公开(公告)号：US20150268179A1

公开(公告)日：2015-09-24

申请号：US14611668

申请日：2015-02-02

Applicant: Hitachi High-Tech Science Corporation

Inventor： Masahiro Sakuta

IPC: G01N23/223 ,  G01N23/04

CPC classification number: G01N23/223 ,  G01N2201/103 ,  G01N2201/125 ,  G01N2223/076 ,  G01N2223/304 ,  G01N2223/306 ,  G01N2223/408 ,  G01N2223/427 ,  G06F1/1692 ,  G06F3/017 ,  G06F3/03547 ,  G06F3/03548 ,  G06F3/0416 ,  G06F3/0484 ,  G06F3/04842 ,  G06F3/04845 ,  G06F3/04847 ,  G06F2203/04104

Abstract: An X-ray analyzer includes a sample stage, an X-ray source that irradiates a sample with primary X-rays, a detector that detects secondary X-rays generated from the sample, a position adjustment mechanism that adjusts relative positions of the sample stage and the primary X-rays, an observation mechanism that obtains an observation image of the sample, and a computer having a display unit and an input unit. The computer has a function of, in response to a pointer being moved from a central region of the observation screen to a certain position by dragging the input unit with keeping a holding state, moving the sample stage in a movement direction and at a movement speed corresponding to a direction and a distance of the certain position relative to the central region.

Abstract translation: X射线分析装置包括：样本台，对原样X射线照射样本的X射线源;检测从样本产生的二次X射线的检测器;调整样品台的相对位置的位置调整机构; 和主X射线，获取样本的观察图像的观察机构，以及具有显示单元和输入单元的计算机。 计算机具有响应于通过在保持保持状态下拖动输入单元而将指示器从观察屏幕的中心区域移动到特定位置的功能，使移动方向和移动速度移动样本台 对应于该位置相对于中心区域的方向和距离。

公开(公告)号：US08885158B2

公开(公告)日：2014-11-11

申请号：US13413521

申请日：2012-03-06

Applicant: Christian Wolters ,  Juergen Reich

Inventor： Christian Wolters ,  Juergen Reich

IPC: G01N21/956 ,  G01N21/95

CPC classification number: G01N21/9501 ,  G01N21/956 ,  G01N2201/06113 ,  G01N2201/103

Abstract: A surface scanning wafer inspection system with independently adjustable scan pitch and associated methods of operation are presented. The scan pitch may be adjusted independently from an illumination area on the surface of a wafer. In some embodiments, scan pitch is adjusted while the illumination area remains constant. For example, defect sensitivity is adjusted by adjusting the rate of translation of a wafer relative to the rate of rotation of the wafer without additional optical adjustments. In some examples, the scan pitch is adjusted to achieve a desired defect sensitivity over an entire wafer. In other examples, the scan pitch is adjusted during wafer inspection to optimize defect sensitivity and throughput. In other examples, the scan pitch is adjusted to maximize defect sensitivity within the damage limit of a wafer under inspection.

Abstract translation: 提出了具有独立可调的扫描间距和相关操作方法的表面扫描晶片检查系统。 可以独立于晶片表面上的照明区域来调整扫描间距。 在一些实施例中，在照明区域保持恒定的同时调整扫描间距。 例如，通过调整晶片的平移速度相对于晶片的旋转速率来调整缺陷灵敏度，而无需额外的光学调整。 在一些示例中，调整扫描间距以在整个晶片上实现期望的缺陷灵敏度。 在其他示例中，在晶片检查期间调整扫描间距以优化缺陷灵敏度和产量。 在其他示例中，调整扫描间距以使在检查的晶片的损伤极限内的缺陷灵敏度最大化。

公开(公告)号：US20130146770A1

公开(公告)日：2013-06-13

申请号：US13685282

申请日：2012-11-26

Applicant: Electronics and Telecommunications Research In

Inventor： Dong Suk JUN ,  Kwang-Yong Kang ,  Han-Cheol Ryu ,  Je Ha Kim

IPC: H01L27/146

CPC classification number: H01L27/14625 ,  G01N21/3581 ,  G01N2201/103

Abstract: A terahertz continuous wave system in accordance with the inventive concept may include a terahertz wave generator generating a terahertz continuous wave; a non-destructive detector measuring a change of the terahertz continuous wave by emitting the generated terahertz continuous wave to a sample and controlling a focal point of the emitted terahertz continuous wave while two-dimensionally moving the sample at predetermined intervals; and a three-dimensional image processor obtaining a three-dimensional image using two-dimensional images corresponding to the measured terahertz continuous wave.

