公开(公告)号：US20070153248A1

公开(公告)日：2007-07-05

申请号：US11687386

申请日：2007-03-16

Applicant: Yuhei Sumiyoshi

Inventor： Yuhei Sumiyoshi

IPC: G03B27/42

CPC classification number: G03F7/70233 ,  G03F7/70341 ,  G03F7/70983

Abstract: An exposure apparatus includes a illumination optical system for illuminating a reticle with light from a light source, and a projection optical system for projecting a pattern of the reticle onto an object, said projection optical system includes a lens closest to the object, wherein a surface on the object side of the lens is smaller than an effective area of a surface on the reticle side of the lens, and wherein said exposure apparatus exposes the object via a liquid that is filled in a space between the lens and the object.

Abstract translation: 曝光装置包括用于利用来自光源的光照射掩模版的照明光学系统和用于将掩模版的图案投射到物体上的投影光学系统，所述投影光学系统包括最靠近物体的透镜，其中表面 在透镜的物体侧上的距离小于透镜的掩模版面上的表面的有效面积，并且其中所述曝光装置经由填充在透镜和物体之间的空间中的液体曝光物体。

公开(公告)号：US6014455A

公开(公告)日：2000-01-11

申请号：US579583

申请日：1995-12-28

Applicant: Yuhei Sumiyoshi ,  Koji Mikami

Inventor： Yuhei Sumiyoshi ,  Koji Mikami

IPC: G02B7/02 ,  G02B13/24 ,  G02B15/14 ,  G02B27/00 ,  G02B27/18 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42

CPC classification number: G03F7/70241 ,  G02B15/14 ,  G02B27/0068 ,  G03F7/70258

Abstract: A projection exposure apparatus usable with a reticle having a pattern and a wafer onto which the pattern of the reticle is transferred. The apparatus includes an illumination system for illuminating the reticle, a projection optical system for projecting the pattern of the reticle onto the wafer, wherein the projection optical system includes two lens groups which are individually movable along an optical axis direction, but are not juxtaposed with each other, and a controller for simultaneously adjusting distortion and projection magnification of the pattern projected onto the wafer. The controller performs the adjustment such that the two lens groups of the projection optical system are moved separately along the optical axis direction.

Abstract translation: 可用于具有图案的掩模版和转印有掩模版图案的晶片的投影曝光装置。 该装置包括用于照亮标线的照明系统，用于将标线图案的图案投影到晶片上的投影光学系统，其中投影光学系统包括两个可沿着光轴方向单独移动的透镜组，但并不与 以及控制器，用于同时调整投影到晶片上的图案的变形和投影倍率。 控制器执行调整，使得投影光学系统的两个透镜组沿光轴方向分开移动。

公开(公告)号：US20100182577A1

公开(公告)日：2010-07-22

申请号：US12687997

申请日：2010-01-15

Applicant: Yuhei Sumiyoshi

Inventor： Yuhei Sumiyoshi

IPC: G03B27/68 ,  G02B13/18

CPC classification number: G03B27/68 ,  G02B27/0025 ,  G03F7/70308

Abstract: A projection optical system of the present invention includes an optical element group that includes optical elements, and a controller that drives at least one of the first optical elements. The optical element group includes aspheric surfaces having a complementary relationship with each other and are arranged so that the aspheric surfaces face each other. The controller changes a relative position between the optical elements in a first direction and a second direction orthogonal to the first direction to control optical performances of the projection optical system corresponding to each of the first direction and the second direction.

Abstract translation: 本发明的投影光学系统包括：包括光学元件的光学元件组;以及驱动所述第一光学元件中的至少一个的控制器。 光学元件组包括彼此具有互补关系的非球面表面，并且被布置成使得非球面彼此面对。 控制器在与第一方向正交的第一方向和第二方向上改变光学元件之间的相对位置，以控制对应于第一方向和第二方向中的每一个的投影光学系统的光学性能。

公开(公告)号：US07215410B2

公开(公告)日：2007-05-08

申请号：US11093097

申请日：2005-03-28

Applicant: Yuhei Sumiyoshi

Inventor： Yuhei Sumiyoshi

IPC: G03B27/52 ,  G03B27/42

CPC classification number: G03F7/70233 ,  G03F7/70341 ,  G03F7/70983

Abstract: An exposure apparatus includes a illumination optical system for illuminating a reticle with light from a light source, and a projection optical system for projecting a pattern of the reticle onto an object, said projection optical system includes a lens closest to the object, wherein a surface on the object side of the lens is smaller than an effective area of a surface on the reticle side of the lens, and wherein said exposure apparatus exposes the object via a liquid that is filled in a space between the lens and the object.

