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公开(公告)号：US07483198B2
公开(公告)日：2009-01-27
申请号：US11056752
申请日：2005-02-11
Applicant: Jonathan Doan , Andrew Huibers , Satyadev Patel , James Dunphy , Dmitri Simonian , Hongqin Shi , Jianglong Zhang
Inventor： Jonathan Doan , Andrew Huibers , Satyadev Patel , James Dunphy , Dmitri Simonian , Hongqin Shi , Jianglong Zhang
IPC: G02B26/00
CPC classification number: B82Y30/00
Abstract: Disclosed herein is a micromirror device having in-plane deformable hinge to which a deflectable and reflective mirror plate is attached. The mirror plate rotates to different angles in response to an electrostatic field established between the mirror plate and an addressing electrode associated with the mirror plate.
Abstract translation: 本文公开了一种具有面向可变形铰链的微反射镜装置，可偏转和反射的反射镜板附接到该反射镜。 响应于在镜板和与镜板相关联的寻址电极之间建立的静电场，镜板旋转到不同的角度。
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公开(公告)号：US20070018261A1
公开(公告)日：2007-01-25
申请号：US11183046
申请日：2005-07-15
Applicant: Jonathan Doan
Inventor： Jonathan Doan
IPC: H01L29/82
CPC classification number: B81B3/0035 , G02B26/0841
Abstract: Disclosed herein is a microelectromechanical device having a structural layer composed of a low stress TiNx layer and a method of making the same.
Abstract translation: 本文公开了具有由低应力TiN层组成的结构层的微机电装置及其制造方法。
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公开(公告)号：US20060056006A1
公开(公告)日：2006-03-16
申请号：US11056732
申请日：2005-02-11
Applicant: Andrew Huibers , Satyadev Patel , Jonathan Doan , James Dunphy , Dmitri Simonian , Hongqin Shi , Jianglong Zhang
Inventor： Andrew Huibers , Satyadev Patel , Jonathan Doan , James Dunphy , Dmitri Simonian , Hongqin Shi , Jianglong Zhang
IPC: G02B26/00
CPC classification number: G02B26/0841 , G02B27/1033 , Y10S359/904
Abstract: Disclosed herein is a micromirror device having in-plane deformable hinge to which a deflectable and reflective mirror plate is attached. The mirror plate rotates to different angles in response to an electrostatic field established between the mirror plate and an addressing electrode associated with the mirror plate.
Abstract translation: 本文公开了一种具有面向可变形铰链的微反射镜装置，可偏转和反射的反射镜板附接到该反射镜。 响应于在镜板和与镜板相关联的寻址电极之间建立的静电场，镜板旋转到不同的角度。
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公开(公告)号：US20060056005A1
公开(公告)日：2006-03-16
申请号：US11056727
申请日：2005-02-11
Applicant: Satyadev Patel , Andrew Huibers , Jonathan Doan , James Dunphy , Dmitri Simonian , Hongqin Shi , Jianglong Zhang
Inventor： Satyadev Patel , Andrew Huibers , Jonathan Doan , James Dunphy , Dmitri Simonian , Hongqin Shi , Jianglong Zhang
IPC: G02B26/00
CPC classification number: G02B26/0841 , G02B27/1026 , Y10S359/904
Abstract: Disclosed herein is a micromirror device having in-plane deformable hinge to which a deflectable and reflective mirror plate is attached. The mirror plate rotates to different angles in response to an electrostatic field established between the mirror plate and an addressing electrode associated with the mirror plate.
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公开(公告)号：US20050206993A1
公开(公告)日：2005-09-22
申请号：US11135699
申请日：2005-05-24
Applicant: Jonathan Doan , Satyadev Patel , Peter Heureux
Inventor： Jonathan Doan , Satyadev Patel , Peter Heureux
CPC classification number: G02B26/0841 , G02B26/0833
Abstract: To protect the structural layers from being eroded in the etching process, a protection layer is deposited on the exposed structural layers of the micromirror. The protection layer is deposited before etching and removed after etching.
