-
公开(公告)号:US11756804B2
公开(公告)日:2023-09-12
申请号:US18091309
申请日:2022-12-29
Applicant: Applied Materials, Inc.
IPC: B08B1/04 , B24B37/34 , H01L21/67 , B24B37/27 , B08B3/00 , B24B37/12 , B24B57/00 , H01L21/306 , B24B55/04 , H01L21/304
CPC classification number: B08B1/04 , B08B3/003 , B24B37/27 , B24B37/34 , H01L21/6704 , B24B37/12 , B24B55/04 , B24B57/00 , H01L21/304 , H01L21/30625
Abstract: In a chemical mechanical polishing system, a platen shield cleaning assembly is installed on a rotatable platen in a gap between the rotatable platen and a platen shield. The assembly includes a sponge holder attached to the platen and a sponge. The sponge is held by the sponge holder such that an outer surface of the sponge is pressed against an inner surface of the platen shield.
-
公开(公告)号:US11545371B2
公开(公告)日:2023-01-03
申请号:US16909947
申请日:2020-06-23
Applicant: Applied Materials, Inc.
IPC: H01L21/67 , B24B37/27 , B08B3/00 , B08B1/04 , B24B37/34 , B24B37/12 , B24B57/00 , H01L21/306 , B24B55/04 , H01L21/304
Abstract: In a chemical mechanical polishing system, a platen shield cleaning assembly is installed on a rotatable platen in a gap between the rotatable platen and a platen shield. The assembly includes a sponge holder attached to the platen and a sponge. The sponge is held by the sponge holder such that an outer surface of the sponge is pressed against an inner surface of the platen shield.
-
公开(公告)号:US11484987B2
公开(公告)日:2022-11-01
申请号:US16813275
申请日:2020-03-09
Applicant: Applied Materials, Inc.
Inventor: Shantanu Rajiv Gadgil , Sumit Subhash Patankar , Nathan Arron Davis , Michael J. Coughlin , Allen L. D'Ambra
Abstract: Chemically impregnated applicators used to provide hydrophobic surfaces on chemical mechanical polishing system components and related application methods. A method of forming a hydrophobic coating on a surface of a polishing system component includes cleaning the surface of the polishing system component to remove a polishing fluid residue therefrom and applying a hydrophobicity causing chemical solution to the surface of the polishing system component.
-
公开(公告)号:US11370083B2
公开(公告)日:2022-06-28
申请号:US16932628
申请日:2020-07-17
Applicant: Applied Materials, Inc
Inventor: Shantanu Rajiv Gadgil , Sumit Subhash Patankar , Nathan Arron Davis , Michael J. Coughlin , Allen L. D'Ambra
IPC: B24B53/017
Abstract: A pad conditioner head cleaning tool has a first clamp configured to removably engage a first portion of a sponge against an outer surface of a disk-shaped pad conditioner head at a first location, a second clamp configured to removable engage a second portion of the sponge against the outer surface of the disk-shaped pad conditioner head at a second location, and an arm coupling the first clamp to the second clamp. The arm is sufficiently flexible to permit the first clamp and the second clamp to be separated to fit around the disk-shaped pad conditioner head and sufficiently tensile to bias the first clamp and the second clamp inwardly to press the sponge against an outer surface of a pad conditioner head.
-
公开(公告)号:US20210402561A1
公开(公告)日:2021-12-30
申请号:US16932628
申请日:2020-07-17
Applicant: Applied Materials, Inc.
Inventor: Shantanu Rajiv Gadgil , Sumit Subhash Patankar , Nathan Arron Davis , Michael J. Coughlin , Allen L. D`Ambra
IPC: B24B53/017
Abstract: A pad conditioner head cleaning tool has a first clamp configured to removably engage a first portion of a sponge against an outer surface of a disk-shaped pad conditioner head at a first location, a second clamp configured to removable engage a second portion of the sponge against the outer surface of the disk-shaped pad conditioner head at a second location, and an arm coupling the first clamp to the second clamp. The arm is sufficiently flexible to permit the first clamp and the second clamp to be separated to fit around the disk-shaped pad conditioner head and sufficiently tensile to bias the first clamp and the second clamp inwardly to press the sponge against an outer surface of a pad conditioner head.
-
-
-
-