公开(公告)号：US20200244029A1

公开(公告)日：2020-07-30

申请号：US16853489

申请日：2020-04-20

Applicant: Gigaphoton Inc.

Inventor： Natsushi SUZUKI ,  Osamu WAKABAYASHI ,  Hiroaki TSUSHIMA ,  Masanori YASHIRO

IPC: H01S3/036 ,  H01S3/104 ,  H01S3/225 ,  B01D53/34 ,  B01D53/82 ,  H01S3/23 ,  B01D53/04 ,  B01D53/68 ,  B01D53/86

Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

公开(公告)号：US20190252846A1

公开(公告)日：2019-08-15

申请号：US16396072

申请日：2019-04-26

Applicant: National University Corporation Nagaoka University of Technology ,  Gigaphoton Inc.

Inventor： Weihua JIANG ,  Hiroshi UMEDA ,  Hakaru MIZOGUCHI ,  Takashi MATSUNAGA ,  Hiroaki TSUSHIMA ,  Tomoyuki OHKUBO

IPC: H01S3/097 ,  H01S3/041 ,  H01S3/225 ,  H01S3/134 ,  H01S3/038

CPC classification number: H01S3/09702 ,  H01S3/036 ,  H01S3/038 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/0971 ,  H01S3/10069 ,  H01S3/134 ,  H01S3/225

Abstract: A high-voltage pulse generator may include a number “n” (n is a natural number of not less than 2) of primary electric circuits connected in parallel to one another on the primary side of a pulse transformer, and a secondary electric circuit of the pulse transformer, which is connected to a pair of discharge electrodes disposed in a laser chamber of a gas laser apparatus. The “n” primary electric circuits may include a number “n” of primary coils connected in parallel to one another, a number “n” of capacitors respectively connected in parallel to the “n” primary coils, and a number “n” of switches respectively connected in series to the “n” capacitors. The “n” primary electric circuits may be connected to a number “n” of chargers for charging the “n” capacitors, respectively. The secondary electric circuit may include a number “n” of secondary coils connected in series to one another, and a number “n” of diodes each connected to opposite ends of each of the “n” secondary coils, to prevent a reverse current flowing from the pair of discharge electrodes toward the secondary coils.

公开(公告)号：US20190081451A1

公开(公告)日：2019-03-14

申请号：US16185542

申请日：2018-11-09

Applicant: GIGAPHOTON INC.

Inventor： Akihiko KUROSU ,  Takashi MATSUNAGA ,  Hiroyuki MASUDA ,  Osamu WAKABAYASHI ,  Hiroaki TSUSHIMA ,  Masanori YASHIRO ,  Takeshi OHTA

IPC: H01S3/036 ,  H01S3/04 ,  H01S3/0971 ,  H01S3/104 ,  H01S3/097 ,  H01S3/225 ,  H01S3/041 ,  H01S3/134 ,  H01S3/13 ,  H01S3/08 ,  H01S3/03

Abstract: There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit.

公开(公告)号：US20220190540A1

公开(公告)日：2022-06-16

申请号：US17686327

申请日：2022-03-03

Applicant: Gigaphoton Inc.

Inventor： Hiroaki TSUSHIMA ,  Yousuke KAWAGOE ,  Makoto TANAKA

IPC: H01S3/00 ,  H01S3/036 ,  G01M3/04 ,  G01M3/32

Abstract: A leak check method for a laser device includes exposing a closed space accommodating laser medium gas to the atmosphere, isolating the closed space from the atmosphere after exposing the closed space to the atmosphere, introducing neon-containing gas containing neon gas to the closed space, and determining whether or not the neon gas is leaking to outside of the closed space.

公开(公告)号：US20190074654A1

公开(公告)日：2019-03-07

申请号：US16178374

申请日：2018-11-01

Applicant: Gigaphoton Inc.

Inventor： Natsushi SUZUKI ,  Osamu WAKABAYASHI ,  Hiroaki TSUSHIMA ,  Masanori YASHIRO

IPC: H01S3/036 ,  B01D53/04 ,  H01S3/104 ,  H01S3/225 ,  B01D53/34 ,  B01D53/82 ,  B01D53/86 ,  B01D53/68

Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

公开(公告)号：US20190020167A1

公开(公告)日：2019-01-17

申请号：US16020595

申请日：2018-06-27

Applicant: Gigaphoton Inc.