Abstract translation: 为了保护结构层在蚀刻过程中不被腐蚀，保护层沉积在微镜的暴露的结构层上。 在蚀刻之前沉积保护层并在蚀刻后除去。
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Patent Agency Ranking
公开(公告)号：US20050157375A1
公开(公告)日：2005-07-21
申请号：US11056752
申请日：2005-02-11
Applicant: Jonathan Doan , Andrew Huibers , Satyadev Patel , James Dunphy , Dmitri Simonian , Hongqin Shi , Jianglong Zhang
Inventor： Jonathan Doan , Andrew Huibers , Satyadev Patel , James Dunphy , Dmitri Simonian , Hongqin Shi , Jianglong Zhang
IPC: G02B26/00
CPC classification number: B82Y30/00
Abstract: Disclosed herein is a micromirror device having in-plane deformable hinge to which a deflectable and reflective mirror plate is attached. The mirror plate rotates to different angles in response to an electrostatic field established between the mirror plate and an addressing electrode associated with the mirror plate.
Abstract translation: 本文公开了一种具有面向可变形铰链的微反射镜装置，可偏转和反射的反射镜板附接到该反射镜。 响应于在镜板和与镜板相关联的寻址电极之间建立的静电场，镜板旋转到不同的角度。
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公开(公告)号：US20050054135A1
公开(公告)日：2005-03-10
申请号：US10969380
申请日：2004-10-19
Applicant: Satyadev Patel , Jonathan Doan , Andrew Huibers
Inventor： Satyadev Patel , Jonathan Doan , Andrew Huibers
IPC: B81B7/00 , B81C20060101 , B81C1/00 , H01L21/00 , H01L21/76
CPC classification number: B81C1/00793 , B81B2201/042 , B81C2201/053
Abstract: A method for processing microelectromechanical devices is disclosed herein. The method prevents the diffusion and interaction between sacrificial layers and structure layers of the microelectromechanical devices by providing selected barrier layers between consecutive sacrificial and structure layers.
Abstract translation: 本文公开了一种用于处理微机电装置的方法。 该方法通过在连续的牺牲层和结构层之间提供选定的阻挡层来防止牺牲层与微机电器件的结构层之间的扩散和相互作用。
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公开(公告)号：US07557932B2
公开(公告)日：2009-07-07
申请号：US11110338
申请日：2005-04-19
Applicant: Jonathan Doan , Regis Grasser , Satyadev Patel , Andrew Huibers , Igor Volfman
Inventor： Jonathan Doan , Regis Grasser , Satyadev Patel , Andrew Huibers , Igor Volfman
IPC: G01B9/02
CPC classification number: G02B26/001 , G02B26/0841
Abstract: The invention provides a method and apparatus for evaluating the quality of microelectromechanical devices having deformable and deflectable members using resonation techniques. Specifically, product quality characterized in terms of uniformity of the deformable and deflectable elements is inspected with an optical resonance mapping mechanism on a wafer-level.
Abstract translation: 本发明提供一种用于使用谐振技术来评估具有可变形和可偏转构件的微机电装置的质量的方法和装置。 具体地说，利用晶片级上的光学共振映射机构来检查以可变形和可偏转元件的均匀性为特征的产品质量。
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公开(公告)号：US07295363B2
公开(公告)日：2007-11-13
申请号：US11102531
申请日：2005-04-08
Applicant: Satyadev Patel , Peter Heureux , Jonathan Doan , Regis Grasser
Inventor： Satyadev Patel , Peter Heureux , Jonathan Doan , Regis Grasser
IPC: G02B26/00
CPC classification number: G02B26/0841
Abstract: Disclosed herein is method of operating a device that comprises an array of micromirrors. The method comprises a process usable for repairing stuck micromirrors of the micromirror array during the operation. The reparation process applies, at the ON state, two consecutive refresh voltages to the mirror plates of the micromirrors in the array with the pulses being separated in time longer than the characteristic oscillation time of the micromirrors. The reparation process can be applied independently to the micromirrors. Alternatively, the reparation process can be incorporated with a bias inversion process.
Abstract translation: 这里公开的是操作包括微镜阵列的装置的方法。 该方法包括可用于在操作期间修复微镜阵列的粘性微镜的过程。 修复过程在ON状态下，对阵列中的微镜的镜板施加两个连续的刷新电压，其中脉冲在时间上比微镜的特征振荡时间长。 修复过程可独立应用于微镜。 或者，修复过程可以结合偏置反转过程。
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公开(公告)号：US07170667B1
公开(公告)日：2007-01-30
申请号：US11303088
申请日：2005-12-14
Applicant: Jonathan Doan
Inventor： Jonathan Doan
IPC: G02B26/00
CPC classification number: G02B26/0833 , B81C1/00674
Abstract: A microelectromechanical device with a plastically deformable element of is exposed to illumination light so as to elongate the lifetime of the device on the customer side.
Abstract translation: 具有可塑性变形元件的微电子机械装置暴露于照明光，以延长设备在使用者端的寿命。
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