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公开(公告)号：US09921089B2
公开(公告)日：2018-03-20
申请号：US15171333
申请日：2016-06-02
Applicant: Fujikin Incorporated , National University Corporation Tohoku University , Tokyo Electron Ltd.
Inventor： Tadahiro Ohmi , Masahito Saito , Shoichi Hino , Tsuyoshi Shimazu , Kazuyuki Miura , Kouji Nishino , Masaaki Nagase , Katsuyuki Sugita , Kaoru Hirata , Ryousuke Dohi , Takashi Hirose , Tsutomu Shinohara , Nobukazu Ikeda , Tomokazu Imai , Toshihide Yoshida , Hisashi Tanaka
CPC classification number: G01F1/6847 , G01F1/363 , G01F1/40 , G01F5/005 , G01F7/005 , G05D7/0641 , G05D7/0652 , Y10T137/0379 , Y10T137/7759 , Y10T137/776 , Y10T137/7761 , Y10T137/8593 , Y10T137/86734 , Y10T137/86815 , Y10T137/87265 , Y10T137/87298 , Y10T137/87306 , Y10T137/87314 , Y10T137/87354 , Y10T137/8741 , Y10T137/87499 , Y10T137/87539 , Y10T137/87684
Abstract: A pressure type flow rate control apparatus is provided wherein flow rate of fluid passing through an orifice is computed as Qc=KP1 (where K is a proportionality constant) or as Qc=KP2m (P1-P2)n (where K is a proportionality constant, m and n constants) by using orifice upstream side pressure P1 and/or orifice downstream side pressure P2. A fluid passage between the downstream side of a control valve and a fluid supply pipe of the pressure type flow rate control apparatus comprises at least 2 fluid passages in parallel, and orifices having different flow rate characteristics are provided for each of these fluid passages, wherein fluid in a small flow quantity area flows to one orifice for flow control of fluid in the small flow quantity area, while fluid in a large flow quantity area flows to the other orifice for flow control of fluid in the large flow quantity area.
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公开(公告)号：US09625047B2
公开(公告)日：2017-04-18
申请号：US14780393
申请日：2014-03-17
Applicant: Fujikin Incorporated
Inventor： Takashi Hirose , Michio Yamaji , Toshihide Yoshida , Kohei Shigyou
CPC classification number: F16K31/004 , F16K7/14 , F16K25/005 , F16K27/0236 , F16K31/007
Abstract: A flow control valve for a flow controller includes a valve main body provided with an open-top valve chamber hole, a metal diaphragm valve element, a lower support cylinder having notches facing each other, an upper support cylinder attached to the lower support cylinder, a support frame horizontally disposed through the notches of the lower support cylinder, a disc spring placed between the support frame and a bottom of the lower support cylinder, a lower cradle placed on the support frame, a piezoelectric element inserted into the support cylinder above the lower cradle, a guide fixed to the valve main body together with the support frame with the support cylinder being inserted through the guide cylinder in a vertically movable manner. The support cylinder is pressed upward by the extension of the piezoelectric element, whereby the metal diaphragm valve element is separated from the valve seat by the elastic force.
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公开(公告)号：US20160349763A1
公开(公告)日：2016-12-01
申请号：US15034002
申请日：2014-11-25
Applicant: FUJIKIN INCORPORATED
Inventor： Takashi Hirose , Toshihide Yoshida , Atsushi Matsumoto , Kaoru Hirata , Nobukazu Ikeda , Kouji Nishino , Ryousuke Dohi , Katsuyuki Sugita
CPC classification number: G05D7/0635 , F16K7/14 , F16K31/007 , H01L21/67069 , H01L21/67253
Abstract: A pressure-type flow rate controller includes a body provided with a fluid passage which communicates a fluid inlet and a fluid outlet, a control valve for pressure control fixed to the body to open and close the fluid passage, an orifice arranged in the course of the fluid passage on the downstream side of the control valve, and a pressure sensor fixed to the body to detect the internal pressure of the fluid passage between the control valve and the orifice, wherein the fluid passage comprises a first passage portion communicating the control valve and a pressure detection chamber provided on a pressure detection surface of the pressure sensor, and a second passage portion spaced away from the first passage portion and communicating the pressure detection chamber and the orifice.
