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    Micromirror unit and method of making the same
    202.
    发明授权
    Micromirror unit and method of making the same 有权
    微镜单元及其制作方法

    公开(公告)号：US08107157B2

    公开(公告)日：2012-01-31

    申请号：US11480512

    申请日：2006-07-05

    Applicant: Osamu Tsuboi ,  Satoshi Ueda ,  Yoshihiro Mizuno ,  Ippei Sawaki ,  Fumio Yamagishi

    Inventor： Osamu Tsuboi ,  Satoshi Ueda ,  Yoshihiro Mizuno ,  Ippei Sawaki ,  Fumio Yamagishi

    IPC: G02B26/00

    CPC classification number: B81C1/00142 ,  B81B3/0078 ,  B81B2201/042 ,  B81B2201/045 ,  B81B2203/0136 ,  B81B2203/0181 ,  B81B2203/058 ,  B81C1/00396 ,  G02B26/0841 ,  Y10S359/904

    Abstract: A method is provided for making a micromirror unit which includes a frame, a mirror forming base, and bridges connecting the frame to the mirror forming base. The method includes the following steps. First, a first mask pattern is formed on a substrate for masking portions of the substrate which are processed into the frame and the mirror forming base. Then, a second mask pattern is formed on the substrate for masking portions of the substrate which are processed into the bridges. Then, the substrate is subjected to a first etching process with the first and the second mask patterns present as masking means. Then, the second mask pattern is removed selectively. Then, the substrate is subjected to a second etching process with the first mask pattern present as masking means. Finally, the first mask pattern is removed.

    Abstract translation: 提供了一种用于制造微镜单元的方法，该微镜单元包括框架，反射镜形成基座和将框架连接到反射镜形成基座的桥。 该方法包括以下步骤。 首先，在基板上形成第一掩模图案，以掩蔽基板的被加工成框架和反射镜形成基座的部分。 然后，在衬底上形成第二掩模图案，用于掩蔽加工成桥的衬底部分。 然后，以第一和第二掩模图形作为掩模装置对基板进行第一蚀刻处理。 然后，选择性地去除第二掩模图案。 然后，以第一掩模图案作为掩模装置对基板进行第二蚀刻处理。 最后，删除第一个掩模图案。

    Capacitive MEMS device with programmable offset voltage control
    203.
    发明授权
    Capacitive MEMS device with programmable offset voltage control 失效
    具有可编程失调电压控制的电容式MEMS器件

    公开(公告)号：US07729036B2

    公开(公告)日：2010-06-01

    申请号：US11938673

    申请日：2007-11-12

    Applicant: Daniel Felnhofer ,  Evgeni Gousev

    Inventor： Daniel Felnhofer ,  Evgeni Gousev

    IPC: G02B26/00 ,  G02B26/02

    CPC classification number: B81B3/0086 ,  B81B2201/045 ,  G02B26/001 ,  G11C23/00

    Abstract: A capacitive MEMS device is formed having a material between electrodes that traps and retains charges. The material can be realized in several configurations. It can be a multilayer dielectric stack with regions of different band gap energies or band energy levels. The dielectric materials can be trappy itself, i.e. when defects or trap sites are pre-fabricated in the material. Another configuration involves a thin layer of a conductive material with the energy level in the forbidden gap of the dielectric layer. The device may be programmed (i.e. offset and threshold voltages pre-set) by a method making advantageous use of charge storage in the material, wherein the interferometric modulator is pre-charged in such a way that the hysteresis curve shifts, and the actuation voltage threshold of the modulator is significantly lowered. During programming phase, charge transfer between the electrodes and the materials can be performed by applying voltage to the electrodes (i.e. applying electrical field across the material) or by UV-illumination and injection of electrical charges over the energy barrier. The interferometric modulator may then be retained in an actuated state with a significantly lower actuation voltage, thereby saving power.

