Abstract:
A microstructure is packaged with a device substrate of the microstructure being attached to a package substrate. For dissipating possible deformation of the microstructure, which may result in device failure or quality degradation of the microstructure, an adhesive material comprising a compliant adhesive component is applied and positioned between the device substrate and package substrate.
Abstract:
Disclosed herein is a micromirror device having in-plane deformable hinge to which a deflectable and reflective mirror plate is attached. The mirror plate rotates to different angles in response to an electrostatic field established between the mirror plate and an addressing electrode associated with the mirror plate.
Abstract:
A microstructure and the method for making the same are disclosed herein. The microstructure has structural members, at least one of which comprises an intermetallic compound. In making such a microstructure, a sacrificial material is employed. After completion of forming the structural layers, the sacrificial material is removed by a spontaneous vapor phase chemical etchant.
Abstract:
A plastically deformable element of a microelectromechanical device is strained so as to improve the lifetime of the microelectromechanical device. The element of the device can be strained by deforming the element into a deformed state and holding the element at the deformed state for a particular time period so as to acquire an amount of plastic deformation. The operation states of the device are calibrated according to the states before straining and the acquired plastic deformation. After then, the device is operated in the calibrated states.
Abstract:
The present invention discloses a method for processing a deformable element of a microstructure for reducing the plastic deformation by oxidizing the deformable element. The method of the present invention can be performed at a variety of stages of the fabrication and packaging processes.
Abstract:
Disclosed herein is a microelectromechanical device having a structural layer composed of a low stress TiNx layer and a method of making the same.
Abstract:
Disclosed herein is a microelectromechanical device having a structural layer composed of a low stress TiNx layer and a method of making the same.
Abstract:
A method for processing microelectromechanical devices is disclosed herein. The method prevents the diffusion and interaction between sacrificial layers and structure layers of the microelectromechanical devices by providing selected barrier layers between consecutive sacrificial and structure layers.
Abstract:
A plastically deformable element of a microelectromechanical device is strained so as to improve the lifetime of the microelectromechanical device. The element of the device can be strained by deforming the element into a deformed state and holding the element at the deformed state for a particular time period so as to acquire an amount of plastic deformation. The operation states of the device are calibrated according to the states before straining and the acquired plastic deformation. After then, the device is operated in the calibrated states.
Abstract:
The present invention discloses a method for processing a deformable element of a microstructure for reducing the plastic deformation by oxidizing the deformable element. The method of the present invention can be performed at a variety of stages of the fabrication and packaging processes.