公开(公告)号：US20240409681A1

公开(公告)日：2024-12-12

申请号：US18698296

申请日：2022-10-17

Applicant: ADEKA CORPORATION

Inventor： Shota KOBAYASHI ,  Ken-ichi TAMASO

IPC: C08G59/62 ,  C08G59/40 ,  C08K5/13 ,  C08K5/3445

Abstract: A clathrate compound obtained by mixing an imidazole compound (A) and a polyhydric phenol compound (B), wherein the clathrate compound has an average particle size (X) of 7 μm or less, and a maximum particle size (Y) of 40 μm or less. The imidazole compound (A) is preferably at least one selected from compounds represented by the following formula (1), where R1, R2, R3, and R4 each independently represent a hydrogen atom, an alkyl group that has 1 to 20 carbon atoms and may have a substituent, or an aryl group that has 6 to 20 carbon atoms and may have a substituent, and the substituent is at least one selected from a halogen atom, a hydroxy group, and a nitrile group.

公开(公告)号：US20240352203A1

公开(公告)日：2024-10-24

申请号：US18577499

申请日：2022-07-15

Applicant: ADEKA CORPORATION

Inventor： Hiromasa SAITO ,  Yousuke MURAMATSU ,  Mizuki SUZUKI ,  Masatomi IRISAWA

IPC: C08J5/18 ,  C07D487/04 ,  C08G61/12

CPC classification number: C08J5/18 ,  C07D487/04 ,  C08G61/124 ,  C08G2261/11 ,  C08G2261/1414 ,  C08G2261/1422 ,  C08G2261/1424 ,  C08G2261/148 ,  C08G2261/228 ,  C08G2261/3241 ,  C08J2365/00

Abstract: A material for forming a film for a semiconductor provides a film having excellent heat resistance and solvent resistance. It contains: a compound represented by general formula (I) and having at least one reactive group, or a polymer including, as a monomer, a compound represented by general formula (I) below and having at least one reactive group; and a solvent. In the formula, A represents a hydrocarbon ring having 6 carbon atoms, X1 and X2 each represent an aryl group having 6-30 carbon atoms and optionally substituted by a reactive group or a group having a reactive group. R1-R4 and R6-R9 each represent a hydrogen atom, a hydrocarbon group having 1-20 carbon atoms and optionally substituted by a reactive group or a group having a reactive group. R5 and R10 each represent a hydrogen atom, a hydrocarbon group having 1-20 carbon atoms and optionally substituted by a reactive group.

公开(公告)号：US12104245B2

公开(公告)日：2024-10-01

申请号：US17771181

申请日：2020-10-19

Applicant: ADEKA CORPORATION

Inventor： Atsushi Sakurai ,  Masako Hatase ,  Masaki Enzu ,  Keisuke Takeda ,  Ryota Fukushima ,  Atsushi Yamashita

IPC: C23C16/18 ,  C07D487/10 ,  C07F1/00 ,  C07F3/00 ,  C07F7/22 ,  C07F13/00 ,  C07F15/04 ,  C07F15/06 ,  C23C16/455

CPC classification number: C23C16/18 ,  C07D487/10 ,  C07F1/005 ,  C07F3/003 ,  C07F7/2284 ,  C07F13/005 ,  C07F15/045 ,  C07F15/065 ,  C23C16/45553

Abstract: Provided is a thin-film forming raw material containing a compound represented by the following formula (1):




in the formula (1), R1 to R5 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a group containing a fluorine atom, M represents a metal atom, and “n” represents a valence of the metal atom represented by M, provided that at least one of R2, R3, and R4 represents the group containing a fluorine atom.

公开(公告)号：US20240316250A1

公开(公告)日：2024-09-26

申请号：US18734282

申请日：2024-06-05

Applicant: NATIONAL UNIVERSITY CORPORATION TOKYO MEDICAL AND DENTAL UNIVERSITY ,  SAPPORO MEDICAL UNIVERSITY ,  ADEKA CORPORATION ,  KM Biologics Co., Ltd.