    Abstract translation: 形成电容MEMS器件，其具有陷阱并保持电荷的电极之间的材料。 该材料可以在几种配置中实现。 它可以是具有不同带隙能量或带能级的区域的多层电介质叠层。 电介质材料本身可以是歪斜的，即当在材料中预先制造缺陷或捕获位置时。 另一种结构涉及导电材料的薄层，其中电介质层的禁止间隙具有能级。 可以通过有利地使用材料中的电荷存储的方法来对器件进行编程（即，偏移和阈值电压预设），其中干涉式调制器以滞后曲线偏移的方式预充电，并且致动电压 调制器的阈值显着降低。 在编程阶段期间，电极和材料之间的电荷转移可以通过向电极施加电压（即跨越材料施加电场）或通过UV照射和在能量屏障上注入电荷来执行。 然后干涉式调制器可以以明显更低的致动电压保持在致动状态，从而节省功率。

    Actuator having fixed and movable comb electrodes
    204.
    发明授权
    Actuator having fixed and movable comb electrodes 有权
    执行器具有固定和可移动的梳状电极

    公开(公告)号：US07719163B2

    公开(公告)日：2010-05-18

    申请号：US11443471

    申请日：2006-05-30

    Applicant: Mitsuhiro Yoda ,  Keiji Isamoto ,  Hiroshi Toshiyoshi

    Inventor： Mitsuhiro Yoda ,  Keiji Isamoto ,  Hiroshi Toshiyoshi

    IPC: H02N1/00 ,  G02B26/08

    CPC classification number: B81B3/004 ,  B81B2201/042 ,  B81B2201/045 ,  H02N1/008

    Abstract: An actuator that can be driven at a reduced voltage and manufactured with ease, and a method for manufacturing the same are provided. The actuator includes second supporting portions 31 and 32 secured to a supporting substrate 4 through a spacer, fixed portions 33 and 34 secured to the supporting substrate 4 with no intervention of the spacer, fixed comb electrodes 331 and 341 integrally formed the fixed portions 33 and 34 and meshing with movable comb electrodes 211 and 212 in a spaced-apart relationship, and bridge portions 35 and 36 for connecting the fixed portions 33 and 34 to the second supporting portions 31 and 32. The fixed portions 33 and 34 are affixed to the supporting substrate 4 in a condition that they are deflected toward the supporting substrate 4 with respect to the second supporting portions 31 and 32 while bending the bridge portions 35 and 36, thereby initially deflecting the fixed comb electrodes 331 and 341 so as to be out of alignment with the movable comb electrodes 211 and 212 in a thickness direction of the supporting substrate 4.

    Abstract translation: 提供能够以降低的电压驱动并且容易制造的致动器及其制造方法。 致动器包括通过间隔件固定到支撑基板4的第二支撑部分31和32，固定在支撑基板4上的固定部分33和34，而不需要间隔件，固定梳状电极331和341一体地形成固定部分33和 并且与间隔开的可动梳状电极211,212啮合，以及用于将固定部33,34连接到第二支撑部31,32的桥接部35,36。固定部33,34固定在 支撑基板4在弯曲桥接部分35和36的同时相对于第二支撑部分31和32偏转到支撑基板4的状态，从而最初偏转固定梳状电极331和341以便脱离 在支撑基板4的厚度方向上与可动梳状电极211和212对准。

    MICRO-ELECTROMECHANICAL MICROSHUTTER ARRAY
    205.
    发明申请
    MICRO-ELECTROMECHANICAL MICROSHUTTER ARRAY 有权
    微电子显微镜阵列

    公开(公告)号：US20100118176A1

    公开(公告)日：2010-05-13

    申请号：US12690975

    申请日：2010-01-21

    Applicant: John N. Border ,  Herbert J. Erhardt ,  J. Kelly Lee ,  Marek W. Kowarz ,  Robert M. Boysel

    Inventor： John N. Border ,  Herbert J. Erhardt ,  J. Kelly Lee ,  Marek W. Kowarz ,  Robert M. Boysel

    IPC: H04N5/238 ,  G02B26/02

    CPC classification number: B81B7/04 ,  B81B2201/045 ,  G02B26/02 ,  G02B26/0841

    Abstract: A microshutter array has a frame having a light transmissive portion. Linear microshutter elements extend across the light transmissive portion and in parallel to each other. Each microshutter element has a flat blade extended in a length direction and first and second torsion arms extending outwards from each side of the blade in the length direction, the blade extending across the light transmissive portion. There is at least one electrode associated with each linear microshutter element and extended in the length direction parallel to the microshutter element.

