公开(公告)号：US20160061590A1

公开(公告)日：2016-03-03

申请号：US14838252

申请日：2015-08-27

Applicant: ASML Netherlands B.V.

Inventor： Nitesh PANDEY

IPC: G01B11/14

CPC classification number: G01B11/14 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7007 ,  G03F9/703

Abstract: A broadband spectroscopic analysis is used for controlling a distance (d) between a miniature solid immersion lens (SIL, 60) and a metrology target (30′). An objective lens arrangement (15, 60) including the SIL illuminates the metrology target with a beam of radiation with different wavelengths and collects a radiation (709) reflected or diffracted by the metrology target. A mounting (64) holds the SIL within a distance from the metrology target that is less than the coherence length of the illuminating radiation (703). A detection arrangement (812, 818) produces a spectrum of the radiation reflected or diffracted by the metrology target. The distance between the SIL and the metrology target or other target surface can be inferred from spectral shifts observed in the detected spectrum. Servo control of the distance is implemented based on these shifts, using an actuator (66).

Abstract translation: 使用宽带光谱分析来控制微型固体浸没透镜（SIL，60）和测量目标（30'）之间的距离（d）。 包括SIL的物镜布置（15,60）利用具有不同波长的辐射束照亮计量目标，并收集由计量目标反射或衍射的辐射（709）。 安装件（64）将SIL保持在远离测量目标的距离小于照射辐射（703）的相干长度的距离处。 检测装置（812,818）产生由计量目标反射或衍射的辐射的光谱。 SIL和测量目标或其他目标表面之间的距离可以从在检测到的光谱中观察到的光谱偏移推断出来。 使用致动器（66），基于这些偏移来实现距离的伺服控制。

公开(公告)号：US20240004184A1

公开(公告)日：2024-01-04

申请号：US18037957

申请日：2021-11-08

Applicant: ASML Netherlands B.V.

Inventor： Luc Roger Simonne HASPESLAGH ,  Nitesh PANDEY ,  Ties Wouter VAN DER WOORD ,  Halil Gökay YEGEN ,  Sebastianus Adrianus GOORDEN ,  Alexis HUMBLET ,  Alexander Ludwig KLEIN ,  Jim Vincent OVERKAMP ,  Guilherme BRONDANI TORRI ,  Edgar Alberto OSORIO OLIVEROS

IPC: G02B26/08 ,  G03F7/00 ,  B81B7/02

CPC classification number: G02B26/0858 ,  G03F7/70291 ,  G03F7/70116 ,  B81B7/02 ,  B81B2207/11 ,  B81B2207/015

Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one piezoelectric actuator for displacing the mirror, wherein the at least one piezoelectric actuator is connected to the substrate. The micromirror array further comprises one or more pillars connecting the mirror to the at least one piezoelectric actuator. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.

公开(公告)号：US20230062585A1

公开(公告)日：2023-03-02

申请号：US17856213

申请日：2022-07-01

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus TINNEMANS ,  Arie Jeffrey DEN BOEF ,  Armand Eugene Albert KOOLEN ,  Nitesh PANDEY ,  Vasco Tomas TENNER ,  Willem Marie Julia Marcel COENE ,  Patrick WARNAAR

IPC: G03F7/20 ,  G01B11/06 ,  G01B11/02 ,  G01N21/47 ,  G01N21/95 ,  G03F9/00

Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.

公开(公告)号：US20220334497A1

公开(公告)日：2022-10-20

申请号：US17636830

申请日：2020-07-15

Applicant: ASML Netherlands B.V.

Inventor： Nitesh PANDEY

IPC: G03F7/20

Abstract: Disclosed is a detection apparatus for a metrology device operable to measure a parameter of interest from scattered radiation having been scattered from a sample. The detection device comprises a detector comprising an array of pixels. The array of pixels comprises imaging pixels for detecting an image from which the parameter of interest is determined, and direction detecting pixels for detecting the angle of incidence of said scattered radiation on said detector.

公开(公告)号：US20200249584A1

公开(公告)日：2020-08-06

申请号：US16856128

申请日：2020-04-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Robert John SOCHA ,  Arie Jeffrey DEN BOEF ,  Nitesh PANDEY

IPC: G03F7/20 ,  G01N21/88 ,  G01B11/27 ,  G01N21/956

Abstract: A method of adjusting a metrology apparatus, the method including: spatially dividing an intensity distribution of a pupil plane of the metrology apparatus into a plurality of pixels; and reducing an effect of a structural asymmetry in a target on a measurement by the metrology apparatus on the target, by adjusting intensities of the plurality of pixels.

