公开(公告)号：US20230311173A1

公开(公告)日：2023-10-05

申请号：US18206887

申请日：2023-06-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey NIKIPELOV ,  Dmitry KURILOVICH ,  Fabio SBRIZZAI ,  Marcus Adrianus VAN DE KERKHOF ,  Ties Wouter VAN DER WOORD ,  Willem Joan VAN DER ZANDE ,  Jeroen VAN DUIVENBODE ,  David Ferdinand VLES

IPC: B08B6/00 ,  B08B7/02 ,  B08B7/04 ,  G03F1/62 ,  G03F1/82

CPC classification number: B08B6/00 ,  B08B7/02 ,  B08B7/04 ,  G03F1/62 ,  G03F1/82

Abstract: A membrane cleaning apparatus for removing particles from a membrane, the apparatus including a membrane support and an electric field generating mechanism. The membrane support is for supporting the membrane. The electric field generating mechanism is for generating an electric field in the vicinity of the membrane when supported by the membrane support. The electric field generating mechanism may include: one or more collector electrodes; and a mechanism for applying a voltage across a membrane supported by the membrane support and the or each of the one or more collector electrodes.

公开(公告)号：US20190227445A1

公开(公告)日：2019-07-25

申请号：US16326948

申请日：2017-08-11

Applicant: ASML Netherlands B.V.

Inventor： Frits VAN DER MEULEN ,  Erik Johan ARLEMARK ,  Hendrikus Herman Marie COX ,  Martinus Agnes Willem CUIJPERS ,  Joost DE HOOGH ,  Gosse Charles DE VRIES ,  Paul Comé Henri DE WIT ,  Sander Catharina Reinier DERKS ,  Ronald Comelis Gerardus GIJZEN ,  Dries Vaast Paul HEMSCHOOTE ,  Christiaan Alexander HOOGENDAM ,  Adrianus Hendrik KOEVOETS ,  Raymond Wilhelmus Louis LAFARRE ,  Alain Louis Claude LEROUX ,  Patrick Willem Paul LIMPENS ,  Jim Vincent OVERKAMP ,  Christiaan Louis VALENTIN ,  Koos VAN BERKEL ,  Stan Henricus VAN DER MEULEN ,  Jacobus Comelis Gerardus VAN DER SANDEN ,  Harmen Klaas VAN DER SCHOOT ,  David Ferdinand VLES ,  Evert Auke Rinze WESTERHUIS

IPC: G03F7/20

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

公开(公告)号：US20180239240A1

公开(公告)日：2018-08-23

申请号：US15752302

申请日：2016-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Zomer Silvester HOUWELING ,  Eric Willem Felix CASIMIRI ,  Tamara DRUZHININA ,  JANSSEN Paul ,  Michael Alfred Josephus KUIJKEN ,  Martinus Hendrikus Antonius LEENDERS ,  Sicco OOSTERHOFF ,  Mária PÉTER ,  Willem Joan VAN DER ZANDE ,  Pieter-Jan VAN ZWOL ,  Beatrijs Louise Marie-Joseph Katrie VERBRUGGE ,  Johannes Petrus Martinus Bernardus VERMEULEN ,  David Ferdinand VLES ,  Willem-Pieter VOORTHUIJZEN

IPC: G03F1/62 ,  G03F7/20

CPC classification number: G03F1/62 ,  G03F7/70983

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.