公开(公告)号：US09494878B2

公开(公告)日：2016-11-15

申请号：US14435315

申请日：2013-09-17

Applicant: ASML Netherlands B.V.

Inventor： Edwin Johan Buis ,  Gosse Charles De Vries ,  Sven Antoin Johan Hol ,  Erik Maria Rekkers

IPC: G03F7/20 ,  H02K41/035 ,  H02K16/00 ,  G02B7/182 ,  G02B26/08 ,  H01F7/02 ,  H02K49/10 ,  G02B5/08 ,  G02B19/00

CPC classification number: G03F7/70833 ,  G02B5/0891 ,  G02B7/1828 ,  G02B19/0023 ,  G02B26/0816 ,  G03F7/70116 ,  G03F7/7015 ,  G03F7/70825 ,  H01F7/0205 ,  H02K11/40 ,  H02K16/00 ,  H02K41/0352 ,  H02K41/0356 ,  H02K49/10

Abstract: An EUV optical apparatus includes a number of adjustable mirrors (22x) on mirror bodies (120). Each mirror body is supported on an actuator (100x) comprising a moving part (132, 134, 136) and a fixed casing part (128, 130). The actuator provides a resilient support (140, 142) for the mirror body so that it is tiltable with two degrees relative to the casing. An electromagnetic motor (166, 170-178) applies first part, under the influence of an applied motive force, the resilient mounting being arranged to provide a biasing force that resists said motive force. A magnetic coupling (102, 104a, 104b) is arranged between the moving and fixed parts so as to provide a counter-biasing force. The counter-biasing force partly opposes said biasing force and thereby reduces the motive force required to effect a given displacement. The actuator can thus be made with reduced size, weight and heat dissipation.

Abstract translation: EUV光学装置包括在镜体（120）上的多个可调镜（22x）。 每个镜体支撑在包括移动部件（132,134,136）和固定壳体部件（128,130）的致动器（100x）上。 致动器提供用于镜体的弹性支撑件（140,142），使得其相对于壳体可倾斜两度。 电磁马达（166,170-178）在施加的动力的作用下施加第一部分，所述弹性安装件设置成提供抵抗所述动力的偏置力。 磁性联轴器（102,104a，104b）设置在运动部件和固定部件之间，以提供反作用力。 反作用力部分地与所述偏压力相反，从而减小了实现给定位移所需的动力。 致动器因此可以减小尺寸，重量和散热。

公开(公告)号：US11112618B2

公开(公告)日：2021-09-07

申请号：US15754480

申请日：2016-08-03

Applicant: ASML Netherlands B.V.

Inventor： Gosse Charles De Vries ,  Han-Kwang Nienhuys

IPC: G02B27/10 ,  G03F7/20 ,  G02B5/18 ,  H01S3/09 ,  G02B6/293 ,  G02B6/00

Abstract: A beam-splitting apparatus arranged to receive an input radiation beam and split the input radiation beam into a plurality of output radiation beams. The beam-splitting apparatus comprising a plurality of reflective diffraction gratings arranged to receive a radiation beam and configured to form a diffraction pattern comprising a plurality of diffraction orders, at least some of the reflective diffraction gratings being arranged to receive a 0th diffraction order formed at another of the reflective diffraction gratings. The reflective diffraction gratings are arranged such that the optical path of each output radiation beam includes no more than one instance of a diffraction order which is not a 0th diffraction order.

公开(公告)号：US10216101B2

公开(公告)日：2019-02-26

申请号：US15525626

申请日：2015-11-04

Applicant: ASML Netherlands B.V.

Inventor： Han-Kwang Nienhuys ,  Sjoerd Nicolaas Lambertus Donders ,  Gosse Charles De Vries ,  Michael Jozef Mathijs Renkens ,  Erik Roelof Loopstra

IPC: G03F7/20 ,  G02B5/18 ,  G02B7/18

Abstract: A reflector (2) comprising a plate (4) supported by a substrate (8), wherein the plate has a reflective surface (5) and is secured to the substrate by adhesive free bonding, and wherein a cooling channel array (10) is provided in the reflector. The channels (16) of the cooling channel array may be formed from open channels in a surface of the substrate, the open channels being closed by the plate to create the channels.

