APPARATUS, SYSTEM AND METHOD FOR PROVIDING AN END EFFECTOR

    公开(公告)号:US20230278235A1

    公开(公告)日:2023-09-07

    申请号:US18117716

    申请日:2023-03-06

    Applicant: JABIL INC.

    CPC classification number: B25J15/0014 B25J11/0095 H01L21/68707 B25J19/025

    Abstract: The disclosure provides an apparatus, system and method for providing an end effector. The end effector may be capable of accommodating semiconductor wafers of varying sizes, and may include: a wafer support; a bearing arm capable of interfacing with at least one robotic element, and at least partially bearing the wafer support at one end thereof; a plurality of support pads on the wafer support for physically interfacing with a one of the semiconductor wafers; and a low friction moving clamp driven bi-directionally along a plane at least partially provided by the bearing arm, wherein the low friction moving clamp retractably applies force to a proximal edge of the semiconductor wafer.

    Apparatus, system and method for providing an end effector

    公开(公告)号:US11059183B2

    公开(公告)日:2021-07-13

    申请号:US16806373

    申请日:2020-03-02

    Applicant: JABIL INC.

    Abstract: The disclosure provides an apparatus, system and method for providing an end effector. The end effector may be capable of accommodating semiconductor wafers of varying sizes, and may include: a wafer support; a bearing arm capable of interfacing with at least one robotic element, and at least partially bearing the wafer support at one end thereof; a plurality of support pads on the wafer support for physically interfacing with a one of the semiconductor wafers; and a low friction moving clamp driven bi-directionally along a plane at least partially provided by the bearing arm, wherein the low friction moving clamp retractably applies force to a proximal edge of the semiconductor wafer.

    APPARATUS, SYSTEM AND METHOD FOR PROVIDING AN END EFFECTOR

    公开(公告)号:US20200306990A1

    公开(公告)日:2020-10-01

    申请号:US16806373

    申请日:2020-03-02

    Applicant: JABIL INC.

    Abstract: The disclosure provides an apparatus, system and method for providing an end effector. The end effector may be capable of accommodating semiconductor wafers of varying sizes, and may include: a wafer support; a bearing arm capable of interfacing with at least one robotic element, and at least partially bearing the wafer support at one end thereof; a plurality of support pads on the wafer support for physically interfacing with a one of the semiconductor wafers; and a low friction moving clamp driven bi-directionally along a plane at least partially provided by the bearing arm, wherein the low friction moving clamp retractably applies force to a proximal edge of the semiconductor wafer.

Patent Agency Ranking