公开(公告)号：US20150370160A1

公开(公告)日：2015-12-24

申请号：US14654753

申请日：2013-12-24

Applicant: HOYA CORPORATION

Inventor： Takeyuki YAMADA ,  Toshihiko ORIHARA ,  Takahito NISHIMURA

IPC: G03F1/60 ,  G03F1/80 ,  B24B29/02 ,  G03F1/24

CPC classification number: G03F1/60 ,  B24B29/02 ,  C03C15/00 ,  C03C23/0075 ,  G03F1/24 ,  G03F1/80 ,  G03F1/82

Abstract: Provided are a mask blank substrate processing device, a mask blank substrate processing method, a mask blank substrate fabrication method, a mask blank fabrication method, and a transfer mask fabrication method, for surface processing a mask blank substrate such that a high-level smoothness and a low-defect quality are satisfied. A mask blank substrate processing device (1) comprises: substrate support means (3) for supporting a substrate (Y); a catalytic surface plate (4) comprising a catalytic face (4a) which is positioned opposite the principal surface of the substrate (Y); relative movement means (5) for causing the catalytic face (4a) and the principal surface to move relative to each other in a state of being either in contact or in close proximity; first processing fluid supply means (6) which supplies a first processing fluid for CARE to the principal surface; and physical cleaning means (7) for removing foreign matter which has adhered to the principal surface from the principal surface, using a physical action.

Abstract translation: 提供掩模空白基板处理装置，掩模基板处理方法，掩模坯料制造方法，掩模坯料制造方法和转印掩模制造方法，用于对掩模坯料基板进行表面处理，使得高级平滑度 并且满足低缺陷质量。 掩模空白基板处理装置（1）包括：用于支撑基板（Y）的基板支撑装置（3）; 催化表面板（4），其包括与所述基板（Y）的主表面相对定位的催化面（4a）; 相对运动装置（5），用于使催化面（4a）和主表面在接触或接近的状态下相对于彼此移动; 第一处理流体供应装置（6），其向主表面供应用于CARE的第一处理流体; 以及用于通过身体动作从主表面去除附着到主表面的异物的物理清洁装置（7）。