公开(公告)号：US10103508B2

公开(公告)日：2018-10-16

申请号：US15600149

申请日：2017-05-19

Applicant: ASML Netherlands B.V.

Inventor： Andrey Alexandrovich Nikipelov ,  Vadim Yevgenyevich Banine ,  Pieter Willem Herman De Jager ,  Gosse Charles De Vries ,  Olav Waldemar Vladimir Frijns ,  Leonardus Adrianus Gerardus Grimminck ,  Andelko Katalenic ,  Johannes Antonius Gerardus Akkermans ,  Erik Loopstra ,  Wouter Joep Engelen ,  Petrus Rutgerus Bartraij ,  Teis Johan Coenen ,  Wilhelmus Patrick Elisabeth Maria Op 'T Root

IPC: H01S3/09 ,  H01J1/34 ,  H05H7/08

Abstract: A photocathode comprises a substrate in which a cavity is formed and a film of material disposed on the substrate. The film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation. The electron emitting surface is on an opposite side of the film of material from the cavity.

公开(公告)号：US09823572B2

公开(公告)日：2017-11-21

申请号：US14900110

申请日：2014-06-17

Applicant: ASML Netherlands B.V.

Inventor： Andrey Alexandrovich Nikipelov ,  Olav Waldemar Vladimir Frijns ,  Gosse Charles De Vries ,  Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Pieter Willem Herman De Jager ,  Rilpho Ludovicus Donker ,  Han-Kwang Nienhuys ,  Borgert Kruizinga ,  Wouter Joep Engelen ,  Otger Jan Luiten ,  Johannes Antonius Gerardus Akkermans ,  Leonardus Adrianus Gerardus Grimminck ,  Vladimir Litvinenko

IPC: G03B27/42 ,  G03B27/58 ,  G03F7/20 ,  H01S3/09 ,  G01J1/04 ,  G02B1/06 ,  G02B5/20 ,  G21K1/10 ,  G02B26/02 ,  G01J1/26 ,  G01J1/42 ,  H05H7/04 ,  H01S3/00

CPC classification number: G03F7/70033 ,  G01J1/0407 ,  G01J1/0418 ,  G01J1/26 ,  G01J1/429 ,  G02B1/06 ,  G02B5/205 ,  G02B26/023 ,  G03F7/70008 ,  G03F7/7055 ,  G03F7/70558 ,  G03F7/7085 ,  G21K1/10 ,  H01S3/005 ,  H01S3/0085 ,  H01S3/0903 ,  H05H7/04

Abstract: A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.

公开(公告)号：US20150277233A1

公开(公告)日：2015-10-01

申请号：US14435450

申请日：2013-09-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Jan Bernard Plechelmus Van Schoot ,  Sven Antoin Johan Hol ,  Edwin Johan Buis ,  Erik Maria Rekkers ,  Gosse Charles De Vries ,  Hako Botma ,  Marinus Johannes Maria Van Dam ,  Ramon Pascal Van Gorkom

IPC: G03F7/20 ,  H01F7/20 ,  G01C9/06 ,  H01F7/02

CPC classification number: G03F7/70091 ,  G01C9/06 ,  G01C2009/066 ,  G02B7/1821 ,  G03F7/70116 ,  H01F7/0231 ,  H01F7/206 ,  H01H2051/2218 ,  H02K41/00

Abstract: An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets. A moving part includes a permanent magnet with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. An optical position sensor may direct a beam of radiation at the moving magnet through a central space between the electromagnets. The sizes of facets in a pupil mirror device may be made smaller in a peripheral region, but larger in a central region, thereby relaxing focusing requirements.

Abstract translation: 移位的致动器，例如镜子，通过改变两个电磁体中的电流，提供具有至少两个自由度的运动。 移动部件包括具有被限制在基本上位于垂直于磁体的磁化方向的第一平面中的工作区域上移动的磁性面的永磁体。 电磁体具有基本上位于与第一平面紧密平行的第二平面中的极面，每个极面基本上填充由移动磁体的表面穿过的区域的象限。 光学位置传感器可以通过电磁体之间的中心空间来引导移动磁体上的辐射束。 瞳孔镜装置中的小平面的尺寸可以在外围区域中较小，但在中心区域较大，从而放松聚焦要求。