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11.发明申请公开(公告)号：US20190025714A1
公开(公告)日：2019-01-24
申请号：US16035961
申请日：2018-07-16
Applicant: ASML NETHERLANDS B.V.
Abstract: Methods and apparatuses for estimation of at least one parameter of interest of a feature fabricated on a substrate, the feature having a plurality of structure parameters, the structure parameters including the at least one parameter of interest and one or more nuisance parameters. A receiver receives radiation scattered from one or more measured features on the substrate. A pupil generator generates an unprocessed pupil representation of the received radiation. A matrix multiplier multiplies a transformation matrix with intensities of each of a plurality of pixels of the unprocessed pupil representation to determine a post-processed pupil representation in which effects of the one or more nuisance parameters are mitigated or removed. A parameter estimator estimates the at least one parameter of interest based on the post-processed pupil representation.
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公开(公告)号：US20240036484A1
公开(公告)日：2024-02-01
申请号：US18265606
申请日：2021-12-02
Applicant: ASML Netherlands B.V.
Inventor： Timothy Dugan DAVIS , Simon Gijsbert Josephus MATHIJSSEN , Kaustuve BHATTACHARYYA , Sebastianus Adrianus GOORDEN , Armand Eugene Albert KOOLEN , Sera JEON , Shuo-Chun LIN
CPC classification number: G03F9/7019 , G03F9/7092 , G03F7/70633 , G03F7/70641
Abstract: Disclosed is a method of metrology. The method comprises measuring at least one surrounding observable parameter relating to a surrounding signal contribution to a metrology signal which comprises a contribution to said metrology signal which is not attributable to at least one target being measured and determining a correction from said surrounding signal observable parameter. The correction is used to correct first measurement data relating to measurement of one or more targets using measurement radiation forming a measurement spot on one or more of said one or more targets which is larger than one of said targets.
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公开(公告)号：US20240027913A1
公开(公告)日：2024-01-25
申请号：US18255261
申请日：2021-12-02
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Sergei SOKOLOV , Simon Reinald HUISMAN , Jin LIAN , Sebastianus Adrianus GOORDEN , Muhsin ERALP , Henricus Petrus Maria PELLEMANS , Justin Lloyd KREUZER
IPC: G03F7/00
CPC classification number: G03F7/70091 , G03F7/70625 , G03F7/70633
Abstract: A metrology system (400) includes a multi-source radiation system. The multi-source radiation system includes a waveguide device (502) and the multi-source radiation system is configured to generate one or more beams of radiation. The metrology system (400) further includes a coherence adjuster (500) including a multimode waveguide device (504). The multimode waveguide device (504) includes an input configured to receive the one or more beams of radiation from the multi-source radiation system (514) and an output (518) configured to output a coherence adjusted beam of radiation for irradiating a target (418). The metrology system (400) further includes an actuator (506) coupled to the waveguide device (502) and configured to actuate the waveguide device (502) so as to change an impingement characteristic of the one or more beams of radiation at the input of the multimode waveguide device (504).
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公开(公告)号：US20240012332A1
公开(公告)日：2024-01-11
申请号：US18038601
申请日：2021-11-12
Applicant: ASML Netherlands B.V.
Inventor： Luc Roger Simonne HASPESLAGH , Nitesh PANDEY , Ties Wouter VAN DER WOORD , Halil Gökay YEGEN , Guilherme BRONDANI TORRI , Sebastianus Adrianus GOORDEN , Alexander Ludwig KLEIN , Jim Vincent OVERKAMP , Edgar Alberto OSORIO OLIVEROS
CPC classification number: G03F7/70116 , G02B26/0858 , H02N2/108 , H02N2/009 , H10N30/50 , H10N30/05 , G03F7/70625 , G03F7/7015 , G03F7/706849
Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one multilayer piezoelectric actuator for displacing the mirror, wherein the at least one multilayer piezoelectric actuator is connected to the substrate, and wherein the at least one multilayer piezoelectric actuator comprises a plurality of piezoelectric layers of piezoelectric material interleaved with a plurality of electrode layers to form a stack of layers. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.
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15.发明公开公开(公告)号：US20230176491A1
公开(公告)日：2023-06-08
申请号：US17923913
申请日：2021-04-21
Applicant: ASML Netherlands B.V.
