Method and apparatus for UV-oxidation of toxics in water and
UV-disinfection of water
    11.
    发明授权
    Method and apparatus for UV-oxidation of toxics in water and UV-disinfection of water 失效
    用于水中有毒物质的紫外线氧化和水的紫外线消毒的方法和装置

    公开(公告)号:US6090296A

    公开(公告)日:2000-07-18

    申请号:US270850

    申请日:1999-03-17

    Inventor: Stephen P. Oster

    Abstract: A novel UV-oxidation and UV-disinfection system uses a highly-efficient, electrodeless microwave-excited lamp combined with a coaxial flow-through reactor design in which a liquid to bc treated is pumped from the bottom of the reactor and flows vertically upward through a reactor vessel against gravity. A hydrogen peroxide solution is injected into the liquid to be treated and thoroughly mixed by an inline mixer just before the liquid enters the reactor vessel. The solution is irradiated during its entire passage through the reactor vessel by the lamp which is configured to evenly irradiate the entire cross section of the reactor vessel and which has a substantial part of its spectral output in the wavelength most effectively absorbed by hydrogen peroxide molecules. A method of using the coaxial flow-through reactor to destroy toxic chemicals in water is also provided. The reactor is also used for UV disinfection of water supplies. The system is scaleable to enable high-volume application. According to another embodiment of the present invention, two or three reactors are arranged serially such that the output of the first reactor is the input of the second reactor.

    Abstract translation: 一种新型的紫外线氧化和紫外线消毒系统采用高效,无电极的微波激发灯,结合同轴流通反应器设计,其中处理的液体从反应器的底部泵出并垂直向上流过 反对重力的反应堆。 在液体进入反应器容器之前,通过直列混合器将过氧化氢溶液注入待处理的液体中并充分混合。 该溶液在整个通过反应器容器期间通过灯被照射,所述灯被配置成均匀地照射反应堆容器的整个横截面,并且其具有以过氧化氢分子最有效吸收的波长的大部分光谱输出。 还提供了使用同轴流通反应器来破坏水中的有毒化学物质的方法。 反应器也用于对水的紫外线消毒。 该系统是可扩展的,以实现高容量应用。 根据本发明的另一个实施例,两个或三个反应器被串联布置,使得第一反应器的输出是第二反应器的输入。

    Method of treating photoresists
    12.
    发明授权
    Method of treating photoresists 失效
    光刻胶的处理方法

    公开(公告)号:US4882263A

    公开(公告)日:1989-11-21

    申请号:US146927

    申请日:1988-01-22

    CPC classification number: B01J19/124 G03F7/2024

    Abstract: Ultraviolet radiation process applies to manufacture to semiconductor devices in order to enhance the thermal stability of the developed positive photoresist film on semiconductor's wafers.A method, in ultraviolet radiation process, and an apparatus enabling the high-speed and effective treatmnent of the positive photoresist employing ultraviolet irradiation by preventing the deformation of the positive photoresist which is caused by the light radiated form the microwave-excited electrodeless discharge lamp. These method and apparatus employ ultraviolet irradiation, in which ultraviolet rays are applied to the developed positive photoresist image placed under lower or pressure than 1 atmospheric pressure, using a means to intercept or reduce selectively all or part of the wavelengths in the spectral response region of the positive photoresist out of radiant lights obtained from the microwave-excited electrodeless discharge lamp.

    Apparatus and method for continuous surface modification of substrates
    17.
    发明申请
    Apparatus and method for continuous surface modification of substrates 审中-公开
    用于基片连续表面改性的装置和方法

    公开(公告)号:US20020038925A1

    公开(公告)日:2002-04-04

    申请号:US09836452

    申请日:2001-04-16

    Inventor: Karl Reimer

    Abstract: In accordance with the present invention, an apparatus and method are provided for preparing a substrate for adhering a material onto the surface of the substrate. The surface of the substrate to be prepared is exposed to electromagnetic radiation comprising ultra-violet radiation, whereby the substrate surface is decontaminated and/or modified by exposure to the ultra-violet radiation. Also disclosed is the use of an electro-ionization device, such as a Corona discharge device, and/or an infra-red radiation source in conjunction with electromagnetic radiation to modify the surface of the substrate to be prepared. Additionally, the use of gaseous components to modify the chemical functionalities on the substrate's surface is described. The invention has diverse applications, including, shoe fabrication, aircraft and space vehicle manufacture, automobile manufacturing and deposition of biochemical samples onto microarray well-plates.

    Abstract translation: 根据本发明,提供了一种用于制备用于将材料粘附到基板的表面上的基板的装置和方法。 要制备的基底的表面暴露于包含紫外辐射的电磁辐射,由此通过暴露于紫外线辐射对基底表面进行去污染和/或修饰。 还公开了使用诸如电晕放电装置的电离装置和/或与电磁辐射结合的红外辐射源来改变待制备的基底的表面。 另外,描述了使用气态组分来改变衬底表面上的化学官能度。 本发明具有多种应用,包括鞋制造,飞机和空间车辆制造,汽车制造和生化样品沉积到微阵列井板上。

    Process and device for triggering and/or carrying out chemical reactions
    18.
    发明授权
    Process and device for triggering and/or carrying out chemical reactions 失效
    用于触发和/或进行化学反应的方法和装置