Abstract translation: 根据本发明构思的太赫兹连续波系可包括产生太赫兹连续波的太赫兹波发生器; 通过将所产生的太赫兹连续波发射到样品并且以预定间隔二维地移动样本来控制发射的太赫兹连续波的焦点来测量太赫兹连续波的变化的非破坏性检测器; 以及使用对应于所测量的太赫兹连续波的二维图像获得三维图像的三维图像处理器。

公开(公告)号：US20120046884A1

公开(公告)日：2012-02-23

申请号：US13202734

申请日：2010-02-02

Applicant: Kenji Oka ,  Kenji Mitomo ,  Kenichiro Komeda

Inventor： Kenji Oka ,  Kenji Mitomo ,  Kenichiro Komeda

IPC: G01N21/94 ,  G01N21/93

CPC classification number: G01N21/9501 ,  G01N21/93 ,  G01N2201/103

Abstract: While an illumination optical system 2 is irradiating the surface of a contaminated standard wafer 110 with illumination light, this illumination light is scanned over the surface of the contaminated standard wafer 110, then detectors 31 to 34 of a detection optical system 3 each detect the light scattered from the surface of the contaminated standard wafer 110, next a predefined reference value in addition to detection results on the scattered light is used to calculate a compensation parameter “Comp” for detection sensitivity correction of photomultiplier tubes 331 to 334 of the detectors 31 to 34, and the compensation parameter “Comp” is separated into a time-varying deterioration parameter “P”, an optical characteristics parameter “Opt”, and a sensor characteristics parameter “Lr”, and correspondingly managed.This makes it easy to calibrate the detection sensitivity.

Abstract translation: 当照明光学系统2用照明光照射受污染的标准晶片110的表面时，该照明光被扫描在污染的标准晶片110的表面上，然后检测光学系统3的检测器31至34检测光 从受污染的标准晶片110的表面散射的下一个预定的参考值，除了散射光的检测结果之外，还用于计算用于检测器31到...的光电倍增管331至334的检测灵敏度校正的补偿参数“Comp” 34，补偿参数“Comp”被分离为时变劣化参数“P”，光学特性参数“Opt”和传感器特性参数“Lr”，并相应地被管理。 这样可以轻松校准检测灵敏度。

公开(公告)号：US07843568B2

公开(公告)日：2010-11-30

申请号：US12692758

申请日：2010-01-25

Applicant: Petri Kivela

Inventor： Petri Kivela

IPC: G01N21/25

CPC classification number: G01N21/253 ,  G01N21/13 ,  G01N21/6428 ,  G01N21/6452 ,  G01N21/76 ,  G01N2021/6421 ,  G01N2021/6441 ,  G01N2021/6471 ,  G01N2021/6482 ,  G01N2021/6484 ,  G01N2201/0446 ,  G01N2201/0453 ,  G01N2201/0826 ,  G01N2201/103

Abstract: The present invention relates generally to the field of biochemical laboratory instrumentation for different applications of measuring properties of samples on e.g. microtitration plates and corresponding sample supports. The object of the invention is achieved by providing an optical measurement instrumentation wherein a sample (281-285) is activated (212AS, 218AS) and the emission is detected (291, 292), wherein between the activation and detection phases of measuring the sample, a shift is made in the relative position between the sample and means (218) directing the activation radiation to the sample as well as in the relative position between the sample and the means (293) receiving the emission radiation from the sample. This can be implemented e.g. by moving (299) the sample assay plate and/or a measuring head between the activation and emission phases of a sample. The invention allows a simultaneous activation of a first sample and detecting emission from a second sample thus enhancing efficiency of the measurement.

