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    SILYLATION OF AROMATIC HETEROCYCLES BY EARTH ABUNDANT TRANSITION-METAL-FREE CATALYSTS
    13.
    发明申请
    SILYLATION OF AROMATIC HETEROCYCLES BY EARTH ABUNDANT TRANSITION-METAL-FREE CATALYSTS 有权
    通过接地过渡金属催化剂对芳香杂环化合物进行硅烷化

    公开(公告)号：US20160046653A1

    公开(公告)日：2016-02-18

    申请号：US14818417

    申请日：2015-08-05

    Applicant: CALIFORNIA INSTITUTE OF TECHNOLOGY

    Inventor： ANTON TOUTOV ,  KERRY BETZ ,  ALEXEY FEDEROV ,  BRIAN M. STOLTZ ,  WENBO LIU ,  ROBERT H. GRUBBS

    IPC: C07F7/08 ,  C07D209/12 ,  C08G75/06 ,  C07B51/00

    CPC classification number: C07F7/0801 ,  C07D209/12 ,  C07F7/0827 ,  C07F7/0832

    Abstract: The present invention describes chemical systems and methods for silylating aromatic organic substrates, said system or method comprising or consisting essentially of a mixture of (a) at least one organosilane and (b) at least one strong base, the definition of strong base now also including hydroxide, especially KOH, said system being preferably, but not necessarily substantially free of a transition-metal compound, and said methods comprising contacting a quantity of the organic substrate with a mixture of (a) at least one organosilane and (b) at least one strong base, under conditions sufficient to silylate the aromatic substrate; wherein said system is substantially free of a transition-metal compound.

    Abstract translation: 本发明描述了用于甲硅烷基化芳族有机基质的化学体系和方法，所述体系或方法包括或主要由（a）至少一种有机硅烷和（b）至少一种强碱的混合物组成，或者基本上由 包括氢氧化物，特别是KOH，所述体系优选但不一定基本上不含过渡金属化合物，并且所述方法包括使一定量的有机底物与（a）至少一种有机硅烷和（b）的混合物接触 至少一个强碱，在足以甲酰化芳族底物的条件下; 其中所述体系基本上不含过渡金属化合物。

    BASE-CATALYZED SILYLATION OF TERMINAL ALKYNE C-H BONDS
    16.
    发明申请
    BASE-CATALYZED SILYLATION OF TERMINAL ALKYNE C-H BONDS 有权
    端基烷基C-H键的碱催化苯乙烯

    公开(公告)号：US20160060278A1

    公开(公告)日：2016-03-03

    申请号：US14841964

    申请日：2015-09-01

    Applicant: CALIFORNIA INSTITUTE OF TECHNOLOGY

    Inventor： ANTON TOUTOV ,  KERRY BETZ ,  BRIAN M. STOLTZ ,  WENBO LIU ,  ROBERT H. GRUBBS

    IPC: C07F7/08 ,  C07F17/02 ,  C07J7/00

    CPC classification number: C07F7/0827 ,  C07F17/02 ,  C07J1/0096 ,  C07J7/0005 ,  C07J51/00 ,  C07J75/00

    Abstract: The present invention is directed to a mild, efficient, and general direct C(sp)-H bond silylation. Various embodiments includes methods, each method comprising or consisting essentially of contacting at least one organic substrate comprising a terminal alkynyl C—H bond, with a mixture of at least one organosilane and an alkali metal hydroxide, under conditions sufficient to form a silylated terminal alkynyl moiety. The methods are operable in the substantially absence of transition-metal compounds. The systems associated with these methods are also disclosed.