Abstract translation: 曝光装置包括用于利用来自光源的光照射掩模版的照明光学系统和用于将掩模版的图案投射到物体上的投影光学系统，所述投影光学系统包括最靠近物体的透镜，其中表面 在透镜的物体侧上的距离小于透镜的掩模版面上的表面的有效面积，并且其中所述曝光装置经由填充在透镜和物体之间的空间中的液体曝光物体。

公开(公告)号：US20050213066A1

公开(公告)日：2005-09-29

申请号：US11093097

申请日：2005-03-28

Applicant: Yuhei Sumiyoshi

Inventor： Yuhei Sumiyoshi

IPC: G03B27/42 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70233 ,  G03F7/70341 ,  G03F7/70983

Abstract: An exposure apparatus includes a illumination optical system for illuminating a reticle with light from a light source, and a projection optical system for projecting a pattern of the reticle onto an object, said projection optical system includes a lens closest to the object, wherein a surface on the object side of the lens is smaller than an effective area of a surface on the reticle side of the lens, and wherein said exposure apparatus exposes the object via a liquid that is filled in a space between the lens and the object.

Abstract translation: 曝光装置包括用于利用来自光源的光照射掩模版的照明光学系统和用于将掩模版的图案投射到物体上的投影光学系统，所述投影光学系统包括最靠近物体的透镜，其中表面 在透镜的物体侧上的距离小于透镜的掩模版面上的表面的有效面积，并且其中所述曝光装置经由填充在透镜和物体之间的空间中的液体曝光物体。

公开(公告)号：US20100225889A1

公开(公告)日：2010-09-09

申请号：US12720080

申请日：2010-03-09

Applicant: Yuhei Sumiyoshi

Inventor： Yuhei Sumiyoshi

IPC: G03F7/207 ,  G02B13/18 ,  G03B27/52

CPC classification number: G03F7/70308 ,  G02B13/143 ,  G02B13/18 ,  G02B27/0068 ,  G03B27/52

Abstract: A projection optical system is configured to project an image of an object plane onto an image plane, and includes a first optical element having an aspheric shape that is rotationally asymmetric with respect to an optical axis, a moving unit configured to move the first optical element in a direction perpendicular to the optical axis, and a second optical element fixed on the optical axis, and configured to reduce an optical path length difference caused by an aspheric surface of the first optical element, the second optical element having no aspheric shape complement to the aspheric shape of the first optical element.

Abstract translation: 投影光学系统被配置为将物平面的图像投影到像平面上，并且包括具有相对于光轴旋转非对称的非球面形状的第一光学元件，被配置为使第一光学元件 在与所述光轴垂直的方向上固定的第二光学元件和固定在所述光轴上的第二光学元件，被配置为减小由所述第一光学元件的非球面引起的光路长度差，所述第二光学元件不具有非球面形状， 第一光学元件的非球面形状。

公开(公告)号：US07365826B2

公开(公告)日：2008-04-29

申请号：US11302155

申请日：2005-12-14

Applicant: Yuhei Sumiyoshi ,  Masayuki Suzuki

Inventor： Yuhei Sumiyoshi ,  Masayuki Suzuki

IPC: G03B27/52 ,  G03B27/54 ,  G03B27/42 ,  G03B27/68

CPC classification number: G03B27/54 ,  G03F7/706 ,  G03F7/70891

Abstract: A projection optical system includes an optical element that includes and locally uses a reflective or refractive area that is substantially axially symmetrical around an optical axis, the optical element being rotatable around the optical axis.

Abstract translation: 投影光学系统包括光学元件，光学元件包括并且局部地使用围绕光轴基本轴向对称的反射或折射区域，光学元件可围绕光轴旋转。