Abstract translation: 本发明一般涉及生物化学实验室仪器的领域，用于不同应用样品的测量性质。 微量滴定板和相应的样品支架。 本发明的目的是通过提供一种光学测量仪器实现的，其中样品（281-285）被激活（212AS，218AS）并且检测到发射（291,292），其中在测量样品的激活和检测阶段之间 在样品和将激活辐射指向样品的装置（218）之间的相对位置以及样品和接收来自样品的发射辐射的装置（293）之间的相对位置进行位移。 这可以被实现。 通过在样品的活化和发射阶段之间移动（299）样品测定板和/或测量头。 本发明允许同时激活第一样品并检测来自第二样品的发射，从而提高测量的效率。

公开(公告)号：US20070247628A1

公开(公告)日：2007-10-25

申请号：US11662468

申请日：2004-09-10

Applicant: Petri Kivelä

Inventor： Petri Kivelä

IPC: G01N21/00

CPC classification number: G01N21/253 ,  G01N21/13 ,  G01N21/6428 ,  G01N21/6452 ,  G01N21/76 ,  G01N2021/6421 ,  G01N2021/6441 ,  G01N2021/6471 ,  G01N2021/6482 ,  G01N2021/6484 ,  G01N2201/0446 ,  G01N2201/0453 ,  G01N2201/0826 ,  G01N2201/103

Abstract: The present invention relates generally to the field of biochemical laboratory instrumentation for different applications of measuring properties of samples on microtitration plates and corresponding sample supports. An optical measurement instrumentation is provided, a sample is activated and the emission is detected, wherein between the activation and detection phases of measuring the sample, a shift is made in the relative position between the sample and elements directing the activation radiation to the sample as well as in the relative position between the sample and the elements receiving the emission radiation from the sample. This can be implemented e.g. by moving the sample assay plate and/or a measuring head between the activation and emission phases of a sample. The invention allows a simultaneous activation of a first sample and detecting emission from a second sample thus enhancing efficiency of the measurement.

Abstract translation: 本发明一般涉及生物化学实验室仪器领域，用于不同应用样品在微量滴定板和相应样品载体上的测量性质。 提供光学测量仪器，激活样品并检测发射，其中在测量样品的激活和检测阶段之间，在将样品和将激活辐射指向样品的元件之间的相对位置进行偏移，作为 以及在样品和接收来自样品的发射辐射的元件之间的相对位置。 这可以被实现。 通过在样品的活化和发射阶段之间移动样品测定板和/或测量头。 本发明允许同时激活第一样品并检测来自第二样品的发射，从而提高测量的效率。

公开(公告)号：US20070020762A1

公开(公告)日：2007-01-25

申请号：US11535025

申请日：2006-09-25

Applicant: Bruce Davis ,  Paul Shelley

Inventor： Bruce Davis ,  Paul Shelley

IPC: G01N31/00

CPC classification number: G01N25/00 ,  G01N21/3563 ,  G01N21/55 ,  G01N33/20 ,  G01N2021/8887 ,  G01N2021/95615 ,  G01N2201/103

Abstract: Methods for determining corrosion products on a substrate are disclosed. In one embodiment, a non-destructive method for determining an amount of corrosion product on a metallic substrate includes non-destructively determining a value Ia of infrared energy absorbed in a corrosion product on a metallic substrate; and correlating the value Ia of the infrared energy absorbed to an amount of the corrosion product.

Abstract translation: 公开了用于确定基板上的腐蚀产物的方法。 在一个实施例中，用于确定金属基底上的腐蚀产物量的非破坏性方法包括非破坏性地确定在金属基底上的腐蚀产物中吸收的红外能量的值Ia; 并将吸收的红外能量的值Ia与腐蚀产物的量相关联。

公开(公告)号：US20060192121A1

公开(公告)日：2006-08-31

申请号：US11279309

申请日：2006-04-11

Applicant: Bruce Davis ,  Paul Shelley

Inventor： Bruce Davis ,  Paul Shelley

IPC: G01J5/02

CPC classification number: G01N25/00 ,  G01N21/3563 ,  G01N21/55 ,  G01N33/20 ,  G01N2021/8887 ,  G01N2021/95615 ,  G01N2201/103

Abstract: A non-destructive method is provided for determining amount and distribution of a corrosion product on a metallic substrate. A value of infrared energy reflected from the metallic substrate without corrosion is determined. A value of infrared energy reflected from the metallic substrate with the corrosion product is determined. A value of infrared energy absorbed in the corrosion product is determined, and the value of the infrared energy absorbed in the corrosion product is correlated to an amount of the corrosion product.

