulfate (NH4)2S2O8, about 0.1 percent by weight to about 10 percent by weight of an inorganic acid, about 0.1 percent by weight to about 10 percent by weight of an acetate salt, about 0.01 percent by weight to about 5 percent by weight of a fluorine-containing compound, about 0.01 percent by weight to about 5 percent by weight of a sulfonic acid compound, about 0.01 percent by weight to about 2 percent by weight of an azole compound, and a remainder of water. Accordingly, the etchant may have high stability to maintain etching ability. Thus, manufacturing margins may be improved so that manufacturing costs may be reduced.

Abstract translation: 蚀刻剂包括约0.1重量％至约30重量％的过硫酸铵（NH 4）2 S 2 O 8，约0.1重量％至约10重量％的无机酸，约0.1重量％至约10重量％ 约0.01重量％至约5重量％的含氟化合物的乙酸盐，约0.01重量％至约5重量％的磺酸化合物，约0.01重量％至约2重量％ 的唑类化合物，剩余的水。 因此，蚀刻剂可能具有高稳定性以保持蚀刻能力。 因此，可以提高制造裕度，从而可以降低制造成本。

公开(公告)号：US20110226727A1

公开(公告)日：2011-09-22

申请号：US13032563

申请日：2011-02-22

Applicant: Nam-Seok SUH ,  Sun-Young HONG ,  Jong-Hyun CHOUNG ,  Bong-Kyun KIM ,  Hong-Sick PARK ,  Jean-Ho SONG ,  Wang-Woo LEE ,  Do-Won KIM ,  Sang-Woo KIM ,  Won-Guk SEO ,  Hyun-Cheol SHIN ,  Ki-Beom LEE ,  Sam-Young CHO

Inventor： Nam-Seok SUH ,  Sun-Young HONG ,  Jong-Hyun CHOUNG ,  Bong-Kyun KIM ,  Hong-Sick PARK ,  Jean-Ho SONG ,  Wang-Woo LEE ,  Do-Won KIM ,  Sang-Woo KIM ,  Won-Guk SEO ,  Hyun-Cheol SHIN ,  Ki-Beom LEE ,  Sam-Young CHO

IPC: C23F1/18 ,  H05K3/06 ,  C23F1/30 ,  C09K13/00

CPC classification number: C09K13/08 ,  C23F1/18 ,  C23F1/26 ,  C23F1/44 ,  H01L21/28088 ,  H01L21/32134 ,  H01L27/1214 ,  H01L27/124 ,  H05K3/067

Abstract: Exemplary embodiments of the present invention provide a metal wiring etchant. A metal wiring etchant according to an exemplary embodiment of the present invention includes ammonium persulfate, an organic acid, an ammonium salt, a fluorine-containing compound, a glycol-based compound, and an azole-based compound.

Abstract translation: 本发明的示例性实施方案提供金属线路蚀刻剂。 根据本发明的示例性实施方式的金属线蚀刻剂包括过硫酸铵，有机酸，铵盐，含氟化合物，二醇类化合物和唑类化合物。

公开(公告)号：US10806043B2

公开(公告)日：2020-10-13

申请号：US16593167

申请日：2019-10-04

Applicant: Ki Beom Lee

Inventor： Ki Beom Lee

IPC: H05K5/02

Abstract: According to an embodiment of the present disclosure, there is provided a stand-holder for a portable terminal, the stand-holder comprising: a support portion fixed to a rear surface of the portable terminal; a holding portion; and a coupling portion operatively coupled to each of the support portion and the holding portion. The coupling portion and the support portion are operatively coupled to each other, such that the coupling portion is rotated relative to the support portion. The coupling portion and the holding portion are operatively coupled to each other, such that the holding portion is rotated relative to the coupling portion.

公开(公告)号：US09133550B2

公开(公告)日：2015-09-15

申请号：US13433013

申请日：2012-03-28

Applicant: In-Bae Kim ,  Jong-Hyun Choung ,  Ji-Young Park ,  Seon-Il Kim ,  Jae-Woo Jeong ,  Sang Gab Kim ,  Sang-Woo Kim ,  Ki-Beom Lee ,  Dae-Woo Lee ,  Sam-Young Cho

Inventor： In-Bae Kim ,  Jong-Hyun Choung ,  Ji-Young Park ,  Seon-Il Kim ,  Jae-Woo Jeong ,  Sang Gab Kim ,  Sang-Woo Kim ,  Ki-Beom Lee ,  Dae-Woo Lee ,  Sam-Young Cho

IPC: C09K13/00 ,  C23F1/18 ,  C23F1/26 ,  H01L21/3213 ,  C09K13/08 ,  H01L27/12

CPC classification number: C23F1/18 ,  C09K13/08 ,  C23F1/26 ,  H01L21/32134 ,  H01L27/124

Abstract: An etching composition, a method of forming a metal pattern using the etching composition, and a method of manufacturing a display substrate are disclosed. The etching composition includes about 0.1% by weight to about 25% by weight of ammonium persulfate, about 0.1% by weight to about 25% by weight of an organic acid, about 0.01% by weight to about 5% by weight of a chelating agent, about 0.01% by weight to about 5% by weight of a fluoride compound, about 0.01% by weight to about 5% by weight of a chloride compound, about 0.01% by weight to about 2% by weight of an azole-based compound and a remainder of water. Thus, a copper layer may be stably etched to improve a reliability of manufacturing the metal pattern and the display substrate.

