Semiconductor Device and Method to Minimize Stress on Stack Via
    17.
    发明申请
    Semiconductor Device and Method to Minimize Stress on Stack Via 审中-公开
    半导体器件和方法,以最大限度地减少堆叠的应力

    公开(公告)号:US20160276237A1

    公开(公告)日:2016-09-22

    申请号:US15169095

    申请日:2016-05-31

    Abstract: A semiconductor device has a semiconductor die. A first insulating layer is disposed over the semiconductor die. A first via is formed in the first insulating layer over a contact pad of the semiconductor die. A first conductive layer is disposed over the first insulating layer and in the first via. A second insulating layer is disposed over a portion of the first insulating layer and first conductive layer. An island of the second insulating layer is formed over the first conductive layer and within the first via. The first conductive layer adjacent to the island is devoid of the second insulating layer. A second conductive layer is disposed over the first conductive layer, second insulating layer, and island. The second conductive layer has a corrugated structure. A width of the island is greater than a width of the first via.

    Abstract translation: 半导体器件具有半导体管芯。 第一绝缘层设置在半导体管芯上。 在半导体管芯的接触焊盘上的第一绝缘层中形成第一通孔。 第一导电层设置在第一绝缘层上和第一通孔中。 第二绝缘层设置在第一绝缘层和第一导电层的一部分上。 第二绝缘层的岛形成在第一导电层之上并在第一通孔内。 与岛相邻的第一导电层没有第二绝缘层。 第二导电层设置在第一导电层,第二绝缘层和岛上。 第二导电层具有波纹结构。 岛的宽度大于第一通孔的宽度。

Patent Agency Ranking