Abstract translation: 提供了用于确定金属基底上的腐蚀产物的量和分布的非破坏性方法。 确定从没有腐蚀的金属基材反射的红外能量的值。 确定从具有腐蚀产物的金属基底反射的红外能量的值。 确定在腐蚀产物中吸收的红外能量的值，并且腐蚀产物中吸收的红外能量的值与腐蚀产物的量相关。

公开(公告)号：US07086919B2

公开(公告)日：2006-08-08

申请号：US10442054

申请日：2003-05-21

Applicant: Meng-Chieh Liao ,  Jiun-Haw Lee ,  Chi-Chung Chen

Inventor： Meng-Chieh Liao ,  Jiun-Haw Lee ,  Chi-Chung Chen

IPC: H01J9/00 ,  H01J9/50 ,  H01J9/44 ,  H01T21/00 ,  F23Q23/08

CPC classification number: G01N21/95 ,  G01N21/94 ,  G01N2021/8864 ,  G01N2021/945 ,  G01N2021/9513 ,  G01N2201/103 ,  H01L2251/568

Abstract: A detection and repair system includes an optical microscope, an image-retrieving device, an emission detector, a data controller, and a laser beam generator. When detecting the location of a defect, the system charges a detected region of an organic electroluminescent device with a negative bias or low forward bias before the device is lighted on. Then, the emission detector detects the locations of defects, which generate emission such as photons, thermal or IR emission, in an enlarged image. The laser beam generator generates a laser beam, which is used to isolate one of the defects. Furthermore, this invention also discloses a method for detecting and repairing an organic electroluminescent device.

Abstract translation: 检测和修复系统包括光学显微镜，图像检索装置，发射检测器，数据控制器和激光束发生器。 当检测到缺陷的位置时，系统在器件点亮之前对具有负偏压或低正偏压的有机电致发光器件的检测区域进行充电。 然后，发射检测器检测在放大图像中产生诸如光子，热或IR发射的发射的缺陷的位置。 激光束发生器产生用于隔离缺陷之一的激光束。 此外，本发明还公开了一种用于检测和修复有机电致发光器件的方法。

公开(公告)号：US07061601B2

公开(公告)日：2006-06-13

申请号：US10754275

申请日：2004-01-08

Applicant: Steven W. Meeks

Inventor： Steven W. Meeks

IPC: G01N21/00

CPC classification number: G01N21/9506 ,  G01B11/0616 ,  G01B11/0641 ,  G01B11/065 ,  G01B11/303 ,  G01B11/306 ,  G01N21/21 ,  G01N21/47 ,  G01N21/9501 ,  G01N21/958 ,  G01N2021/8427 ,  G01N2021/8841 ,  G01N2201/103 ,  G01N2201/104 ,  G01N2201/1045 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A double-sided optical inspection system is presented which may detect and classify particles, pits and scratches on thin film disks or wafers in a single scan of the surface. In one embodiment, the invention uses a pair of orthogonally oriented laser beams, one in the radial and one in the circumferential direction on both surfaces of the wafer or thin film disk. The scattered light from radial and circumferential beams is separated via their polarization or by the use of a dichroic mirror together with two different laser wavelengths.

Abstract translation: 提出了一种双面光学检测系统，其可以在表面的单次扫描中检测和分类薄膜盘或晶片上的颗粒，凹坑和划痕。 在一个实施例中，本发明使用一对正交取向的激光束，一个在径向上，一个在圆周方向上在晶片或薄膜盘的两个表面上。 来自径向和周向光束的散射光通过其偏振分离，或者通过使用二向色镜与两种不同的激光波长分离。