公开(公告)号：US20160165708A1

公开(公告)日：2016-06-09

申请号：US15019577

申请日：2016-02-09

Applicant: GIGAPHOTON INC.

Inventor： Toshihiro NISHISAKA ,  Yoshiaki KATO ,  Fumio IWAMOTO

IPC: H05G2/00

CPC classification number: H05G2/006 ,  H05G2/005 ,  H05G2/008

Abstract: A target supply device may include: a tank including a cylindrical main body, a first end portion blocking an axial first end of the main body, and a second end portion blocking an axial second end of the main body; a nozzle provided to the first end portion of the tank and configured to output a target material contained inside the tank; and an inert gas supply unit configured to supply inert gas into the tank, in which the inert gas supply unit includes a gas flow path penetrating the second end portion of the tank and configured to guide the inert gas in a direction toward an inner wall of the main body.

Abstract translation: 目标供给装置可以包括：罐，包括圆筒形主体，阻挡主体的轴向第一端的第一端部和阻挡主体的轴向第二端的第二端部; 喷嘴，设置在所述罐的所述第一端部，并且被配置为输出容纳在所述罐内的目标材料; 以及惰性气体供给单元，其构造成向所述罐供给惰性气体，其中所述惰性气体供给单元包括穿过所述罐的所述第二端部的气体流路，并且构造成沿着朝向所述罐的内壁的内壁的方向引导所述惰性气体 主体。

公开(公告)号：US20140217311A1

公开(公告)日：2014-08-07

申请号：US14173677

申请日：2014-02-05

Applicant: GIGAPHOTON INC.

Inventor： Toshihiro NISHISAKA

IPC: H05G2/00 ,  G21K5/00

CPC classification number: H05G2/008 ,  G03F7/70033 ,  H05G2/003

Abstract: A chamber used in an extreme ultraviolet light generation apparatus that generates extreme ultraviolet light by irradiating a target material with a laser beam may include a chamber receptacle, a heat shield that is disposed within the chamber receptacle between a predetermined region where the target material turns into plasma and the chamber receptacle and that is configured to absorb heat produced at the predetermined region when the target material turns into plasma, and a support portion configured to attach the heat shield to the chamber receptacle, and further, the support portion may include an absorbing portion configured to absorb stress produced in the heat shield deforming due to the heat, by expanding/contracting in response to the thermal deformation of the heat shield.

Abstract translation: 用于通过用激光束照射目标材料而产生极紫外光的极紫外光发生装置中的室可以包括室容器，设置在室容器内的目标材料变成的预定区域之间的隔热罩 等离子体和室容器，并且被配置为当目标材料变成等离子体时吸收在预定区域产生的热量;以及支撑部分，其构造成将隔热罩附接到腔室容器，并且此外，支撑部分可以包括吸收 该部分被构造为吸收由于热量而在热屏障中产生的应力，通过响应于热屏蔽件的热变形而伸缩。

公开(公告)号：US20220082927A1

公开(公告)日：2022-03-17

申请号：US17397554

申请日：2021-08-09

Applicant: Gigaphoton Inc.

Inventor： Yusuke HOSHINO ,  Yukio WATANABE ,  Toshihiro NISHISAKA ,  Atsushi UEDA ,  Koichiro KOGE ,  Takayuki OSANAI ,  Gouta NIIMI

IPC: G03F1/24 ,  G21K1/06 ,  H05G2/00 ,  G03F7/20

Abstract: An extreme ultraviolet light generation apparatus may include a chamber, a first partition wall covering a plasma generation region in the chamber and having a first opening, an EUV light concentrating mirror located in a first space inside the chamber and outside the first partition wall and configured to concentrate extreme ultraviolet light generated in the plasma generation region and having passed through the first opening, a first gas supply port formed at the chamber and configured to supply gas to the first space, and a gas exhaust port formed in the first partition wall and configured to exhaust gas in a second space inside the first partition wall to outside of both the first partition wall and the chamber.

公开(公告)号：US20220015218A1

公开(公告)日：2022-01-13

申请号：US17333538

申请日：2021-05-28

Applicant: Gigaphoton Inc.

Inventor： Yutaka SHIRAISHI ,  Toshihiro NISHISAKA ,  Tsukasa HORI

IPC: H05G2/00 ,  G03F7/20

Abstract: A target supply device may include a first containing member configured to contain a target substance; a second containing member configured to contain the target substance flowing from the first containing member; a ring-shaped sealing portion which is formed integrally with one of the first containing member and the second containing member, and is brought into close contact with the other containing member; and a fastening member which fastens the first containing member and the second containing member to each other so that the first containing member communicates with the second containing member through the communication portion, and presses the sealing portion against the other containing member. Here, the sealing portion being plastically deformed by being pressed against the other containing member by the fastening member to seal a gap between the first containing member and the second containing member around the communication portion due to the plastic deformation.

公开(公告)号：US20160187787A1

公开(公告)日：2016-06-30

申请号：US15064019

申请日：2016-03-08

Applicant: Gigaphoton Inc.

Inventor： Toshihiro NISHISAKA ,  Yukio WATANABE ,  Osamu WAKABAYASHI ,  Kouji KAKIZAKI ,  Michio SHINOZAKI

IPC: G03F7/20

CPC classification number: G03F7/70033 ,  G03F7/70975 ,  H05G2/00 ,  H05G2/003 ,  H05G2/008

Abstract: An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.

公开(公告)号：US20140217310A1

公开(公告)日：2014-08-07

申请号：US14174673

申请日：2014-02-06

Applicant: GIGAPHOTON INC.

