Abstract:
The present invention provides an electron emitting device including electrodes disposed with a space therebetween on a surface of a substrate, a carbon film disposed between the electrodes and connected to one of the electrodes, and a gap disposed between the carbon film and the other electrode. In the gap, the distance between the edge of the carbon film connected to one of the electrode and the edge of the other electrode at an upper position apart from the surface of the substrate is smaller than that at the surface of the substrate. The present invention also provides an electron source and an image display device each including the electron emitting device.
Abstract:
The present invention relates to a method of forming a small gap using CMP and a method for manufacturing a lateral FED. In the present invention, a small gap is determined by the thickness of an oxide film, and so uniform small gaps of about 100 null that have been impossible to attain with the art of prior lithography can be formed with repeatability. Prior lateral field emission devices have the problem of repeatability in forming a gap for field emission because they are fabricated by means of a thermal stress method or an electrical stress method. But if the method of forming a small gap according to the present invention is used to fabricate a lateral FED, a FED can be made that has low voltage drive and high current drive characteristics and uniform field emission characteristics.
Abstract:
A method of manufacturing an image forming apparatus is provided for increasing the uniformity of an electron-emitting device, improving the electron-emitting characteristics, and permitting the manufacture of an image forming apparatus having an excellent display quality to be retained for a long time. The image forming apparatus is manufactured by forming a plurality of pairs of electrodes (2, 3) on a first substrate (1), forming a polymer film containing a photosensitive material such that the polymer film makes a connection between the electrodes (2, 3), patterning the polymer film into a desired configuration by the irradiation of light, lowering the resistance of the patterned polymer film to form a conductive film (6null), and forming a gap (5null) in a part of the conductive film (6null) by the flow of a current between the electrodes (2, 3). Subsequently, the first substrate 1 and the second substrate on which an image forming member is disposed are connected through a joining member under a reduced pressure atmosphere to construct an image forming apparatus.
Abstract:
A vacuum microelectronic device (10,40) emits electrons (37) from surfaces of nanotube emitters (17, 18). Extracting electrons from the surface of each nanotube emitter (17) results is a small voltage variation between each emitter utilized in the device (10, 40). Consequently, the vacuum microelectronic device (10,40) has a more controllable turn-on voltage and a consistent current density from each nanotube emitter (17,18).
Abstract:
An electron-emitting device comprises a pair of oppositely disposed electrodes and an electroconductive film inclusive of an electron-emitting region arranged between the electrodes. The electric resistance of the electroconductive film is reduced after forming the electron-emitting region in the course of manufacturing the electron-emitting device.
Abstract:
A field emission display having a base plate which has a focus ring structure substantially planar with the extraction grid. The field emission display base plate is fabricated on a substrate having a cathode including an emitter tip formed thereon by depositing a first insulating layer, a first conductive layer over the first insulating layer, etching the first conductive layer, depositing a second insulating layer over the etched first conductive layer, and depositing a second conductive or focus ring layer over the second insulating layer. A second selective etching may be formed to further define the gate and focus ring structures.
Abstract:
Disclosed is a method of fabricating a nano-tube that enables shortly cutting off said nano-tube without deteriorating said same and that when said nano-tube is used as said emitter can provide an improved flat-ability of said surface of said emitter, a method of manufacturing a field-emission type cold cathode that can provide an improved flat-ability of said surface of said emitter and that resultantly can cause an emission of a uniform, stable high-emission electric current, and a method of manufacturing a display device that includes a method of fabricating a nano-tube and/or a method of manufacturing a field-emission type cold cathode. The method of fabricating a nano-tube according to said present invention includes said step of radiating ions 2 onto a nano-tube 1 and said step of oxidizing said nano-tube 1.
Abstract:
An electron emitter is produced by applying a work function lowering material that does not require an extensive heating step before the material will function to lower the work function. By eliminating the extensive heating step, a small radius, highly tapered emitter tip will retain its shape to consistently produce a high angular intensity at a reasonable output power level.
Abstract:
A plasma display panel using carbon nanotubes is provided. In the front panel of the plasma display panel, transparent electrodes are formed as strips on the glass substrate. Bus electrodes are each formed as strips along the outer edge on the upper surface of each of the transparent electrodes and in parallel to the transparent electrodes. A dielectric layer is formed on part of the glass substrate, parts of the transparent electrodes, and the bus electrodes. Carbon nanotube strips are aligned on the dielectric layer such that the carbon nanotube strips face the transparent electrodes. A protective layer is formed on part of the dielectric layer and the carbon nanotube strips. Accordingly, the secondary electron emission characteristic is improved, resulting in a high-quality display screen having a high luminous efficiency and a high contrast ratio.
Abstract:
The present invention relates to a process for manufacturing a plasma panel tile, comprising the deposition of electrodes, using a paste comprising a metal powder and a mineral binder, and the baking of the deposited electrodes. According to the invention, the composition of the mineral binder and the baking conditions are tailored so that, after the deposited electrodes have been baked, the binder is in the recrystallized state. Owing to the recrystallized state of the binder, the yellowing problems which occur during subsequent heat treatments are eliminated.