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公开(公告)号：US20240184218A1
公开(公告)日：2024-06-06
申请号：US18441772
申请日：2024-02-14
Applicant: ASML Netherlands B.V.
Inventor： Nitesh PANDEY , Arie Jeffrey DEN BOEF , Duygu AKBULUT , Marinus Johannes Maria VAN DAM , Hans BUTLER , Hugo Augustinus Joseph CRAMER , Engelbertus Antonius Fransiscus VAN DER PASCH , Ferry ZIJP , Jeroen Arnoldus Leonardus Johannes RAAYMAKERS , Marinus Petrus REIJNDERS
IPC: G03F7/00 , G01N21/956
CPC classification number: G03F7/70625 , G01N21/956 , G03F7/7015 , G03F7/70633
Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.
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公开(公告)号：US20200072599A1
公开(公告)日：2020-03-05
申请号：US16558457
申请日：2019-09-03
Applicant: ASML Netherlands B.V.
Inventor： Marinus Johannes Maria VAN DAM , Arie Jeffrey DEN BOEF , Nitesh PANDEY
Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the apparatus comprising: a radiation source for generating illumination radiation; at least two illumination branches for illuminating the structure on the substrate, the illumination branches being configured to illuminate the structure from different angles; and a radiation switch configured to receive the illumination radiation and transfer at least part of the radiation to a selectable one of the at least two illumination branches.
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公开(公告)号：US20190310190A1
公开(公告)日：2019-10-10
申请号：US16362922
申请日：2019-03-25
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Marinus Johannes Maria VAN DAM , Richard Carl Zimmerman
Abstract: An inspection apparatus or lithographic apparatus includes an optical system and a detector. The optical system includes a non-linear prismatic optic. The optical system is configured to receive zeroth and first diffraction order beams reflected from a diffraction target and separate first and second polarizations of each diffraction order beam. The detector is configured to simultaneously detect first and second polarizations of each of the zeroth and first diffraction order beams. Based on the detected first and second polarizations of one or more diffraction orders, an operational parameter of a lithographic apparatus can be adjusted to improve accuracy or precision in the lithographic apparatus. The optical system can include a plurality of non-linear prismatic optics. For example, the optical system can include a plurality of Wollaston prisms.
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Patent Agency Ranking
公开(公告)号：US20160313649A1
公开(公告)日：2016-10-27
申请号：US15105343
申请日：2014-12-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Sven Antoin Johan HOL , Andrea Lodovico MANCUSO , Hendricus Johnnes, Maria MEIJER , Erik Maria REKKERS , Marinus Johannes Maria VAN DAM
IPC: G03F7/20
CPC classification number: G03F7/70191 , G03F7/70758 , G03F7/70825 , G03F7/70941
Abstract: An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets (370). A moving part includes a permanent magnet (362) with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. A ferromagnetic shield (820) is provided around the moving part and has at least one interruption (822) to reduce the influence of adjacent actuators or stray fields whilst also minimizing attraction between the permanent magnet (362) and the shield (820).
Abstract translation: 移动例如反射镜的致动器通过改变两个电磁体（370）中的电流来提供具有至少两个自由度的运动。 移动部件包括永磁体（362），其具有被限制在基本垂直于磁体的磁化方向的第一平面中的工作区域上移动的磁性面。 电磁体具有基本上位于与第一平面紧密平行的第二平面中的极面，每个极面基本上填充由移动磁体的表面穿过的区域的象限。 铁磁屏蔽（820）设置在运动部分的周围，并且具有至少一个中断（822），以减小相邻致动器或杂散磁场的影响，同时还使永磁体（362）和屏蔽（820）之间的吸引力最小化。
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公开(公告)号：US20220299365A1
公开(公告)日：2022-09-22
申请号：US17636308
申请日：2020-07-23
Applicant: ASML Netherlands B.V.
Inventor： Gerbrand VAN DER ZOUW , Marinus Johannes Maria VAN DAM , Jacob SONNEVELD , Ramon Pascal VAN GORKOM
Abstract: Disclosed is a wavelength selection module for a metrology apparatus. The wavelength selection module comprises one or more filter elements being operable to receive an input radiation beam comprising multiple wavelengths to provide selective control of a wavelength characteristic of a corresponding output radiation beam. At least one of said one or more filter elements comprises at least two linear variable filters.
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公开(公告)号：US20210123724A1
公开(公告)日：2021-04-29
申请号：US17141698
申请日：2021-01-05
Applicant: ASML Netherlands B.V.
Inventor： Marinus Johannes Maria VAN DAM , Arie Jeffrey Den Boef , Nitesh Pandey
Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the apparatus comprising: a radiation source configured to generate illumination radiation; at least two illumination branches comprising at least one optical fiber and configured to illuminate a structure on a substrate from different angles; and a radiation switch configured to receive the illumination radiation and transfer at least part of the radiation to a selectable one of the at least two illumination branches.
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公开(公告)号：US20190107786A1
公开(公告)日：2019-04-11
申请号：US16144013
申请日：2018-09-27
Applicant: ASML Netherlands B.V.
Inventor： Johan Maria VAN BOXMEER , Marinus Johannes Maria VAN DAM , Koos VAN BERKEL , Sietse Thijmen VAN DER POST , Johannes Hubertus Antonius VAN DE RIJDT
Abstract: Disclosed is a method of optimizing within an inspection apparatus, the position and/or size (and therefore focus) of a measurement illumination spot relative to a target on a substrate. The method comprises detecting scattered radiation from at least the target resultant from illuminating the target, for different sizes and/or positions of said illumination spot relative to the target; and optimizing said position and/or size of the measurement illumination spot relative to the target based on a characteristic of the detected scattered radiation for the different sizes and/or positions of said illumination spot relative to the target.
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公开(公告)号：US20170242343A1
公开(公告)日：2017-08-24
申请号：US15435593
申请日：2017-02-17
Applicant: ASML Netherlands B.V.
Inventor： Nitesh PANDEY , Arie Jeffrey DEN BOEF , Marinus Johannes Maria VAN DAM
CPC classification number: G03F7/70191 , G01N21/4788 , G01N2021/4711 , G01N2201/063 , G02B5/22 , G03F7/70133 , G03F7/70616 , G03F7/70625
Abstract: A scatterometer performs diffraction based measurements of one or more parameters of a target structure. To make two-color measurements in parallel, the structure is illuminated simultaneously with first radiation (302) having a first wavelength and a first angular distribution and with second radiation (304) having a second wavelength and a second angular distribution. The collection path (CP) includes a segmented wavelength-selective filter (21, 310) arranged to transmit wanted higher order portions of the diffracted first radiation (302X, 302Y) and of the diffracted second radiation (304X, 304Y), while simultaneously blocking zero order portions (302″, 304″) of both the first radiation and second radiation. The illumination path (IP) in one embodiment includes a matching segmented wavelength-selective filter (13, 300), oriented such that a zero order ray passing through the illumination optical system and the collection optical system will be blocked by one of said filters or the other, depending on its wavelength.
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