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    MONOLITHIC MEMS PLATFORM FOR INTEGRATED PRESSURE, TEMPERATURE, AND GAS SENSOR
    13.
    发明申请
    MONOLITHIC MEMS PLATFORM FOR INTEGRATED PRESSURE, TEMPERATURE, AND GAS SENSOR 有权
    用于一体化压力，温度和气体传感器的单片MEMS平台

    公开(公告)号：US20160266061A1

    公开(公告)日：2016-09-15

    申请号：US14645826

    申请日：2015-03-12

    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

    Inventor： Shao-Chi Yu ,  Chia-Ming Hung ,  Hsin-Ting Huang ,  Hsiang-Fu Chen ,  Wen-Chuan Tai

    IPC: G01N27/22 ,  B81B7/02 ,  B81C1/00 ,  G01L19/00

    CPC classification number: B81C1/00269 ,  B81B7/02 ,  B81B2201/0214 ,  B81B2201/0264 ,  B81B2201/0278 ,  B81B2207/096 ,  B81C2203/0109 ,  G01K13/00 ,  G01L9/0073 ,  G01L19/0092 ,  G01N27/221 ,  G01N2027/222

    Abstract: The present disclosure is directed to a monolithic MEMS (micro-electromechanical system) platform having a temperature sensor, a pressure sensor and a gas sensor, and an associated method of formation. In some embodiments, the MEMS platform includes a semiconductor substrate having one or more transistor devices and a temperature sensor. A dielectric layer is disposed over the semiconductor substrate. A cavity is disposed within an upper surface of the dielectric layer. A MEMS substrate is arranged onto the upper surface of the dielectric layer and has a first section and a second section. A pressure sensor has a first pressure sensor electrode that is vertically separated by the cavity from a second pressure sensor electrode within the first section of a MEMS substrate. A gas sensor has a polymer disposed between a first gas sensor electrode within the second section of a MEMS substrate and a second gas sensor electrode.

    Abstract translation: 本公开涉及具有温度传感器，压力传感器和气体传感器的单片MEMS（微机电系统）平台以及相关联的形成方法。 在一些实施例中，MEMS平台包括具有一个或多个晶体管器件和温度传感器的半导体衬底。 电介质层设置在半导体衬底上。 空腔设置在电介质层的上表面内。 MEMS基板被布置在电介质层的上表面上并且具有第一部分和第二部分。 压力传感器具有第一压力传感器电极，其在MEMS衬底的第一部分内由空腔与第二压力传感器电极垂直分隔。 气体传感器具有设置在MEMS基板的第二部分内的第一气体传感器电极和第二气体传感器电极之间的聚合物。

    MICROELECTROMECHANICAL SYSTEMS (MEMS) DEVICES AT DIFFERENT PRESSURES
    14.
    发明申请
    MICROELECTROMECHANICAL SYSTEMS (MEMS) DEVICES AT DIFFERENT PRESSURES 有权
    微电子系统（MEMS）器件在不同的压力下

    公开(公告)号：US20160130137A1

    公开(公告)日：2016-05-12

    申请号：US14557513

    申请日：2014-12-02

    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

    Inventor： Hsin-Ting Huang ,  Hsiang-Fu Chen ,  Wen-Chuan Tai ,  Shao-Chi Yu ,  Chia-Ming Hung ,  Allen Timothy Chang ,  Bruce C.S. Chou ,  Chin-Min Lin

    IPC: B81B7/02 ,  B81C1/00

    CPC classification number: B81C1/00285 ,  B81B7/02 ,  B81B2201/0235 ,  B81B2201/0242 ,  B81B2207/095 ,  B81B2207/096 ,  B81C2203/0145

    Abstract: Some embodiments relate to multiple MEMS devices that are integrated together on a single substrate. A device substrate comprising first and second micro-electro mechanical system (MEMS) devices is bonded to a capping structure. The capping structure comprises a first cavity arranged over the first MEMS device and a second cavity arranged over the second MEMS device. The first cavity is filled with a first gas at a first gas pressure. The second cavity is filled with a second gas at a second gas pressure, which is different from the first gas pressure. A recess is arranged within a lower surface of the capping structure. The recess abuts the second cavity. A vent is arranged within the capping structure. The vent extends from a top of the recess to the upper surface of the capping structure. A lid is arranged within the vent and configured to seal the second cavity.

    Abstract translation: 一些实施例涉及在单个基板上集成在一起的多个MEMS器件。 包括第一和第二微机电系统（MEMS）装置的装置基板被结合到封盖结构。 封盖结构包括布置在第一MEMS器件上的第一腔和布置在第二MEMS器件上的第二腔。 第一腔体以第一气体压力填充第一气体。 第二腔体以与第一气体压力不同的第二气体压力填充第二气体。 凹口布置在封盖结构的下表面内。 凹槽邻接第二腔。 在封盖结构内设有排气口。 通气孔从凹槽的顶部延伸到封盖结构的上表面。 盖子布置在通气口内并构造成密封第二腔体。

    High Vacuum Sealing for Sensor Platform Process
    15.
    发明申请
    High Vacuum Sealing for Sensor Platform Process 有权
    传感器平台过程的高真空密封

    公开(公告)号：US20160060103A1

    公开(公告)日：2016-03-03

    申请号：US14472636

    申请日：2014-08-29

    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

    Inventor： Chia-Ming Hung ,  Shao-Chi Yu ,  Hsiang-Fu Chen ,  Wen-Chuan Tai ,  Hsin-Ting Huang

    IPC: B81B7/00 ,  B81C1/00

    CPC classification number: B81C1/00238 ,  B81B7/0038 ,  B81B7/0061 ,  B81B2201/0264 ,  B81B2203/0315 ,  B81C2203/0136 ,  B81C2203/0145 ,  B81C2203/019 ,  B81C2203/036

    Abstract: A method for manufacturing a microelectromechanical systems (MEMS) device is provided. According to the method, a semiconductor structure is provided. The semiconductor structure includes an integrated circuit (IC) substrate, a dielectric layer arranged over the IC substrate, and a MEMS substrate arranged over the IC substrate and the dielectric layer to define a cavity between the MEMS substrate and the IC substrate. The MEMS substrate includes a MEMS hole in fluid communication with the cavity and extending through the MEMS substrate. A sealing layer is formed over or lining the MEMS hole to hermetically seal the cavity with a reference pressure while the semiconductor structure is arranged within a vacuum having the reference pressure. The semiconductor structure resulting from application of the method is also provided.

    Abstract translation: 提供了一种用于制造微机电系统（MEMS）装置的方法。 根据该方法，提供半导体结构。 半导体结构包括集成电路（IC）衬底，布置在IC衬底上的电介质层和布置在IC衬底和电介质层上的MEMS衬底，以在MEMS衬底和IC衬底之间限定空腔。 MEMS衬底包括与空腔流体连通并延伸穿过MEMS衬底的MEMS孔。 在半导体结构布置在具有参考压力的真空中之前，密封层形成在MEMS孔的上方或衬套上，以密封空腔与参考压力。 还提供了由应用该方法得到的半导体结构。

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