Inventor： Junichi MATSUDA ,  Sumika MIYABASHIRA ,  Satomi HARANO ,  Akio KISHIDA ,  Tsuyoshi KIMURA ,  Jun NEGISHI ,  Tetsuya HIGAMI ,  Seiichi FUNAMOTO ,  Ken-Ichiro HIWATARI ,  Akiko TASAKI

IPC: A61L27/52 ,  A61K35/22 ,  A61K35/30 ,  A61K35/34 ,  A61K35/407 ,  A61K35/42 ,  A61K38/36 ,  A61K38/48 ,  A61L27/22 ,  A61L27/26 ,  A61L27/36 ,  A61L27/54 ,  C12N5/00

CPC classification number: A61L27/52 ,  A61K35/22 ,  A61K35/30 ,  A61K35/34 ,  A61K35/407 ,  A61K35/42 ,  A61K38/363 ,  A61K38/4833 ,  A61L27/225 ,  A61L27/26 ,  A61L27/3633 ,  A61L27/3683 ,  A61L27/3691 ,  A61L27/3695 ,  A61L27/54 ,  C12N5/0068 ,  A61L2430/00 ,  A61L2430/20 ,  A61L2430/32 ,  C12N2533/50 ,  C12N2533/56 ,  C12N2533/90

Abstract: A hybrid gel comprising a particulate decellularized tissue (obtained by pulverizing animal-derived biological tissues that are decellularized (decellularized biological tissues)), fibrinogen and thrombin; a cell culture material comprising the hybrid gel; a method for preparing the hybrid gel; and a kit comprising a particulate decellularized tissue and a biological tissue adhesive are provided. The hybrid gel of the present invention exerts the effect to promote differentiation and gain of function of stem cells and the therapeutic effect to a variety of diseases.

公开(公告)号：US20240301128A1

公开(公告)日：2024-09-12

申请号：US18565337

申请日：2022-06-22

Applicant: ADEKA CORPORATION

Inventor： Sho SUZUKI ,  Ippei OKANO ,  Ken-ichi TAMASO

IPC: C08G59/22 ,  C08G59/24 ,  C08G59/50 ,  C08G59/66

CPC classification number: C08G59/223 ,  C08G59/245 ,  C08G59/50 ,  C08G59/66

Abstract: An epoxy material that provides a cured product having a reduced modulus of elasticity and thereby maintaining reliability even under conditions of wide environmental variation. The epoxy resin composition provided includes (A) an epoxy compound A of formula (1) below, (B) phenyl glycidyl ether substituted with a C6-20 hydrocarbon group, and (C) a curing agent. In formula (1), R1 and R2 each independently represent C2-4 alkylene; R3 represents methylene or —C(CH3)2—; and a and b each independently represent a number of 1 to 10.

公开(公告)号：US12013637B2

公开(公告)日：2024-06-18

申请号：US17256320

申请日：2019-06-27

Applicant: ADEKA CORPORATION

Inventor： Yoshitomo Takeuchi ,  Taiki Mihara ,  Naomi Sato ,  Kazushi Matsukawa

IPC: G03F7/031 ,  C07D209/14 ,  C07D209/86 ,  C08F2/50 ,  G02B5/22 ,  G03F7/00

CPC classification number: G03F7/031 ,  C07D209/14 ,  C07D209/86 ,  C08F2/50 ,  G02B5/223 ,  G03F7/0007

Abstract: An oxime ester compound is useful as a photopolymerization initiator used in a polymerizable composition. A photopolymerization initiator contains the oxime ester compound. The oxime ester compound contains, in the same molecule: a group represented by the following Formula (I); and a photoradical cleavable group containing no oxime ester group.

公开(公告)号：US20240167154A1

公开(公告)日：2024-05-23

申请号：US18280559

申请日：2022-02-24

Applicant: ADEKA CORPORATION

Inventor： Atsushi SAKURAI ,  Yoshiki OOE ,  Keisuke TAKEDA ,  Chiaki MITSUI ,  Atsushi YAMASHITA

IPC: C23C16/455

CPC classification number: C23C16/45553 ,  C23C16/45527

Abstract: Provided is a thin-film forming raw material, which is used in an atomic layer deposition method, including a compound represented by the following general formula (1):


M(R1)x1[A1-N(R2)(R3)]y1   (1)

in the formula (1), R1, R2, and R3 each independently represent a linear or branched alkyl group having 1 to 4 carbon atoms, A1 represents a linear or branched alkylene group having 1 to 5 carbon atoms, x1 represents an integer of from 0 to 2, y1 represents an integer of from 1 to 3, and M represents an indium atom or a zinc atom, provided that when M represents an indium atom, a compound in which x1 represents 2, y1 represents 1, and R1, R2, and R3 each represent a methyl group is excluded.