公开(公告)号：US20200072599A1

公开(公告)日：2020-03-05

申请号：US16558457

申请日：2019-09-03

Applicant: ASML Netherlands B.V.

Inventor： Marinus Johannes Maria VAN DAM ,  Arie Jeffrey DEN BOEF ,  Nitesh PANDEY

IPC: G01B11/25 ,  G02F1/33 ,  G02F1/01

Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the apparatus comprising: a radiation source for generating illumination radiation; at least two illumination branches for illuminating the structure on the substrate, the illumination branches being configured to illuminate the structure from different angles; and a radiation switch configured to receive the illumination radiation and transfer at least part of the radiation to a selectable one of the at least two illumination branches.

公开(公告)号：US20200057387A1

公开(公告)日：2020-02-20

申请号：US16540145

申请日：2019-08-14

Applicant: ASML Netherlands B.V.

Inventor： Nitesh PANDEY

IPC: G03F7/20 ,  G01N21/956 ,  G01N21/47

Abstract: A metrology apparatus for determining a parameter of interest of a structure formed by a lithographic process on a substrate, the metrology apparatus comprising: an illuminator for illuminating the structure; a lens for collecting at least a portion of radiation diffracted from the structure; and an image sensor for receiving and obtaining a recording of the collected diffracted radiation; wherein the illuminator comprises at least one optical fiber for illuminating the structure directly.

公开(公告)号：US20190072859A1

公开(公告)日：2019-03-07

申请号：US16117614

申请日：2018-08-30

Applicant: ASML Netherlands B.V.

Inventor： Martin Jacobus Johan JAK ,  Martin EBERT ,  Arie Jeffrey DEN BOEF ,  Nitesh PANDEY

IPC: G03F7/20

Abstract: A method comprising: evaluating a plurality of polarization characteristics associated with measurement of a metrology target of a substrate processed using a patterning process, against one or more measurement quality parameters; and selecting one or more polarization characteristics from the plurality of polarization characteristics based on one or more of the measurement quality parameters

公开(公告)号：US20180246423A1

公开(公告)日：2018-08-30

申请号：US15754470

申请日：2016-08-22

Applicant: ASML Netherlands B.V.

Inventor： Simon Gijsbert Josephus MATHIJSSEN ,  Arie Jeffrey DEN BOEF ,  Nitesh PANDEY ,  Patricius Aloysius Jacobus TINNEMANS ,  Stefan Michiel WITTE ,  Kjeld Sijbrand Eduard EIKEMA

IPC: G03F9/00 ,  G06T7/73 ,  G01B11/27

CPC classification number: G03F9/7003 ,  G01B11/272 ,  G03F9/7046 ,  G03F9/7088 ,  G03F9/7092 ,  G06T7/73

Abstract: A lithographic apparatus comprises comprise a substrate table constructed to hold a substrate; and a sensor configured to sense a position of an alignment mark provided onto the substrate held by the substrate table. The sensor comprises a source of radiation configured to illuminate the alignment mark with a radiation beam, a detector configured to detect the radiation beam, having interacted with the alignment mark, as an out of focus optical pattern, and a data processing system. The data processing system is configured to receive image data representing the out of focus optical pattern, and process the image data for determining alignment information, comprising applying a lensless imaging algorithm to the out of focus optical pattern.

公开(公告)号：US20250067768A1

公开(公告)日：2025-02-27

申请号：US18724551

申请日：2022-12-22

Applicant: ASML Netherlands B.V.

Inventor： Mustafa Ümit ARABUL ,  Zili ZHOU ,  Nitesh PANDEY ,  Coen Adrianus VERSCHUREN ,  Willem Marie Julia Marcel COENE ,  Gerard Jan VERBIEST ,  Peter Gerard STEENEKEN ,  Martin Pierre ROBIN

IPC: G01Q10/04 ,  G01Q60/32 ,  G01Q70/14 ,  G03F7/00

Abstract: The disclosure relates to determining information about a target structure formed on a substrate using a lithographic process. In one arrangement, a cantilever probe is provided having a cantilever arm and a probe element. The probe element extends from the cantilever arm towards the target structure. Ultrasonic waves are generated in the cantilever probe. The ultrasonic waves propagate through the probe element into the target structure and reflect back from the target structure into the probe element or into a further probe element extending from the cantilever arm. The reflected ultrasonic waves are detected and used to determine information about the target structure.