公开(公告)号：US20250130512A1

公开(公告)日：2025-04-24

申请号：US18682678

申请日：2022-07-21

Applicant: ASML Netherlands B.V.

Inventor： Mohamed SWILLAM ,  Stephen ROUX ,  Justin Lloyd KREUZER ,  Roxana REZVANI NARAGHI

IPC: G03F9/00 ,  G03F7/00

Abstract: Systems, apparatuses, and methods are provided for measuring intensity using off-axis illumination. An example method can include illuminating a region of a surface of a substrate with a first radiation beam at a first incident angle and, in response, measuring a first set of photons diffracted from the region. The example method can further include illuminating the region with a second radiation beam at a second incident angle and, in response, measuring a second set of photons diffracted from the region. The example method can further include generating measurement data for the region based on the measured first set of photons and the measured second set of photons.

公开(公告)号：US20220350260A1

公开(公告)日：2022-11-03

申请号：US17761475

申请日：2020-09-03

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Armand Eugene Albert ,  Justin Lloyd KREUZER ,  Nikhil MEHTA ,  Patrick WARNAAR ,  Vasco Tomas TENNER ,  Patricius Aloysius Jacobus TINNEMANS ,  Hugo Augustinus Joseph CRAMER

IPC: G03F7/20 ,  G01N21/956 ,  G01N21/95

Abstract: Disclosed is a method for a metrology measurement on an area of a substrate comprising at least a portion of a target structure. The method comprises receiving a radiation information representing a portion of radiation scattered by the are, and using a filter in a Fourier domain for removing or suppressing at least a portion of the received radiation information that does not relate to radiation that has been scattered by the target structure for obtaining a filtered radiation information for the metrology measurement, wherein characteristics of the filter are based on target information about the target structure.

公开(公告)号：US20220100109A1

公开(公告)日：2022-03-31

申请号：US17415682

申请日：2019-12-12

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY ,  Franciscus BIJNEN ,  Alessandro POLO ,  Kirill Urievich SOBOLEV ,  Simon Reinald HUISMAN ,  Justin Lloyd KREUZER

IPC: G03F9/00 ,  G02B26/08

Abstract: An apparatus for and method of determining the alignment of a substrate in which a multiple alignment marks are simultaneously illuminated with spatially coherent radiation and the light from the illuminated marks is collected in parallel to obtain information on the positions of the marks and distortions within the marks.

公开(公告)号：US20170212434A1

公开(公告)日：2017-07-27

申请号：US15328194

申请日：2015-07-07

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Simon Gijsbert Josephus MATHIJSSEN ,  Arie Jeffrey DEN BOEF ,  Justin Lloyd KREUZER ,  Patricius Aloysius Jacobus TINNEMANS

IPC: G03F9/00

CPC classification number: G03F9/7088 ,  G03F9/7065 ,  G03F9/7069

Abstract: An alignment sensor for a lithographic apparatus is arranged and constructed to measure an alignment of a movable part of the lithographic apparatus in respect of a stationary part of the lithographic apparatus. The alignment sensor comprises a light source configured to generate a pulse train at a optical wavelength and a pulse repetition frequency, a non-linear optical element, arranged in an optical propagation path of the pulse train, the non-linear optical element configured to transform the pulse train at the optical wavelength into a transformed pulse train in an optical wavelength range, an optical imaging system configured to project the transformed pulse train onto an alignment mark comprising a diffraction grating; a detector to detect a diffraction pattern as diffracted by the diffraction grating, and a data processing device configured to derive alignment data from the detected diffraction pattern as detected by the detector.