Inspection Apparatus for Lithography
    22.
    发明申请
    Inspection Apparatus for Lithography 有权
    光刻检验仪

    公开(公告)号:US20110102793A1

    公开(公告)日:2011-05-05

    申请号:US12922587

    申请日:2009-03-24

    Abstract: Four separately polarized beams are simultaneously measured upon diffraction from a substrate (W) to determine properties of the substrate. Linearly, circularly or elliptically polarized radiation is transmitted through a first beam splitter (N-PBS) and split into two polarized beams. These two beams are further split into two further beams using two further beam splitters, the further beam splitters (32,34) being rotated by 45° with respect to each other. The plurality of polarizing beam splitters enables the measurement of the intensity of all four beams and thus the measurement of the phase modulation and amplitude of the combined beams to give the features of the substrate. Algorithms are used to compare the four intensities of each of the polarized angles to give rise to the phase difference between the polarization directions and the ratio between the two main polarization direction amplitudes of the original polarized beam.

    Abstract translation: 在从基底(W)衍射时同时测量四个分离的偏振光束,以确定基底的性质。 线性,圆形或椭圆偏振辐射通过第一分束器(N-PBS)传输并分裂成两个偏振光束。 使用两个另外的分束器将这两个光束进一步分成两个另外的光束,另外的光束分离器(32,34)相对于彼此旋转45°。 多个偏振分束器能够测量所有四个光束的强度,从而测量组合光束的相位调制和振幅,以给出衬底的特征。 算法用于比较每个偏振角的四个强度,以产生偏振方向之间的相位差和原始偏振光束的两个主偏振方向幅度之间的比率。

    Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems
    28.
    发明申请
    Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems 失效
    用于高数值孔径系统的静态和动态径向横向电偏振器

    公开(公告)号:US20050259324A1

    公开(公告)日:2005-11-24

    申请号:US11187848

    申请日:2005-07-25

    CPC classification number: G03F7/70566 G02B5/3058

    Abstract: A radial transverse electric polarizer device is provided. The device includes a first layer of material having a first refractive index, a second layer of material having a second refractive index, and a plurality of elongated elements azimuthally and periodically spaced apart, and disposed between the first layer and the second layer. The plurality of elongated elements interact with electromagnetic waves of radiation to transmit transverse electric polarization of electromagnetic waves of radiation. One aspect of the invention is, for example, to use such polarizer device in a lithographic projection apparatus to increase imaging resolution. Another aspect is to provide a device manufacturing method including polarizing a beam of radiation in a transverse electric polarization.

    Abstract translation: 提供径向横向电偏振器装置。 该器件包括具有第一折射率的第一材料层,具有第二折射率的第二材料层和位于方位角和周期上间隔开的多个细长元件,并且设置在第一层和第二层之间。 多个细长元件与辐射的电磁波相互作用以透射辐射的电磁波的横向电极化。 本发明的一个方面是例如在光刻投影设备中使用这种偏振器装置来增加成像分辨率。 另一方面是提供一种包括在横向电极化中偏振辐射束的装置制造方法。

    Lens system with lens elements arranged in a gas-filled holder and
photolithographic apparatus including such a system
    29.
    发明授权
    Lens system with lens elements arranged in a gas-filled holder and photolithographic apparatus including such a system 失效
    具有布置在充气保持器中的透镜元件和包括这种系统的光刻设备的透镜系统

    公开(公告)号:US5602683A

    公开(公告)日:1997-02-11

    申请号:US361082

    申请日:1994-12-21

    CPC classification number: G03F7/70241 G02B27/0006 G03F7/70825 G03F7/70933

    Abstract: A high-quality lens system (PL) is described, which system is rinsed with a gas having a low refractive index so as to reduce the influence of variations of ambient parameters on the optical behaviour. By adding a very small quantity of ozone to this gas, it is prevented that any deposit will be produced on the lens elements within the lens holder (PLH) as a result of decomposition of organic particles caused by UV radiation and precipitation of the decomposition products.

    Abstract translation: 描述了高品质透镜系统(PL),该系统用具有低折射率的气体冲洗,以便减少环境参数的变化对光学行为的影响。 通过向该气体添加非常少量的臭氧,可以防止由于紫外线辐射和分解产物的沉淀引起的有机颗粒的分解而在透镜保持器(PLH)内的透镜元件上产生任何沉积物 。

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