Abstract translation: 公开了一种蚀刻组合物，使用该蚀刻组合物形成金属图案的方法以及一种制造显示衬底的方法。 蚀刻组合物包含约0.1重量％至约25重量％的过硫酸铵，约0.1重量％至约25重量％的有机酸，约0.01重量％至约5重量％的螯合剂 ，约0.01重量％至约5重量％的氟化物，约0.01重量％至约5重量％的氯化物化合物，约0.01重量％至约2重量％的唑类化合物 和余下的水。 因此，可以稳定地蚀刻铜层以提高制造金属图案和显示基板的可靠性。

公开(公告)号：US08637399B2

公开(公告)日：2014-01-28

申请号：US13600392

申请日：2012-08-31

Applicant: Hong-Sick Park ,  Bong-Kyun Kim ,  Wang-Woo Lee ,  Ki-Beom Lee ,  Sam-Young Cho ,  Won-Guk Seo ,  Gyu-Po Kim

Inventor： Hong-Sick Park ,  Bong-Kyun Kim ,  Wang-Woo Lee ,  Ki-Beom Lee ,  Sam-Young Cho ,  Won-Guk Seo ,  Gyu-Po Kim

IPC: H01L21/311

CPC classification number: C09K13/06 ,  C23F1/18 ,  C23F1/34 ,  H01L21/32134

Abstract: An etching composition for a copper-containing layer includes about 0.1% to about 30% by weight of ammonium persulfate, about 0.1% to about 10% by weight of a sulfate, about 0.01% to about 5% by weight of an acetate and about 55% to about 99.79% by weight of water. The etching composition having improved stability during storage and an increased capacity for etching.

Abstract translation: 含铜层的蚀刻组合物包含约0.1％至约30％重量的过硫酸铵，约0.1％至约10％重量的硫酸盐，约0.01％至约5％重量的乙酸盐和约 55％至约99.79％的水。 蚀刻组合物在储存期间具有改进的稳定性和增加的蚀刻能力。

公开(公告)号：US20130115770A1

公开(公告)日：2013-05-09

申请号：US13600392

申请日：2012-08-31

Applicant: Hong-Sick Park ,  Bong-Kyun Kim ,  Wang-Woo Lee ,  Ki-Beom Lee ,  Sam-Young Cho ,  Won-Guk Seo ,  Gyu-Po Kim

Inventor： Hong-Sick Park ,  Bong-Kyun Kim ,  Wang-Woo Lee ,  Ki-Beom Lee ,  Sam-Young Cho ,  Won-Guk Seo ,  Gyu-Po Kim

IPC: C09K13/00 ,  H01L21/302

CPC classification number: C09K13/06 ,  C23F1/18 ,  C23F1/34 ,  H01L21/32134

Abstract: An etching composition for a copper-containing layer includes about 0.1% to about 30% by weight of ammonium persulfate, about 0.1% to about 10% by weight of a sulfate, about 0.01% to about 5% by weight of an acetate and about 55% to about 99.79% by weight of water. The etching composition having improved stability during storage and an increased capacity for etching

Abstract translation: 含铜层的蚀刻组合物包含约0.1％至约30％重量的过硫酸铵，约0.1％至约10％重量的硫酸盐，约0.01％至约5％重量的乙酸盐和约 55％至约99.79％的水。 蚀刻组合物在储存期间具有改进的稳定性和增加的蚀刻能力

公开(公告)号：US20120120362A1

公开(公告)日：2012-05-17

申请号：US13173457

申请日：2011-06-30

Applicant: Tae-Young CHOI ,  Bo Sung KIM ,  Young Min KIM ,  Seon-Pil JANG ,  Kang Moon JO ,  Yeon Taek JEONG ,  Ki Beom LEE

Inventor： Tae-Young CHOI ,  Bo Sung KIM ,  Young Min KIM ,  Seon-Pil JANG ,  Kang Moon JO ,  Yeon Taek JEONG ,  Ki Beom LEE

IPC: G02F1/1343 ,  H01L33/08 ,  H01L29/786

CPC classification number: H01L27/1225 ,  G02F1/13439 ,  G02F2001/13685 ,  G02F2001/1676

Abstract: A thin film transistor array panel includes a source electrode and a drain electrode on an insulating substrate, an oxide semiconductor on the insulating substrate and overlapping the source electrode and the drain electrode, a passivation layer overlapping the oxide semiconductor and on the insulating substrate, a gate electrode on the passivation layer, and a pixel electrode connected to the drain electrode. The gate electrode and the pixel electrode include a same material. The oxide semiconductor is between the source electrode and the gate electrode, and between the drain electrode and the gate electrode in a cross-sectional view of the thin film transistor array panel.

Abstract translation: 薄膜晶体管阵列面板包括绝缘基板上的源电极和漏电极，绝缘基板上的氧化物半导体与源电极和漏电极重叠，钝化层与氧化物半导体和绝缘基板上的重叠， 钝化层上的栅极电极和连接到漏电极的像素电极。 栅电极和像素电极包括相同的材料。 在薄膜晶体管阵列面板的截面图中，氧化物半导体位于源电极和栅电极之间，在漏电极和栅电极之间。