Abstract translation: 压力式流量控制器包括设置有流体通道的主体，该流体通道连通流体入口和流体出口，用于压力控制的控制阀固定到主体以打开和关闭流体通道;孔口，其布置在 所述流体通道在所述控制阀的下游侧，以及压力传感器，固定到所述主体，以检测所述控制阀和所述孔之间的所述流体通道的内部压力，其中，所述流体通道包括第一通道部分， 以及压力检测室，设置在所述压力传感器的压力检测表面上，以及第二通道部分，其与所述第一通道部分间隔开并连通所述压力检测室和所述孔口。
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公开(公告)号：US20160109886A1
公开(公告)日：2016-04-21
申请号：US14977162
申请日：2015-12-21
Applicant: Fujikin Incorporated , National University Corporation Tohoku University , Tokyo Electron Ltd.
Inventor： Tadahiro Ohmi , Masahito Saito , Shoichi Hino , Tsuyoshi Shimazu , Kazuyuki Miura , Kouji Nishino , Masaaki Nagase , Katsuyuki Sugita , Kaoru Hirata , Ryousuke Dohi , Takashi Hirose , Tsutomu Shinohara , Nobukazu Ikeda , Tomokazu Imai , Toshihide Yoshida , Hisashi Tanaka
CPC classification number: G01F1/6847 , G01F1/363 , G01F1/40 , G01F5/005 , G01F7/005 , G05D7/005 , G05D7/0641 , Y10T137/0379 , Y10T137/7759 , Y10T137/776 , Y10T137/7761 , Y10T137/8593 , Y10T137/86734 , Y10T137/86815 , Y10T137/87265 , Y10T137/87298 , Y10T137/87306 , Y10T137/87314 , Y10T137/87354 , Y10T137/8741 , Y10T137/87499 , Y10T137/87539 , Y10T137/87684
Abstract: A pressure type flow rate control apparatus is provided wherein flow rate of fluid passing through an orifice is computed as Qc=KP1 (where K is a proportionality constant) or as Qc=KP2m(P1−P2)n (where K is a proportionality constant, m and n constants) by using orifice upstream side pressure P1 and/or orifice downstream side pressure P2. A fluid passage between the downstream side of a control valve and a fluid supply pipe of the pressure type flow rate control apparatus comprises at least 2 fluid passages in parallel, and orifices having different flow rate characteristics are provided for each of these fluid passages, wherein fluid in a small flow quantity area flows to one orifice for flow control of fluid in the small flow quantity area, while fluid in a large flow quantity area flows to the other orifice for flow control of fluid in the large flow quantity area.
Abstract translation: 提供一种压力式流量控制装置，其中通过孔口的流体流量计算为Qc = KP1（其中K是比例常数）或Qc = KP2m（P1-P2）n（其中K是比例常数 ，m和n常数）通过使用孔口上游侧压力P1和/或孔口下游侧压力P2。 控制阀的下游侧和压力式流量控制装置的流体供给管之间的流体通道平行地包括至少2个流体通道，并且为每个这些流体通道设置具有不同流量特性的孔，其中 小流量区域中的流体流向一个孔，用于在小流量区域中的流体的流量控制，而大流量区域中的流体流向另一个孔口，用于大流量区域中的流体的流量控制。
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公开(公告)号：US20150160662A1
公开(公告)日：2015-06-11
申请号：US14626128
申请日：2015-02-19
Applicant: Fujikin Incorporated , National University Corporation Tohoku University , Tokyo Electron Ltd.
