Apparatus for magnetic field pulsed laser deposition of thin films
    13.
    发明授权
    Apparatus for magnetic field pulsed laser deposition of thin films 失效
    薄膜磁场脉冲激光沉积设备

    公开(公告)号:US6024851A

    公开(公告)日:2000-02-15

    申请号:US88949

    申请日:1998-06-02

    CPC classification number: C23C14/28

    Abstract: The present invention relies upon a free space magnetic field in a pulsed laser deposition (PLD) chamber for forming high quality thin films made from diverted ions from a plume evaporated from an ablated target illuminated by a pulsed laser beam. The magnetic field exerts a qv X B Lorentz force upon the ions that is orthogonal to the magnetic field and to their direction of travel in the plume, and curves the ions toward the substrate, while neutral particulates continue to pass by the substrate so that the large neutral particulates are not deposited on the substrate. A shield prevents the deposition of plume species in direct line of sight between the target and the substrate so that only charged ions curved by the magnet are deposited on the substrate. A permanent magnet is used to separate charged species from neutral species. The magnetic field deflects the charged species away from the primary direction of travel of the plume and toward the substrate for deposition of the charged ion species on the substrate. The method provides particulate-free films having improved crystallinity, uniformity and adhesion.

    Abstract translation: 本发明依赖于脉冲激光沉积(PLD)室中的自由空间磁场,用于形成由从由脉冲激光束照射的消融靶所蒸发的羽流的转向离子制成的高质量薄膜。 磁场对与磁场正交的离子及其在羽流中的行进方向施加qv XB洛伦兹力,并将离子弯曲向衬底,而中性粒子继续通过衬底,使得大的 中性颗粒不沉积在基底上。 屏蔽物防止羽流物质在目标和基底之间的直接视线中沉积,使得仅由磁体弯曲的带电离子沉积在基底上。 永久磁铁用于将带电物质与中性物质分离。 磁场使带电物质偏离羽流的主要行进方向并朝向基底,以将带电离子物质沉积在基底上。 该方法提供了具有改善的结晶度,均匀性和粘附性的无颗粒膜。

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