公开(公告)号：US6066855A

公开(公告)日：2000-05-23

申请号：US168187

申请日：1998-10-07

Applicant: Hiroyasu Simizu

Inventor： Hiroyasu Simizu

IPC: H01J37/317 ,  H01J37/14

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/15 ,  H01J2237/153

Abstract: Charged-particle-beam optical systems are disclosed that are usable in projection-exposure apparatus employing a charged particle beam for projecting an image of an object (e.g., region of a lithographic mask) onto a sample (e.g., semiconductor wafer). Such an optical system comprises a deflection system for deflecting a trajectory of the charged particle beam such that a second-order derivative of the deflected trajectory is substantially constant in an object-side region extending from an object point to a crossover image point, and substantially constant in an image-side region extending from the crossover image point to an image point.

Abstract translation: 公开了可用于使用带电粒子束的投影曝光装置的投射粒子束光学系统，用于将物体的图像（例如，光刻掩模的区域）投影到样本（例如，半导体晶片）上。 这种光学系统包括用于偏转带电粒子束的轨迹的偏转系统，使得偏转轨迹的二阶导数在从物点延伸到交叉图像点的物体侧区域中基本上恒定，并且基本上 在从交叉图像点延伸到图像点的图像侧区域中是恒定的。

公开(公告)号：US5853043A

公开(公告)日：1998-12-29

申请号：US591536

申请日：1996-02-06

Applicant: Isamu Takeuchi ,  Akihiro Yamanaka ,  Kazuo Okamura ,  Hiroyasu Simizu ,  Takasi Kanazawa ,  Seiji Kumakura ,  Masakazu Koide ,  Toshihiko Murakami ,  Tadao Watanabe

Inventor： Isamu Takeuchi ,  Akihiro Yamanaka ,  Kazuo Okamura ,  Hiroyasu Simizu ,  Takasi Kanazawa ,  Seiji Kumakura ,  Masakazu Koide ,  Toshihiko Murakami ,  Tadao Watanabe

IPC: B22D11/124 ,  B22D11/12 ,  B22D11/128 ,  B22D11/16 ,  B22D11/20 ,  B21B1/46

CPC classification number: B22D11/1206

Abstract: A thin slab that is free of internal cracks is formed by reducing a continuously cast strand having a liquid core. The placement of the reduction rolls is controlled to effect a suitable amount of reduction. The methods effectively reduce bulging strain, as well as strain associated with reduction of the strand. As a result, total accumulated strain is reduced and a thin slab free of internal cracks can be manufactured at high speeds. The apparatus includes reduction blocks which are capable of shifting the rotation angle of an upper roller segment frame. Misalignment strain is reduced and the thickness of the strand can be changed without stopping the manufacturing operation.

Abstract translation: PCT No.PCT / JP95 / 01504 Sec。 371日期1996年2月6日 102（e）日期1996年2月6日PCT提交1995年7月27日PCT公布。 WO96 / 04086 PCT出版物 日期1996年2月15日通过还原具有液芯的连续铸造线，形成没有内部裂纹的薄板坯。 控制还原辊的放置以实现适量的还原。 该方法有效地减少了膨胀应变，以及与链的还原相关的应变。 结果，总累积应变减小，并且可以高速制造没有内部裂纹的薄板。 该装置包括能够移动上部辊段框架的旋转角度的减速块。 不对准应变减小，并且可以在不停止制造操作的情况下改变线的厚度。