    Abstract translation: 微型扫描器阵列具有具有透光部分的框架。 线性微型振荡器元件延伸穿过光透射部分并且彼此平行。 每个微型振动元件具有在长度方向上延伸的平坦叶片，并且第一和第二扭转臂在长度方向上从叶片的每侧向外延伸，叶片延伸穿过透光部分。 至少有一个电极与每个线性微型切割器元件相关联并且在长度方向上平行于微型振动器元件延伸。

    OPTICAL INTERFERENCE DISPLAY PANEL AND MANUFACTURING METHOD THEREOF
    206.
    发明申请
    OPTICAL INTERFERENCE DISPLAY PANEL AND MANUFACTURING METHOD THEREOF 有权
    光学干涉显示面板及其制造方法

    公开(公告)号：US20090219605A1

    公开(公告)日：2009-09-03

    申请号：US12463312

    申请日：2009-05-08

    Applicant: Wen-Jian Lin ,  Brian Arbuckle ,  Brian Gally ,  Philip Floyd ,  Lauren Palmateer

    Inventor： Wen-Jian Lin ,  Brian Arbuckle ,  Brian Gally ,  Philip Floyd ,  Lauren Palmateer

    IPC: G02B26/00

    CPC classification number: G02B26/001 ,  B81B7/0012 ,  B81B2201/045

    Abstract: A first electrode and a sacrificial layer are sequentially formed on a substrate, and then first openings for forming supports inside are formed in the first electrode and the sacrificial layer. The supports are formed in the first openings, and then a second electrode is formed on the sacrificial layer and the supports, thus forming a micro electro mechanical system structure. Afterward, an adhesive is used to adhere and fix a protection structure to the substrate for forming a chamber to enclose the micro electro mechanical system structure, and at least one second opening is preserved on sidewalls of the chamber. A release etch process is subsequently employed to remove the sacrificial layer through the second opening in order to form cavities in an optical interference reflection structure. Finally, the second opening is closed to seal the optical interference reflection structure between the substrate and the protection structure.

    Abstract translation: 第一电极和牺牲层依次形成在基板上，然后在第一电极和牺牲层中形成用于形成支撑件的第一开口。 支撑件形成在第一开口中，然后在牺牲层和支撑件上形成第二电极，从而形成微机电系统结构。 之后，使用粘合剂将保护结构粘附并固定到基底上以形成腔室以包围微机电系统结构，并且至少一个第二开口保留在腔室的侧壁上。 随后采用释放蚀刻工艺以通过第二开口去除牺牲层，以便在光学干涉反射结构中形成空腔。 最后，关闭第二个开口以密封衬底和保护结构之间的光学干涉反射结构。

    Micro-optic device and method of manufacturing same
    207.
    发明授权
    Micro-optic device and method of manufacturing same 失效
    微光器件及其制造方法

    公开(公告)号：US07515783B2

    公开(公告)日：2009-04-07

    申请号：US10942583

    申请日：2004-09-16

    Applicant: Yoshichika Kato ,  Satoshi Yoshida ,  Keiichi Mori ,  Kenji Kondou ,  Yoshihiko Hamada ,  Osamu Imaki

    Inventor： Yoshichika Kato ,  Satoshi Yoshida ,  Keiichi Mori ,  Kenji Kondou ,  Yoshihiko Hamada ,  Osamu Imaki

    IPC: G02B6/26

    CPC classification number: G02B6/3584 ,  B81B3/0083 ,  B81B2201/045 ,  B81C1/00182 ,  G02B6/122 ,  G02B6/136 ,  G02B6/3514 ,  G02B6/3518 ,  G02B6/3546 ,  G02B6/357 ,  G02B6/3596 ,  G02B26/0841

    Abstract: A micro-optic device including a complicate structure and a movable mirror is made to be manufactured in a reduced length of time. A silicon substrate and a single crystal silicon device layer with an intermediate layer of silicon dioxide interposed therebetween defines a substrate on which a layer of mask material is formed and is patterned to form a mask having the same pattern as the configuration of the intended optical device as viewed in plan view. A surface which is to be constructed as a mirror surface is chosen to be in a plane of the silicon crystal. Using the mask, the device layer is vertically etched by a reactive ion dry etching until the intermediate layer is exposed. Subsequently, using KOH solution, a wet etching which is anisotropic to the crystallographic orientation is performed with an etching rate which is on the order of 0.1 μm/min for a time interval on the order of ten minutes is performed to convert the sidewall surface of the mirror into a smooth crystallographic surface. Subsequently, the intermediate layer is selectively subject to a wet etching to remove the intermediate layer only in an area located below the movable part of the optical device.