Inventor： Tadahiro Ohmi , Masahito Saito , Shoichi Hino , Tsuyoshi Shimazu , Kazuyuki Miura , Kouji Nishino , Masaaki Nagase , Katsuyuki Sugita , Kaoru Hirata , Ryousuke Dohi , Takashi Hirose , Tsutomu Shinohara , Nobukazu Ikeda , Tomokazu Imai , Toshihide Yoshida , Hisashi Tanaka
CPC classification number: G05D7/0641 , G01F1/363 , G01F1/6842 , G01F1/6847 , G01F5/005 , G01F7/005 , G05D7/0635 , G05D7/0647 , G05D23/1927 , Y10T137/0379 , Y10T137/7759 , Y10T137/776 , Y10T137/8593 , Y10T137/86734 , Y10T137/86815 , Y10T137/87265 , Y10T137/87314 , Y10T137/8741 , Y10T137/87499 , Y10T137/87684
Abstract: A pressure type flow rate control apparatus is provided wherein flow rate of fluid passing through an orifice is computed as Qc=KP1 (where K is a proportionality constant) or as Qc=KP2m (P1−P2)n (where K is a proportionality constant, m and n constants) by using orifice upstream side pressure P1 and/or orifice downstream side pressure P2. A fluid passage between the downstream side of a control valve and a fluid supply pipe of the pressure type flow rate control apparatus comprises at least 2 fluid passages in parallel, and orifices having different flow rate characteristics are provided for each of these fluid passages, wherein fluid in a small flow quantity area flows to one orifice for flow control of fluid in the small flow quantity area, while fluid in a large flow quantity area flows to the other orifice for flow control of fluid in the large flow quantity area.
Abstract translation: 提供一种压力式流量控制装置，其中通过孔口的流体流量计算为Qc = KP1（其中K是比例常数）或Qc = KP2m（P1-P2）n（其中K是比例常数 ，m和n常数）通过使用孔口上游侧压力P1和/或孔口下游侧压力P2。 控制阀的下游侧和压力式流量控制装置的流体供给管之间的流体通道平行地包括至少2个流体通道，并且为每个这些流体通道设置具有不同流量特性的孔，其中 小流量区域中的流体流向一个孔，用于在小流量区域中的流体的流量控制，而大流量区域中的流体流向另一个孔口，用于大流量区域中的流体的流量控制。
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Patent Agency Ranking
公开(公告)号：US09010369B2
公开(公告)日：2015-04-21
申请号：US13763178
申请日：2013-02-08
Applicant: Fujikin Incorporated , National University Corporation Tohoku University , Tokyo Electron Ltd.
Inventor： Tadahiro Ohmi , Masahito Saito , Shoichi Hino , Tsuyoshi Shimazu , Kazuyuki Miura , Kouji Nishino , Masaaki Nagase , Katsuyuki Sugita , Kaoru Hirata , Ryousuke Dohi , Takashi Hirose , Tsutomu Shinohara , Nobukazu Ikeda , Tomokazu Imai , Toshihide Yoshida , Hisashi Tanaka
CPC classification number: G05D7/0641 , G01F1/363 , G01F1/6842 , G01F1/6847 , G01F5/005 , G01F7/005 , G05D7/0635 , G05D7/0647 , G05D23/1927 , Y10T137/0379 , Y10T137/7759 , Y10T137/776 , Y10T137/8593 , Y10T137/86734 , Y10T137/86815 , Y10T137/87265 , Y10T137/87314 , Y10T137/8741 , Y10T137/87499 , Y10T137/87684
Abstract: A pressure type flow rate control apparatus is provided wherein flow rate of fluid passing through an orifice is computed as Qc=KP1 (where K is a proportionality constant) or as Qc=KP2m (P1−P2)n (where K is a proportionality constant, m and n constants) by using orifice upstream side pressure P1 and/or orifice downstream side pressure P2. A fluid passage between the downstream side of a control valve and a fluid supply pipe of the pressure type flow rate control apparatus comprises at least 2 fluid passages in parallel, and orifices having different flow rate characteristics are provided for each of these fluid passages, wherein fluid in a small flow quantity area flows to one orifice for flow control of fluid in the small flow quantity area, while fluid in a large flow quantity area flows to the other orifice for flow control of fluid in the large flow quantity area.
