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    LASER CUTS TO REDUCE ELECTRICAL LEAKAGE
    11.
    发明申请
    LASER CUTS TO REDUCE ELECTRICAL LEAKAGE 有权
    激光可减少电气泄漏

    公开(公告)号：US20140253996A1

    公开(公告)日：2014-09-11

    申请号：US13786934

    申请日：2013-03-06

    Applicant: SAGE ELECTROCHROMICS, INC.

    Inventor： Mark Samuel Burdis ,  Jean-Christophe Giron ,  Harvey Kalweit

    IPC: G02F1/155

    CPC classification number: G02F1/155 ,  G02F2001/1536 ,  G02F2001/1552 ,  G02F2001/1555

    Abstract: One object of the present invention is to provide an electrochromic device having improved insulating film structure to reduce electrical leakage. The improved structure includes a lower conductive layer, upper conductive layer, an electrochromic electrode layer, a counter electrode layer, and at least one ion-conductor layer sandwiched between the electrochromic electrode layer and the counter electrode layer. The lower conductive layer and the electrochromic electrode layer are scribed and the gap formed from the scribing is filled with the layers formed above the electrochromic electrode layer. In some aspects, the ion-conductor layer is also scribed with the lower conductor and electrochromic electrode layers and the gap formed from the scribing is filled with the layers formed above the ion-conductor layer. In further aspects, the insulating film may include one or more buffer layers formed above an ion-conductor layer, further separating the upper conductive layer from the lower conductive layer.

    Abstract translation: 本发明的一个目的是提供一种具有改进的绝缘膜结构以减少漏电的电致变色装置。 改进的结构包括下导电层，上导电层，电致变色电极层，对电极层和夹在电致变色电极层和对电极层之间的至少一个离子导体层。 对下导电层和电致变色电极层进行刻划，并且由划线形成的间隙填充在电致变色电极层上形成的层。 在一些方面，离子导体层也用下导体和电致变色电极层划刻，并且由划线形成的间隙填充有形成在离子导体层上方的层。 在另外的方面，绝缘膜可以包括形成在离子导体层上方的一个或多个缓冲层，进一步将上导电层与下导电层分开。

    Made-to-stock patterned transparent conductive layer
    12.
    发明授权
    Made-to-stock patterned transparent conductive layer 有权

    公开(公告)号：US12013622B2

    公开(公告)日：2024-06-18

    申请号：US17934418

    申请日：2022-09-22

    Applicant: SAGE ELECTROCHROMICS, INC.

    Inventor： Yigang Wang ,  Jean-Christophe Giron ,  Bryan D. Greer ,  Sebastian Marius Sarrach ,  Thomas Doublein

    IPC: G02F1/163 ,  G02F1/155 ,  G02F1/157

    CPC classification number: G02F1/163 ,  G02F1/155 ,  G02F1/157 ,  G02F2001/1552

    Abstract: An electrochemical device and method of forming said device is disclosed. The method can include providing a substrate and stack overlying the substrate. The stack can include a first transparent conductive layer over the substrate, a cathodic electrochemical layer over the first transparent conductive layer, an anodic electrochemical layer over the electrochromic layer, and a second transparent conductive layer overlying the anodic electrochemical layer. The method can include depositing an insulating layer over the stack and determining a first pattern for the second transparent conductive layer. The first pattern can include a first region and a second region. The first region and the second region can be the same material. The method can include patterning the first region of the second transparent conductive layer without removing the material from the first region. The first region can have a first resistivity and the second region can have a second resistivity.

    Forming electrochromic stacks using at most one metallic lithium deposition station
    14.
    发明授权
    Forming electrochromic stacks using at most one metallic lithium deposition station 有权

    公开(公告)号：US11703737B2

    公开(公告)日：2023-07-18

    申请号：US17172960

    申请日：2021-02-10

    Applicant: SAGE Electrochromics, Inc.

    Inventor： Paul Mogensen ,  Wen Li ,  Jean-Christophe Giron ,  Nicolas Antoine Mercadier

    IPC: G02F1/155

    CPC classification number: G02F1/155

    Abstract: The present disclosure describes various processes of forming an electrochromic stack using at most one metallic lithium deposition station. In some aspects, a process may include depositing metallic lithium only within an electrochromic counter-electrode of an electrochromic stack. In some aspects, a process may include using a lithium-containing ceramic counter-electrode target to form an electrochromic counter-electrode and depositing metallic lithium only within or above an electrochromic electrode of the electrochromic stack. In some embodiments, a process may include using a lithium-containing ceramic electrode target, and optionally additionally depositing metallic lithium to add mobile lithium to the electrochromic stack. In some embodiments, a process may include using a single metallic lithium deposition station to deposit metallic lithium between an ion-conducting layer and an electrochromic electrode of the electrochromic stack.

    ELECTROCHROMIC DEVICE INCLUDING A MEANS FOR MECHANICAL RESISTANCE AND A PROCESS OF FORMING THE SAME
    15.
    发明申请
    ELECTROCHROMIC DEVICE INCLUDING A MEANS FOR MECHANICAL RESISTANCE AND A PROCESS OF FORMING THE SAME 有权

    公开(公告)号：US20220121077A1

    公开(公告)日：2022-04-21

    申请号：US17450863

    申请日：2021-10-14

    Applicant: SAGE ELECTROCHROMICS, INC.

