公开(公告)号：US20130206788A1

公开(公告)日：2013-08-15

申请号：US13840961

申请日：2013-03-15

Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.

Inventor： Robert Kaim ,  Joseph D. Sweeney ,  Anthony M. Avila ,  Richard S. Ray

IPC: F17C7/00

CPC classification number: H01L21/2225 ,  F17C7/00 ,  H01J37/08 ,  H01J37/3002 ,  H01J37/3171 ,  H01J2237/022 ,  H01J2237/304 ,  H01L21/223 ,  H01L21/26506 ,  Y02E60/321 ,  Y10T428/13

Abstract: An ion implantation system and process, in which the performance and lifetime of the ion source of the ion implantation system are enhanced, by utilizing isotopically enriched dopant materials, or by utilizing dopant materials with supplemental gas(es) effective to provide such enhancement.

公开(公告)号：US20130078790A1

公开(公告)日：2013-03-28

申请号：US13682416

申请日：2012-11-20

Applicant: Advanced Technology Materials, Inc.

Inventor： Joseph D. Sweeney ,  Oleg Byl ,  Robert Kaim

IPC: H01L21/265

CPC classification number: H01L21/265 ,  C23C14/06 ,  C23C14/0605 ,  C23C14/48 ,  H01J37/3171 ,  H01J2237/08 ,  H01J2237/31701 ,  H01L21/2236

Abstract: A method of implanting carbon ions into a target substrate, including: ionizing a carbon containing dopant material to produce a plasma having ions; optionally co-flowing an additional gas or series of gases with the carbon-containing dopant material; and implanting the ions into the target substrate. The carbon-containing dopant material is of the formula CwFxOyHz wherein if w=1, then x>0 and y and z can take any value, and wherein if w>1 then x or y is >0, and z can take any value. Such method significantly improves the efficiency of an ion implanter tool, in relation to the use of carbon source gases such as carbon monoxide or carbon dioxide.

Abstract translation: 一种将碳离子注入目标衬底的方法，包括：使含碳的掺杂剂材料电离以产生具有离子的等离子体; 任选地将另外的气体或一系列气体与含碳掺杂剂材料共流动; 并将离子注入目标衬底。 含碳掺杂剂材料为CwFxOyHz，其中如果w = 1，则x> 0，y和z可以取任何值，并且其中如果w> 1，则x或y> 0，并且z可以取任何值 。 相对于碳源气体如一氧化碳或二氧化碳的使用，这种方法显着地提高了离子注入机工具的效率。