Abstract translation: 提供一种压力式流量控制装置，其中通过孔口的流体流量计算为Qc = KP1（其中K是比例常数）或Qc = KP2m（P1-P2）n（其中K是比例常数 ，m和n常数）通过使用孔口上游侧压力P1和/或孔口下游侧压力P2。 控制阀的下游侧和压力式流量控制装置的流体供给管之间的流体通道平行地包括至少2个流体通道，并且为每个这些流体通道设置具有不同流量特性的孔，其中 小流量区域中的流体流向一个孔，用于在小流量区域中的流体的流量控制，而大流量区域中的流体流向另一个孔口，用于大流量区域中的流体的流量控制。
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公开(公告)号：US12209679B2
公开(公告)日：2025-01-28
申请号：US18526626
申请日：2023-12-01
Applicant: FUJIKIN INCORPORATED
Inventor： Masahiko Takimoto , Toshihide Yoshida , Tsutomu Shinohara , Kouji Nishino
Abstract: A fluid control device 10 comprises a valve device V2 including actuators 22 and 24 for opening and closing a flow path and adjusting a flow rate of a fluid flowing through the flow path, a pressure sensor PT provided upstream of the valve device V2, and a control circuit 12 connected to the valve device V2 and the pressure sensor PT, and the control circuit 12 controls an operation of the actuator based on a pressure measured by the pressure sensor PT and a reference pressure drop curve, while the upstream side of the fluid control device is closed and the valve device is opened using the actuators.
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公开(公告)号：US11873916B2
公开(公告)日：2024-01-16
申请号：US18003259
申请日：2021-06-15
Applicant: FUJIKIN INCORPORATED
Inventor： Masahiko Takimoto , Toshihide Yoshida , Tsutomu Shinohara , Kouji Nishino
CPC classification number: F16K31/02 , G05D7/0623 , G05D7/0635 , F16K37/00 , F16K37/005 , G05D7/0652 , H01L21/67017
Abstract: A fluid control device 10 comprises a valve device V2 including actuators 22 and 24 for opening and closing a flow path and adjusting a flow rate of a fluid flowing through the flow path, a pressure sensor PT provided upstream of the valve device V2, and a control circuit 12 connected to the valve device V2 and the pressure sensor PT, and the control circuit 12 controls an operation of the actuator based on a pressure measured by the pressure sensor PT and a reference pressure drop curve, while the upstream side of the fluid control device is closed and the valve device is opened using the actuators.
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公开(公告)号：US11506290B2
公开(公告)日：2022-11-22
申请号：US16647560
申请日：2018-09-11
Applicant: FUJIKIN INCORPORATED
Inventor： Kenta Kondo , Toshihide Yoshida , Kenji Aikawa , Hidenobu Sato , Tomohiro Nakata , Tsutomu Shinohara , Masahiko Takimoto
IPC: F16K1/52 , C23C16/455 , F16K31/122 , H01L21/67
Abstract: A valve device is capable of precisely adjusting a flow rate variation due to aging, aging, etc. without using an external sensor. An adjusting actuator includes a piezoelectric element for adjusting the position of the operating member positioned at the open position, and the drive circuit of the adjusting actuator includes a detecting unit for detecting an electric signal related to the amount of strain generated in the piezoelectric element, and a control unit for controlling the adjusting actuator so that the opening degree of the flow path by the valve element becomes the target opening degree based on the electric signal related to the amount of strain of the piezoelectric element.
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公开(公告)号：US11242934B2
公开(公告)日：2022-02-08
申请号：US16971371
申请日：2018-03-09
Applicant: FUJIKIN INCORPORATED
Inventor： Kenta Kondo , Toshihide Yoshida , Masahiko Takimoto , Tsutomu Shinohara , Tomohiro Nakata , Takeru Miura , Masahiko Nakazawa
IPC: F16K31/00 , F16K31/126 , F16K31/122 , F16K31/02 , F16K31/124 , F16K7/17 , C23C16/455 , H01L21/67
Abstract: Provided is a valve device which can precisely adjust the flow rate while ensuring the flow rate of the fluid. A valve device includes a main actuator which receives a pressure of a supplied drive fluid and moves an operating member to an open position or closed position; an adjusting actuator arranged to receive at least a part of a force generated by the main actuator and for adjusting the position of the operating member positioned at the open position; and a pressure regulator provided in a feed path of the drive fluid to the main actuator and for regulating the pressure of the supplied drive fluid to suppress fluctuation of the pressure of the drive fluid supplied to the main actuator.
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