    公开(公告)号:US06210538B1

    公开(公告)日:2001-04-03

    申请号:US09220854

    申请日:1998-12-28

    CPC classification number: B01J19/124 B01J2219/1215 G01N1/44 H01J65/044

    Abstract: In a process for triggering and/or carrying out chemical reactions by irradiating starting materials and, in particular, liquid starting materials with short-wave electromagnetic radiation emitted from at least one substance sending out short-wave electromagnetic radiation upon irradiation and excitation with long-wave electromagnetic radiation under operating conditions, the short-wave electromagnetic radiation is generated in a closed vessel arranged within the starting materials and containing the short-wave electromagnetic radiation emitting substance. A device for triggering and/or carrying out chemical reactions by irradiating with short-wave electromagnetic radiation starting materials and, in particular, liquid starting materials received in a receptacle, includes a generator for generating long-wave electromagnetic radiation as well as a vessel for receiving at least one substance sending out short-wave electromagnetic radiation upon irradiation and excitation with long-wave electromagnetic radiation under operating conditions. It is provided that the receptacle for the starting materials is designed to be permeable to long-wave electromagnetic radiation. The vessel receiving the short-wave electromagnetic radiation emitting substance, furthermore, is arranged within the receptacle and at least partially surrounded by the starting materials.

    Abstract translation: 在通过照射原材料,特别是用从长时间照射的激发发射短波电磁辐射的至少一种物质发射的短波电磁辐射的液体起始材料进行照射和/或进行化学反应的过程中, 在工作条件下的波电磁辐射,短波电磁辐射是在布置在起始材料内并包含短波电磁辐射物质的密闭容器中产生的。 通过用短波电磁辐射起始材料,特别是容纳在容器中的液体起始材料照射来触发和/或执行化学反应的装置包括用于产生长波电磁辐射的发生器以及用于 在工作条件下,通过长波电磁辐射照射和激发,接收至少一种物质发出短波电磁辐射。 提供了用于起始材料的容器被设计成可以透过长波电磁辐射。 此外,接收短波电磁辐射发射物质的容器设置在容器内并且至少部分地被起始材料包围。

    Microwave powered ozone producing system
    19.
    发明授权
    Microwave powered ozone producing system 失效
    微波臭氧发生系统

    公开(公告)号:US5666640A

    公开(公告)日:1997-09-09

    申请号:US626470

    申请日:1996-04-02

    Abstract: A microwave powered ozone producing system comprising a housing defining a microwave cavity having a volume Vo, an inlet and exhaust ports which communicate with the microwave cavity. Disposed within the microwave cavity and uniformly distributed therewithin are a number N of ozone producing lamps, each of which has a diameter D, a length L, and a nominal power p. Communicating with the microwave cavity is a microwave magnetron generator having a microwave power P and producing microwaves having a wavelength .lambda.. Electrically connected to the generator is a power supply. The optimal operating condition for the system to maximize the ultraviolet output and longevity of the lamps and minimize system power consumption is governed by the relationships:Vo.gtoreq.V min 1 wherein V min 1=8 .pi..lambda..sup.3 /3;Vo.gtoreq.V min 2 wherein V min 2=.pi.(D+1).sup.2 N L/4; and ##EQU1## wherein V min is the larger of V min 1 and V min 2, and k is a constant with a value in the range of 0.3.ltoreq.k.ltoreq.3, and .pi.=3.14.

    Abstract translation: 一种微波供电的臭氧产生系统,包括限定具有体积Vo的微波空腔的外壳,与微波空腔连通的入口和排气口。 在微波空腔内设置并均匀分布在其中的N个臭氧产生灯,每个具有直径D,长度L和标称功率p。 与微波空腔通信是具有微波功率P并产生波长λ的微波的微波磁控管发生器。 电气连接到发电机是电源。 使系统最大化紫外线输出和寿命以及最小化系统功耗的系统的最佳工作条件由以下关系决定:Vo> / = V min 1其中V min 1 =8πλ3/3; Vo> / = V min 2其中V min 2 = pi(D + 1)2 N L / 4; 和其中V min是V min 1和V min 2中的较大值,k是在0.3≤k≤3范围内的值的常数,pi = 3.14。

    Microwave-actuated ultraviolet sterilizer
    20.
    发明授权
    Microwave-actuated ultraviolet sterilizer 失效
    微波紫外线灭菌器

    公开(公告)号:US5166528A

    公开(公告)日:1992-11-24

    申请号:US771449

    申请日:1991-10-04

    CPC classification number: A61L2/12 A61L12/063 A61L12/066 A61L2/10 B01J19/124

    Abstract: A microwave activated ultraviolet sterilizer for surface sterilization of articles such as baby bottles, contact lenses and the like permits rapid irradiation and easy operation. The sterilizer includes a substantially non-conducting housing, a plurality of transparent ultraviolet lamps disposed within the housing, and a microwave source, such as a conventional home microwave oven. In use, the sterilizer is placed within the oven and derives its power from the oven's microwave field.

    Abstract translation: 用于婴儿奶瓶,隐形眼镜等物品的表面灭菌的微波激活紫外线消毒器允许快速照射并且容易操作。 灭菌器包括基本不导电的壳体,设置在壳体内的多个透明紫外线灯以及诸如常规家用微波炉的微波源。 在使用中,灭菌器放置在烤箱内,并从烤箱的微波场中获得电力。

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