-
公开(公告)号：US20180373170A1
公开(公告)日：2018-12-27
申请号：US16062919
申请日：2016-12-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Paul JANSSEN , Johan Hendrik KLOOTWIJK , Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN , Alexandar Nikolov ZDRAVKOV
Abstract: Methods of manufacturing a membrane assembly where, in one arrangement, a stack includes a planar substrate and at least one membrane layer. The planar substrate includes an inner region, a border region around the inner region, a bridge region around the border region and an edge region around the bridge region. The inner region and a first portion of the bridge region are removed. The membrane assembly after removal has: a membrane formed from the at least one membrane layer, a border holding the membrane, the border formed from the border region, an edge section around the border, the edge section formed from the edge region, a bridge between the border and the edge section, the bridge formed from the at least one membrane layer and a second portion of the bridge region. The method further involves separating the edge section from the border by cutting or breaking the bridge.
-
公开(公告)号：US20180314150A1
公开(公告)日：2018-11-01
申请号：US15545390
申请日：2016-02-01
Applicant: ASML Netherlands B.V.
Inventor： Derk Servatius Gertruda BROUNS , Dennis DE GRAAF , Robertus Cornelis Martinus DE KRUIF , Paul JANSSEN , Matthias KRUIZINGA , Arnoud Willem NOTENBOOM , Daniel Andrew SMITH , Beatrijs Louise Marie-Joseph Katrien VERBRUGGE , James Norman WILEY
Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
-
公开(公告)号：US20170363969A1
公开(公告)日：2017-12-21
申请号：US15527645
申请日：2015-09-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Marc HAUPTMANN , Dylan John David DAVIES , Paul JANSSEN , Naoko TSUGAMA , Richard Joseph BRULS , Kornelis Tijmen HOEKERD , Edwin Johannes Maria JANSSEN , Petrus Johannes VAN DEN OEVER , Ronald VAN DER WILK , Antonius Hubertus VAN SCHIJNDEL , Jorge Alberto VIEYRA SALAS
CPC classification number: G03F7/70616 , G01N21/9501 , G01N27/61 , G01N2021/95676 , G03F1/84 , G03F7/70508 , G03F7/70783 , H01L22/12 , H01L22/20
Abstract: A diagnostic apparatus monitors a lithographic manufacturing system. First measurement data representing local deviations of some characteristic across a substrate is obtained using sensors within a lithographic apparatus, and/or a separate metrology tool. Other inspection tools perform substrate backside inspection to produce second measurement data. A high-resolution backside defect image is processed into a form in which it can be compared with lower resolution information from the first measurement data. Cross-correlation is performed to identify which of the observed defects are correlated spatially with the deviations represented in the first measurement data. A correlation map is used to identify potentially relevant clusters of defects in the more detailed original defect map. The responsible apparatus can be identified by pattern recognition as part of an automated root cause analysis. Alternatively, reticle inspection data may be used as second measurement data.
-
-
Search Results
23
records
(took 0.017 seconds)