    Inventor： Jean-Christophe Giron ,  Leonard Bouzy ,  Théo Chevallier ,  Amaury Patissier ,  Nicolas Antoine Mercadier

    IPC: G02F1/155 ,  G02F1/153

    Abstract: An electrochromic device and method of forming the same is disclosed. The electrochromic device can include a first transparent conductive layer, an electrochromic layer, an electrolyte layer, a counter electrode layer, a second transparent conductive layer, and an adhesion layer between the counter electrode layer and the second transparent conductive layer, where the electrochromic device can undergo at least 2,000 cycles in a Nylon brush test before type 2 defects form. The method can include depositing an electrochromic layer over a first transparent conductive layer, depositing an electrolyte layer, depositing a lithium layer, depositing a counter electrode layer over the lithium layer, depositing a second transparent conductive layer, and heating the layers to form an electrochromic stack, where the lithium layer is combined with the counter electrode layer.

    Electrical feed-through spacer and connectivity
    17.
    发明授权
    Electrical feed-through spacer and connectivity 有权
    电气馈通间隔件和连接件

    公开(公告)号：US09142945B2

    公开(公告)日：2015-09-22

    申请号：US13910911

    申请日：2013-06-05

    Applicant: SAGE Electrochromics, Inc.

    Inventor： Mark O. Snyker ,  Jean-Christophe Giron ,  Bryan D. Greer ,  Jerome Korus ,  Rino Messere ,  Cliff Taylor

    IPC: H02G3/22 ,  E06B3/667 ,  G02F1/161

    CPC classification number: H02G3/22 ,  E06B3/667 ,  G02F1/161

    Abstract: An insulated glazing unit is provided. The unit includes a spacer frame separating a pair of substrates. The spacer frame has a length and a width transverse to the length. The unit further includes a conductive element passing through the width of the spacer frame. The unit further includes a first conductive component within the spacer frame. The first conductive component is in electrical communication with the conductive element. The conductive element is adapted for electrical communication with a second conductive component on a side of the width of the spacer frame opposite the first conductive component.

    Abstract translation: 提供了绝缘的玻璃窗单元。 该单元包括分隔一对基板的间隔框架。 间隔框架具有横向于长度的长度和宽度。 该单元还包括穿过间隔框架的宽度的导电元件。 该单元还包括间隔框架内的第一导电部件。 第一导电部件与导电元件电连通。 所述导电元件适于与所述间隔框架的与所述第一导电部件相对的宽度侧的第二导电部件电连通。

    Particle Removal From Electrochromic Films Using Non-Aqueous Fluids
    18.
    发明申请
    Particle Removal From Electrochromic Films Using Non-Aqueous Fluids 审中-公开
    使用非水溶液从电致变色膜去除颗粒

    公开(公告)号：US20150253642A1

    公开(公告)日：2015-09-10

    申请号：US14198824

    申请日：2014-03-06

    Applicant: SAGE Electrochromics, Inc.

    Inventor： Harvey Kalweit ,  Satya Ajjarapu ,  Jean-Christophe Giron

    IPC: G02F1/153

    CPC classification number: C11D11/0047 ,  C11D11/0035 ,  G02F1/15 ,  H01L51/0021 ,  H01L51/0096 ,  Y02E10/549

    Abstract: Several of the films that comprise various energy producing or control devices, for example, electrochromic devices, lithium batteries, and photovoltaic cells, are sensitive to moisture in some way. They may be especially vulnerable to moisture at particular stages during their fabrication. It may also be highly desirable during fabrication to be able to wash particulates from the surface. The particulates may be generated some aspect of the fabrication process, or they may arise from the environment in which the fabrication takes place. This invention shows ways to remove said particles from the surface without incurring the damage associated with typical washing processes, resulting in higher manufacturing yields and better device performance.

    Abstract translation: 包括各种能量产生或控制装置的几个膜，例如电致变色装置，锂电池和光伏电池，以某种方式对水分敏感。 它们在制造过程中特别容易受到潮湿的影响。 在制造过程中也可能非常需要从表面洗涤颗粒。 颗粒可能产生制造过程的某些方面，或者它们可能来自制造发生的环境。 本发明示出了从表面除去所述颗粒而不引起与典型洗涤过程相关的损害的方法，导致更高的制造产量和更好的装置性能。

    Patterned Motherboards
    20.
    发明公开
    Patterned Motherboards 审中-公开

    公开(公告)号：US20240361644A1

    公开(公告)日：2024-10-31

    申请号：US18591840

    申请日：2024-02-29

    Applicant: SAGE Electrochromics, Inc.

    Inventor： Jean-Christophe Giron

    IPC: G02F1/1343 ,  G02F1/153 ,  G02F1/155

    CPC classification number: G02F1/13439 ,  G02F1/1533 ,  G02F1/155

    Abstract: A method of manufacturing an electrochromic (EC) device is provided. The method includes receiving a substrate at a first facility. The substrate is coated with one or more layers of a plurality of layers. The substrate is patterned at the first facility to form a patterned substrate. Patterning the substrate includes identifying one or more areas for forming EC devices. The one or more areas of the patterned substrate are then electrically tested at the first facility. After electrically testing the patterned substrate, the patterned substrate is transported from the first facility to a second facility. At the second facility, after receiving the patterned substrate from the first facility, the one or more areas are cut from the patterned substrate to provide the EC device(s).

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