公开(公告)号：US20240141094A1

公开(公告)日：2024-05-02

申请号：US18547066

申请日：2022-02-08

Applicant: ADEKA CORPORATION

Inventor： Kohei HIRAYAMA ,  Keisuke OTA ,  Ryo OGAWA ,  Shinsuke YAMADA

IPC: C08G59/24 ,  C08G59/28 ,  C08G59/34 ,  C08G59/50 ,  C08G59/56 ,  C08K3/08 ,  C08K3/36 ,  C08L61/14 ,  C09J163/08

CPC classification number: C08G59/245 ,  C08G59/28 ,  C08G59/34 ,  C08G59/502 ,  C08G59/56 ,  C08K3/08 ,  C08K3/36 ,  C08L61/14 ,  C09J163/08 ,  C08K2003/0812 ,  C08K2201/003 ,  C08L2205/025 ,  C08L2205/035

Abstract: A curing resin composition including (A) a cyanate ester resin, (B) an epoxy resin, (C) an active hydrogen-containing amine latent curing agent, and (D) an ion scavenger. The cyanate ester resin (A) is preferably at least one of a compound of formula (1) below, a compound of formula (2) below, and a polymer of at least one of these compounds (1) and (2).


NC—O-A1-Y1-A2-O—CN  (1)

wherein the symbols are as defined in the description.






wherein the symbols are as defined in the description.

公开(公告)号：US20240132453A1

公开(公告)日：2024-04-25

申请号：US18275517

申请日：2022-02-02

Applicant: ADEKA CORPORATION

Inventor： Takuya TAKAHASHI ,  Shinya ISHIWATA ,  Tomoko HATSUKADE

IPC: C07D251/32 ,  C25D3/38

CPC classification number: C07D251/32 ,  C25D3/38

Abstract: Provided is an additive for an electroplating solution, including a reaction product of at least one kind of epoxy compound (a1) represented by the general formula (1) and at least one kind of tertiary amine compound (a2): where L1 and L2 each independently represent a hydrogen atom, an alkyl group




having 1 to 5 carbon atoms, or a group represented by any one of the general formulae (L-1) to (L-3), and n represents an integer of from 1 to 5:




where m1 to m3 each independently represent an integer of from 1 to 5, and * represents a bonding site.

公开(公告)号：US20240018655A1

公开(公告)日：2024-01-18

申请号：US18037206

申请日：2021-11-16

Applicant: ADEKA CORPORATION

Inventor： Akihiro NISHIDA ,  Masako HATASE ,  Tomoharu YOSHINO ,  Yoshiki OOE ,  Chiaki MITSUI

IPC: C23C16/455 ,  C07F7/00 ,  C01G27/02 ,  C23C16/40

CPC classification number: C23C16/45553 ,  C07F7/003 ,  C01G27/02 ,  C23C16/45527 ,  C23C16/405 ,  H01L21/02181

Abstract: Provided is a method of producing a thin-film containing a hafnium atom on a surface of a substrate by an atomic layer deposition method, including: a step 1 of causing a raw material gas obtained by vaporizing a thin-film forming raw material containing a hafnium compound represented by the following general formula (1) to adsorb to the surface of the substrate to form a precursor thin-film; a step 2 of evacuating the raw material gas remaining unreacted; and a step 3 of causing the precursor thin-film to react with a reactive gas at a temperature of 300° C. or more and less than 450° C. to form the thin-film containing a hafnium atom on the surface of the substrate:






wherein R1 and R2 each independently represent a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and R3 and R4 each independently represent an alkyl group having 1 to 3 carbon atoms.