Inventor： Olger Victor ZWIER , Maurits VAN DER SCHAAR , Hilko Dirk BOS , Hans VAN DER LAAN , S.M. Masudur Rahman AL ARIF , Henricus Wilhelmus Maria Van Buel , Armand Eugene Albert KOOLEN , Victor CALADO , Kaustuve BHATTACHARYYA , Jin LIAN , Sebastianus Adrianus GOORDEN , Hui Quan LIM
IPC: G03F7/20
CPC classification number: G03F7/70641 , G03F7/70558 , G03F7/70633 , G03F7/70625
Abstract: Disclosed is a substrate and associated patterning device. The substrate comprises at least one target arrangement suitable for metrology of a lithographic process, the target arrangement comprising at least one pair of similar target regions which are arranged such that the target arrangement is, or at least the target regions for measurement in a single direction together are, centrosymmetric. A metrology method is also disclosed for measuring the substrate. A metrology method is also disclosed comprising which comprises measuring such a target arrangement and determining a value for a parameter of interest from the scattered radiation, while correcting for distortion of the metrology apparatus used.
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Patent Agency Ranking
公开(公告)号：US20220382175A1
公开(公告)日：2022-12-01
申请号：US17782570
申请日：2020-11-16
Applicant: ASML Netherlands B.V.
Inventor： Sergei SOKOLOV , Filippo ALPEGGIANI , Sebastianus Adrianus GOORDEN , Simeon Reinaid HUISMAN
IPC: G03F9/00
Abstract: Disclosed is a method for determining a stage position or correction therefor in a lithographic process. The method comprises obtaining transmission data describing the transmission of alignment radiation onto the substrate; obtaining position data relating to a stage position of said stage and/or a sensor position of said sensor. A weighting is determined for the position data based on said transmission data. The position based on said transmission data, position data and weighting.
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公开(公告)号：US20220283515A1
公开(公告)日：2022-09-08
申请号：US17637156
申请日：2020-08-25
Applicant: ASML HOLDING N.V. , ASML NETHERLANDS B.V.
Inventor： Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY , Simon Reinald HUISMAN , Justin Lloyd KREUZER , Sebastianus Adrianus GOORDEN
IPC: G03F7/20
Abstract: A method of determining an overlay measurement associated with a substrate and a system to obtain an overlay measurement associated with a patterning process. A method for determining an overlay measurement may be used in a lithography patterning process. The method includes generating a diffraction signal by illuminating a first overlay pattern and a second overlay pattern using a coherent beam. The method also includes obtaining an interference pattern based on the diffraction signal. The method further includes determining an overlay measurement between the first overlay pattern and the second overlay pattern based on the interference pattern.
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公开(公告)号：US20220121128A1
公开(公告)日：2022-04-21
申请号：US17565422
申请日：2021-12-29
Applicant: ASML NETHERLANDS B.V.
IPC: G03F7/20
Abstract: Disclosed is a method of metrology comprising using measurement illumination to measure a target, said measurement illumination comprising a plurality of illumination conditions. The method comprises performing a first measurement capture with a first subset of said plurality of illumination conditions, e.g., each comprising a positive weighting, to obtain a first parameter value and performing a second measurement capture with a second subset of said plurality of illumination conditions, e.g., each comprising a negative weighting, to obtain a second parameter value. An optimized parameter value is determined as a weighted combination of at least the first parameter value and the second parameter value.
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公开(公告)号：US20210157248A1
公开(公告)日：2021-05-27
申请号：US16613551
申请日：2018-04-13
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Sebastianus Adrianus GOORDEN , Johannes Antonius Gerardus AKKERMANS , Simon Reinald HUISMAN , Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY
Abstract: Disclosed is a metrology sensor apparatus comprising: an illumination system operable to illuminate a metrology mark in on a substrate with illumination radiation; an optical collection system configured to collect scattered radiation, following scattering of the illumination radiation by the metrology mark; and a wavelength dependent spatial filter for spatially filtering the scattered radiation, the wavelength dependent spatial filter having a spatial profile dependent on the wavelength of the scattered radiation. The wavelength dependent spatial filter may comprise a dichroic filter operable to substantially transmit scattered radiation within a first wavelength range and substantially block scattered radiation within a second wavelength range and at least one second filter operable to substantially block scattered radiation at least within the first wavelength range and the second wavelength range.
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公开(公告)号：US20210072647A1
公开(公告)日：2021-03-11
申请号：US16623647
申请日：2018-05-14
Applicant: ASML Netherlands B.V.
Inventor： Arie Jeffrey DEN BOEF , Patricius Aloysius Jacobus TINNEMANS , Haico Victor KOK , William Peter VAN DRENT , Sebastianus Adrianus GOORDEN
IPC: G03F7/20
Abstract: The invention relates to a sensor (SE) comprising: —a radiation source (LS) to emit radiation (LI) having a coherence length towards a sensor target (GR); and —a polarizing beam splitter (PBS) to split radiation diffracted by the sensor target into radiation with a first polarization state and radiation with a second polarization state, wherein the first polarization state is orthogonal to the second polarization state, and wherein the sensor is configured such that after passing the polarizing beam splitter radiation with the first polarization state has an optical path difference relative to radiation with the second polarization state that is larger than the coherence length.
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