Chips with high fracture toughness through a metal ring
    12.
    发明授权
    Chips with high fracture toughness through a metal ring 有权
    通过金属环具有高断裂韧性的芯片

    公开(公告)号:US08624348B2

    公开(公告)日:2014-01-07

    申请号:US13294226

    申请日:2011-11-11

    Applicant: Ilyas Mohammed

    Inventor: Ilyas Mohammed

    Abstract: A microelectronic element is disclosed that includes a semiconductor chip and a continuous monolithic metallic edge-reinforcement ring that covers each of the plurality of edge surfaces of the semiconductor chip and extending onto the front surface. The semiconductor chip may have front and rear opposed surfaces and a plurality of contacts at the front surface and edge surfaces extending between the front and rear surfaces. The semiconductor chip may also embody at least an active device or a passive device.

    Abstract translation: 公开了一种微电子元件,其包括覆盖半导体芯片的多个边缘表面中的每一个并延伸到前表面上的半导体芯片和连续的单片金属边缘加强环。 半导体芯片可以具有前表面和后相对表面以及在前表面和在前表面和后表面之间延伸的边缘表面的多个触点。 半导体芯片还可以具有至少一个有源器件或无源器件。

    Dual wafer spin coating
    14.
    发明授权
    Dual wafer spin coating 有权
    双晶圆片旋涂

    公开(公告)号:US08512491B2

    公开(公告)日:2013-08-20

    申请号:US12974611

    申请日:2010-12-21

    CPC classification number: H01L22/12 H01L21/67092

    Abstract: A method of bonding a first substrate and a second substrate includes the steps of rotating first substrate with an adhesive mass thereon, and second substrate contacting the mass and overlying the first substrate, controlling a vertical height of a heated control platen spaced apart from and not contacting the second substrate so as to control a temperature of the adhesive mass, so as to at least one of bond the first and second substrates in alignment with one another, or achieve a sufficiently planar adhesive interface between the first and second substrates.

    Abstract translation: 接合第一基板和第二基板的方法包括以下步骤:使第一基板与其上的粘合剂质量物质旋转,第二基板接触物料并覆盖第一基板,控制加热的控制台板的垂直高度, 使所述第二基板接触以控制所述粘合剂物料的温度,以便使所述第一和第二基板彼此对准的至少一个接合,或在所述第一和第二基板之间实现足够平坦的粘合界面。

    Systems and Methods for Producing Flat Surfaces in Interconnect Structures
    18.
    发明申请
    Systems and Methods for Producing Flat Surfaces in Interconnect Structures 有权
    在互连结构中产生平坦表面的系统和方法

    公开(公告)号:US20120326326A1

    公开(公告)日:2012-12-27

    申请号:US13168839

    申请日:2011-06-24

    Abstract: Methods and apparatus for forming a semiconductor device are provided which may include any number of features. One feature is a method of forming an interconnect structure that results in the interconnect structure having a co-planar or flat top surface. Another feature is a method of forming an interconnect structure that results in the interconnect structure having a surface that is angled upwards greater than zero with respect to a top surface of the substrate. The interconnect structure can comprise a damascene structure, such as a single or dual damascene structure, or alternatively, can comprise a silicon-through via (TSV) structure.

    Abstract translation: 提供了用于形成半导体器件的方法和装置,其可以包括任何数量的特征。 一个特征是形成互连结构的方法,其导致互连结构具有共面或平坦的顶表面。 另一个特征是形成互连结构的方法,其导致互连结构具有相对于衬底顶表面向上倾斜大于零的表面。 互连结构可以包括镶嵌结构,例如单镶嵌结构或双镶嵌结构,或者可以包括硅通孔(TSV)结构。

    SEMICONDUCTOR CHIP PACKAGE ASSEMBLY AND METHOD FOR MAKING SAME
    19.
    发明申请
    SEMICONDUCTOR CHIP PACKAGE ASSEMBLY AND METHOD FOR MAKING SAME 有权
    半导体芯片封装组件及其制造方法

    公开(公告)号:US20120313238A1

    公开(公告)日:2012-12-13

    申请号:US13155552

    申请日:2011-06-08

    Abstract: A microelectronic assembly may include a substrate containing a dielectric element having first and second opposed surfaces. The dielectric element may include a first dielectric layer adjacent the first surface, and a second dielectric layer disposed between the first dielectric layer and the second surface. A Young's modulus of the first dielectric layer may be at least 50% greater than the Young's modulus of the second dielectric layer, which is less than two gigapascal (GPa). A conductive structure may extend through the first and second dielectric layers and electrically connect substrate contacts at the first surface with terminals at the second surface. The substrate contacts may be joined with contacts of a microelectronic element through conductive masses, and a rigid underfill may be between the microelectronic element and the first surface. The terminals may be usable to bond the microelectronic assembly to contacts of a component external to the microelectronic assembly.

    Abstract translation: 微电子组件可以包括含有具有第一和第二相对表面的电介质元件的衬底。 电介质元件可以包括与第一表面相邻的第一电介质层,以及设置在第一介电层和第二表面之间的第二电介质层。 第一电介质层的杨氏模量可以比第二电介质层的杨氏模量大至少50%,小于二千兆帕(GPa)。 导电结构可以延伸穿过第一和第二电介质层,并且将第一表面处的基板触点与第二表面上的端子电连接。 衬底触点可以通过导电块与微电子元件的触点接合,并且刚性底部填充可以在微电子元件和第一表面之间。 端子可以用于将微电子组件接合到微电子组件外部的部件的触点。

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