    Abstract translation: 本发明涉及温和，有效和通用的直接C（sp）-H键甲硅烷基化。 各种实施方案包括方法，每种方法包括或基本上包括使至少一种包含末端炔基C-H键的有机底物与至少一种有机硅烷和碱金属氢氧化物的混合物在足以形成甲硅烷基化的末端炔基的条件下 部分。 所述方法在基本上不存在过渡金属化合物的情况下是可操作的。 还公开了与这些方法相关联的系统。

    PHOTOINITIATED OLEFIN METHATHESIS POLYMERIZATION
    19.
    发明申请
    PHOTOINITIATED OLEFIN METHATHESIS POLYMERIZATION 有权
    光化烯烃甲基聚合

    公开(公告)号：US20140099573A1

    公开(公告)日：2014-04-10

    申请号：US14044974

    申请日：2013-10-03

    Applicant: CALIFORNIA INSTITUTE OF TECHNOLOGY

    Inventor： RAYMOND WEITEKAMP ,  ROBERT H. GRUBBS

    IPC: G03F7/004 ,  G03F7/20

    CPC classification number: G03F7/0042 ,  G03F7/029 ,  G03F7/20

    Abstract: The present invention provides photosensitive compositions and methods of patterning a polymeric image on a substrate, said methods comprising; (a) depositing a layer of photosensitive composition of any one of claims 15 to 22 on the substrate; and (b) irradiating a portion of the layer of photosensitive composition with a light comprising a wavelength in a range of from about 220 to about 440 nm. The invention also relates to methods of metathesizing an unsaturated organic precursor comprising irradiating Fischer-type carbene ruthenium catalysts with at least one wavelength of light in the presence of at least one unsaturated organic precursor so as to metathesize at least one alkene or one alkyne bond.

    Abstract translation: 本发明提供光敏组合物和在基底上图案化聚合物图像的方法，所述方法包括： （a）在所述基底上沉积权利要求15至22中任一项所述的光敏组合物层; 和（b）用包含波长在约220至约440nm范围内的光照射光敏组合物层的一部分。 本发明还涉及使不饱和有机前体复元的方法，其包括在存在至少一种不饱和有机前体的情况下用至少一种波长的光照射费歇尔型卡宾钌催化剂，以便使至少一种烯烃或一个炔烃折析。

    BIREFRINGENT POLYMER BRUSH STRUCTURES FORMED BY SURFACE INITIATED RING-OPENING METATHESIS POLYMERIZATION
    20.
    发明申请
    BIREFRINGENT POLYMER BRUSH STRUCTURES FORMED BY SURFACE INITIATED RING-OPENING METATHESIS POLYMERIZATION 审中-公开
    通过表面开环开环聚合形成的双重聚合物刷结构

    公开(公告)号：US20140049823A1

    公开(公告)日：2014-02-20

    申请号：US14061070

    申请日：2013-10-23

    Applicant: CALIFORNIA INSTITUTE OF TECHNOLOGY

    Inventor： ROBERT H. GRUBBS ,  RAYMOND WEITEKAMP

    IPC: G02B1/04 ,  G02B5/30

    CPC classification number: G02B5/3083 ,  G02B1/04 ,  G02B1/08 ,  G02B1/10 ,  H01L51/0041 ,  H01L51/0579 ,  Y02E10/549

    Abstract: The disclosure describes a polymer brush structure exhibiting birefringence, said polymer brush structure comprising a plurality of substantially parallel oriented polymers and characterized by a longitudinal z-direction having a first refractive index, nz, and a lateral x,y-direction having a second refractive index, nx,y, wherein the difference, Δn, between the first refractive index and the second refractive index is in a range of about 0.1 to about 0.6, as measured by ellipsometry and fit to a Cauchy analytical model.

    Abstract translation: 本发明描述了显示双折射的聚合物刷结构，所述聚合物刷结构包括多个基本上平行的取向聚合物，其特征在于具有第一折射率nz的纵向z方向和具有第二折射率的横向x，y方向 指数，nx，y，其中第一折射率和第二折射率之间的差值Deltan在约0.1至约0.6的范围内，如通过椭偏仪测量并适合于Cauchy分析模型。

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