Inventor： Toshiyuki HIRASHITA ,  Toshihiro NISHISAKA

IPC: G21K5/08

CPC classification number: G21K5/08 ,  H05G2/006 ,  H05G2/008

Abstract: A target supply device according to an aspect of the present disclosure may include a target generator having a holding space and a first through-hole that communicates with the holding space, a porous filter having a thermal expansion coefficient that is substantially the same as a thermal expansion coefficient of the target generator, and a holder portion having a thermal expansion coefficient that is substantially the same as the thermal expansion coefficient of the target generator, that is configured to hold the porous filter and that is provided so as to form a seal against an inner surface of the target generator.

Abstract translation: 根据本公开的一个方面的目标供应装置可以包括具有保持空间的目标发生器和与保持空间连通的第一通孔，具有与热量基本相同的热膨胀系数的多孔过滤器 目标发电机的膨胀系数，以及具有与目标发电机的热膨胀系数基本相同的热膨胀系数的保持部，其被构造成保持多孔过滤器，并且被设置为形成密封 目标发生器的内表面。

公开(公告)号：US20140008552A1

公开(公告)日：2014-01-09

申请号：US13929668

申请日：2013-06-27

Applicant: Gigaphoton Inc.

Inventor： Hiroshi UMEDA ,  Taku YAMAZAKI ,  Hakaru MIZOGUCHI ,  Toshihiro NISHISAKA

IPC: G03F7/20

CPC classification number: H05G2/008 ,  G03F7/20 ,  G03F7/70033 ,  H05G2/001 ,  H05G2/006

Abstract: A target supply apparatus mounted in a chamber in which extreme ultraviolet light is generated by introducing a target material and a laser beam into the chamber may include a target generator having a nozzle, a first pipe configured to cover the nozzle, a cover opening provided in the first pipe to allow the target material to pass through the first pipe, and a first valve configured to open and close the cover opening.

Abstract translation: 安装在通过将目标材料和激光束引入室中而产生极紫外光的室中的目标供给装置可以包括具有喷嘴的目标发生器，被配置为覆盖喷嘴的第一管， 允许目标材料通过第一管的第一管和构造成打开和关闭盖开口的第一阀。

公开(公告)号：US20130206863A1

公开(公告)日：2013-08-15

申请号：US13675790

申请日：2012-11-13

Applicant: GIGAPHOTON INC.

Inventor： Takayuki YABU ,  Yukio WATANABE ,  Toshihiro NISHISAKA ,  Hiroshi SOMEYA ,  Osamu WAKABAYASHI

IPC: B05B17/06

CPC classification number: B05B17/0607 ,  B05B12/082

Abstract: A target supply device includes a target supply device body including a nozzle having a through-hole through which a target material is discharged, a piezoelectric member having first and second surfaces and connected to the target supply device body at the first surface, the piezoelectric member being configured such that a distance between the first and second surfaces changes in according with an externally supplied electric signal, an elastic member having first and second ends and connected to the second surface of the piezoelectric member at the first end, the elastic member being configured such that a distance between the first and second ends extends or contract in accordance with an externally applied force, and a regulating member configured to regulate a distance between the second end of the elastic member and the target supply device body.

Abstract translation: 目标供给装置包括目标供给装置主体，具有喷嘴，喷嘴具有目标材料排出的通孔，具有第一表面和第二表面并在第一表面连接到目标供给装置主体的压电部件，压电部件 被构造为使得第一和第二表面之间的距离根据外部供应的电信号而变化，弹性构件具有第一端和第二端并且在第一端处连接到压电构件的第二表面，弹性构件被构造成 使得第一和第二端之间的距离根据外部施加的力而延伸或收缩;以及调节构件，其构造成调节弹性构件的第二端和目标供给装置主体之间的距离。

公开(公告)号：US20130062539A1

公开(公告)日：2013-03-14

申请号：US13668725

申请日：2012-11-05

Applicant: GIGAPHOTON INC.

Inventor： Hideyuki HAYASHI ,  Tooru ABE ,  Kouji KAKIZAKI ,  Toshihiro NISHISAKA

IPC: H05G2/00

CPC classification number: H05G2/003 ,  H05G2/006

Abstract: An apparatus for measuring and controlling a target trajectory within a chamber apparatus for generating extreme ultraviolet light from plasma generated by irradiating a droplet target supplied from a target injection nozzle with a driver laser beam from an external driver laser. The apparatus includes: a nozzle adjustment mechanism for adjusting at least one of a position and an angle of the target injection nozzle; a target trajectory measuring unit for measuring a target trajectory to obtain trajectory information on the target trajectory; a target trajectory angle detecting unit for obtaining a value related to an angle deviation between the target trajectory represented by the trajectory information and a predetermined target trajectory; and a nozzle adjustment controller for controlling the nozzle adjustment mechanism based on the value related to the angle deviation such that the droplet target passes through a predetermined laser beam irradiation position.

Abstract translation: 一种用于测量和控制腔室装置内的目标轨迹的装置，用于通过用来自外部驱动器激光器的驱动器激光束照射从目标喷嘴提供的液滴目标产生的等离子体产生极紫外光。 该装置包括：用于调节目标喷嘴的位置和角度中的至少一个的喷嘴调节机构; 目标轨迹测量单元，用于测量目标轨迹以获得关于目标轨迹的轨迹信息; 目标轨迹角检测单元，用于获得与由所述轨迹信息表示的目标轨迹与预定目标轨迹之间的角度偏差相关的值; 以及喷嘴调节控制器，用于基于与角度偏差相关的值来控制喷嘴调节机构，使得液滴目标通过预定的激光束照射位置。