Inventor： Natsushi SUZUKI ,  Osamu WAKABAYASHI ,  Hiroaki TSUSHIMA ,  Masanori YASHIRO

IPC: H01S3/036 ,  B01D53/04 ,  B01D53/68 ,  B01D53/86 ,  B01D53/82 ,  B01D53/34 ,  H01S3/225 ,  H01S3/104

Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

公开(公告)号：US20170346252A1

公开(公告)日：2017-11-30

申请号：US15680474

申请日：2017-08-18

Applicant: Gigaphoton Inc.

Inventor： Hisakazu KATSUUMI ,  Kazuya TAKEZAWA ,  Kouji KAKIZAKI ,  Hiroaki TSUSHIMA ,  Takeshi ASAYAMA

IPC: H01S3/038 ,  H01S3/0977 ,  H01S3/09 ,  H01S3/225 ,  H01S3/036

CPC classification number: H01S3/038 ,  H01S3/032 ,  H01S3/036 ,  H01S3/0381 ,  H01S3/0385 ,  H01S3/0388 ,  H01S3/08009 ,  H01S3/0906 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/0977 ,  H01S3/134 ,  H01S3/225

Abstract: An excimer laser chamber device may include: a the laser chamber; a first electrode provided in the laser chamber; a second electrode provided in the laser chamber to face the first electrode; an electrode holder provided in the laser chamber to be connected to a high voltage; at least one connecting terminal including a first anchored portion anchored to the first electrode and a second anchored portion anchored to the electrode holder, the at least one connecting terminal being configured to electrically connect the first electrode and the electrode holder; a guide member held by the electrode holder, the guide member being configured to position the first electrode in a direction substantially perpendicular to both a direction of electric discharge between the first electrode and the second electrode and a longitudinal direction of the first electrode; and an electrode-gap-varying unit configured to move the first electrode in a direction substantially parallel to the direction of electric discharge.

公开(公告)号：US20170288361A1

公开(公告)日：2017-10-05

申请号：US15631676

申请日：2017-06-23

Applicant: Gigaphoton Inc.

Inventor： Natsushi SUZUKI ,  Osamu WAKABAYASHI ,  Hiroaki TSUSHIMA ,  Masanori YASHIRO

IPC: H01S3/036 ,  H01S3/225 ,  B01D53/68 ,  B01D53/34 ,  B01D53/82 ,  B01D53/86 ,  H01S3/104 ,  B01D53/04

CPC classification number: H01S3/036 ,  B01D53/0446 ,  B01D53/346 ,  B01D53/685 ,  B01D53/82 ,  B01D53/86 ,  B01D2251/404 ,  B01D2251/602 ,  B01D2253/108 ,  B01D2255/20753 ,  B01D2255/20761 ,  B01D2257/2027 ,  B01D2258/0216 ,  B01D2259/40003 ,  H01S3/104 ,  H01S3/225

Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

公开(公告)号：US20160359291A1

公开(公告)日：2016-12-08

申请号：US15240162

申请日：2016-08-18

Applicant: Gigaphoton Inc.

Inventor： Takeshi ASAYAMA ,  Hiroaki TSUSHIMA ,  Kouji KAKIZAKI ,  Osamu WAKABAYASHI

IPC: H01S3/038 ,  H01S3/00 ,  H01S3/225 ,  H01S3/036

CPC classification number: H01S3/038 ,  G03F7/70025 ,  H01S3/0014 ,  H01S3/036 ,  H01S3/08009 ,  H01S3/09705 ,  H01S3/0971 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/225

Abstract: A gas laser apparatus includes a chamber containing a laser gas, a pair of electrodes disposed within the chamber, a fan disposed within the chamber, a motor connected to a rotating shaft of the fan, and a rotating speed control unit configured to control a rotating speed of the fan based on a wear-out parameter of the pair of electrodes.

Abstract translation: 气体激光装置包括：包含激光气体的腔室，设置在腔室内的一对电极;设置在腔室内的风扇;与风扇的旋转轴连接的电动机;以及旋转速度控制单元， 基于该对电极的磨损参数来确定风扇的速度。

公开(公告)号：US20190081450A1

公开(公告)日：2019-03-14

申请号：US16178363

申请日：2018-11-01

Applicant: Gigaphoton Inc.

Inventor： Natsushi SUZUKI ,  Osamu WAKABAYASHI ,  Hiroaki TSUSHIMA ,  Masanori YASHIRO

IPC: H01S3/036 ,  B01D53/04 ,  H01S3/104 ,  H01S3/225 ,  B01D53/34 ,  B01D53/82 ,  B01D53/86 ,  B01D53/68

Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.