    Abstract translation: 制造包括复杂结构的微光学装置和可移动反射镜以缩短的时间来制造。 硅衬底和介于其间的二氧化硅中间层的单晶硅器件层限定了其上形成有掩模材料层的衬底并且被图案化以形成具有与所需光学器件的配置相同的图案的掩模 如平面图所示。 要被构造为镜面的表面被选择为在硅晶体的平面内。 使用掩模，通过反应离子干蚀刻垂直蚀刻器件层，直到中间层露出。 随后，使用KOH溶液，对晶体取向进行各向异性的湿式蚀刻，以10分钟左右的时间间隔进行蚀刻速度为0.1μm/分钟左右的蚀刻速度， 镜子变成光滑的结晶表面。 随后，中间层选择性地进行湿式蚀刻，仅在位于光学器件的可移动部分下方的区域中除去中间层。

    Micro Electro Mechanical Systems device
    208.
    发明申请
    Micro Electro Mechanical Systems device 失效
    微机电系统设备

    公开(公告)号：US20090002798A1

    公开(公告)日：2009-01-01

    申请号：US12215401

    申请日：2008-06-27

    Applicant: Yasuhiro Ohmori

    Inventor： Yasuhiro Ohmori

    IPC: G02B26/08 ,  H01L21/302

    CPC classification number: G02B26/0841 ,  B81B3/0086 ,  B81B2201/045 ,  B81B2203/019 ,  B81B2203/0384 ,  H02N1/002

    Abstract: An aspect of the embodiment, a MEMS device includes a rotating unit, a first hinge, a first frame and an actuator. The actuator has a plurality of electrodes for rotating the rotating unit. The first frame has one of the electrodes. A portion of silicon layer by the electrode of the frame is chamfered.

    Abstract translation: 在该实施例的一个方面，MEMS器件包括旋转单元，第一铰链，第一框架和致动器。 致动器具有用于旋转旋转单元的多个电极。 第一框架具有一个电极。 通过框架的电极的一部分硅层被倒角。

    MICROMIRROR DEVICE WITH A HYBRID ACTUATOR
    209.
    发明申请
    MICROMIRROR DEVICE WITH A HYBRID ACTUATOR 有权
    具有混合致动器的微型设备

    公开(公告)号：US20080137165A1

    公开(公告)日：2008-06-12

    申请号：US11945307

    申请日：2007-11-27

    Applicant: AbdulJaleel K. Moidu

    Inventor： AbdulJaleel K. Moidu

    IPC: G02B26/08 ,  B29D11/00

    CPC classification number: G02B26/0841 ,  B81B3/0062 ,  B81B2201/033 ,  B81B2201/045 ,  B81B2203/058

    Abstract: A hybrid electro-static actuator for rotating a two-dimensional micro-electro-mechanical micro-mirror device about two perpendicular axes includes a vertical comb drive for rotating the micro-mirror about a tilt axis, and a parallel plate drive for rotating the micro-mirror about a roll axis. The rotor comb fingers of the comb drive extend from a sub-frame of the micro-mirror, which is only rotatable about the tilt axis, while one of the parallel plate electrodes is mounted on the underside of a main platform, which generally surrounds the sub-frame. The vertical comb drive rotates both the sub-frame and the main platform about the tilt axis, while the parallel plate drive only rotates the main platform about the roll axis.

    Abstract translation: 用于围绕两个垂直轴旋转二维微机电微反射镜装置的混合静电致动器包括用于围绕倾斜轴旋转微镜的垂直梳齿驱动器和用于旋转微型 - 关于卷轴的镜像。 梳状驱动器的转子梳齿从微反射镜的子框架延伸，微镜的子框架只能绕倾斜轴线旋转，而平行板电极中的一个安装在主平台的下侧，主平台大体围绕着 子框架 垂直梳齿驱动器使副框架和主平台围绕倾斜轴线旋转，而平行板驱动器仅使主平台围绕辊轴线旋转。

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