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公开(公告)号:US20230278235A1
公开(公告)日:2023-09-07
申请号:US18117716
申请日:2023-03-06
Applicant: JABIL INC.
Inventor: Jeroen Bosboom , Babak Naderi , Richard Munro , Tatiana Pankova Major
IPC: B25J15/00 , B25J11/00 , H01L21/687
CPC classification number: B25J15/0014 , B25J11/0095 , H01L21/68707 , B25J19/025
Abstract: The disclosure provides an apparatus, system and method for providing an end effector. The end effector may be capable of accommodating semiconductor wafers of varying sizes, and may include: a wafer support; a bearing arm capable of interfacing with at least one robotic element, and at least partially bearing the wafer support at one end thereof; a plurality of support pads on the wafer support for physically interfacing with a one of the semiconductor wafers; and a low friction moving clamp driven bi-directionally along a plane at least partially provided by the bearing arm, wherein the low friction moving clamp retractably applies force to a proximal edge of the semiconductor wafer.
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公开(公告)号:US11059183B2
公开(公告)日:2021-07-13
申请号:US16806373
申请日:2020-03-02
Applicant: JABIL INC.
Inventor: Jeroen Bosboom , Babak Naderi , Richard Munro , Tatiana Pankova Major
IPC: H01L21/687 , B25J15/00 , B25J11/00 , B25J19/02
Abstract: The disclosure provides an apparatus, system and method for providing an end effector. The end effector may be capable of accommodating semiconductor wafers of varying sizes, and may include: a wafer support; a bearing arm capable of interfacing with at least one robotic element, and at least partially bearing the wafer support at one end thereof; a plurality of support pads on the wafer support for physically interfacing with a one of the semiconductor wafers; and a low friction moving clamp driven bi-directionally along a plane at least partially provided by the bearing arm, wherein the low friction moving clamp retractably applies force to a proximal edge of the semiconductor wafer.
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公开(公告)号:US20200306990A1
公开(公告)日:2020-10-01
申请号:US16806373
申请日:2020-03-02
Applicant: JABIL INC.
Inventor: Jeroen Bosboom , Babak Naderi , Richard Munro , Tatiana Pankova Major
IPC: B25J15/00 , B25J11/00 , H01L21/687
Abstract: The disclosure provides an apparatus, system and method for providing an end effector. The end effector may be capable of accommodating semiconductor wafers of varying sizes, and may include: a wafer support; a bearing arm capable of interfacing with at least one robotic element, and at least partially bearing the wafer support at one end thereof; a plurality of support pads on the wafer support for physically interfacing with a one of the semiconductor wafers; and a low friction moving clamp driven bi-directionally along a plane at least partially provided by the bearing arm, wherein the low friction moving clamp retractably applies force to a proximal edge of the semiconductor wafer.
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