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    Optimization to avoid sidelobe printing
    21.
    发明申请
    Optimization to avoid sidelobe printing 有权

    公开(公告)号：US20060134529A1

    公开(公告)日：2006-06-22

    申请号：US11019128

    申请日：2004-12-22

    Applicant: Steven Hansen

    Inventor： Steven Hansen

    IPC: G03B27/32 ,  G03C5/00 ,  G03F1/00

    CPC classification number: G03F7/70425 ,  G03F7/705

    Abstract: A method for configuring the optical transfer of a mask pattern onto a substrate using a lithographic apparatus is presented. In an embodiment of the invention, the method includes calculating a size of a printed sidelobe to be generated as a result of optical transfer of the mask pattern onto the substrate; and determining a plurality of lithographic parameters for optical transfer of the mask pattern onto the substrate that yields an optimization of a high latitude for the mask pattern and a small printed sidelobe size.

    Apparatus for dental shade measurement
    22.
    发明申请
    Apparatus for dental shade measurement 有权
    牙科测量仪器

    公开(公告)号：US20060040230A1

    公开(公告)日：2006-02-23

    申请号：US10922313

    申请日：2004-08-19

    Applicant: Douglass Blanding ,  Rongguang Liang ,  Edward Giorgianni ,  Steven Hansen

    Inventor： Douglass Blanding ,  Rongguang Liang ,  Edward Giorgianni ,  Steven Hansen

    IPC: A61C19/10

    CPC classification number: G01J3/02 ,  G01J3/0218 ,  G01J3/0267 ,  G01J3/50 ,  G01J3/508 ,  G01J3/524 ,  G01N21/251 ,  G01N21/276

    Abstract: An apparatus for suitable for obtaining an image of a dental structure has an illuminator member placed proximate the area to be imaged. The illuminator member has a support structure (30) for retaining the illuminator member in position proximate the area to be imaged. A reference (22) is coupled to the support structure (30) of the illuminator member and disposed within the area to be imaged. At least one light source (24) is coupled to the support structure (30) of the illuminator member for directing imaging illumination toward the area to be imaged. A camera (12) records an image from within the area to be imaged using the imaging illumination from the illuminator member, wherein the image comprises the reference (22).

    Abstract translation: 用于获得牙科结构的图像的装置具有靠近待成像区域设置的照射器构件。 照明器构件具有用于将照明器构件保持在靠近待成像区域的位置的支撑结构（30）。 参考（22）耦合到照明器构件的支撑结构（30）并且设置在待成像的区域内。 至少一个光源（24）耦合到照明器构件的支撑结构（30），用于将成像照明引导到待成像的区域。 相机（12）使用来自照明器构件的成像照明从要成像的区域内的图像记录图像，其中图像包括参考（22）。

    Spectroscopic evaluation of edible oil using profiles
    23.
    发明授权
    Spectroscopic evaluation of edible oil using profiles 有权

    公开(公告)号：US11579132B2

    公开(公告)日：2023-02-14

    申请号：US17258661

    申请日：2019-07-03

    Applicant: Cargill, Incorporated ,  Jinping Dong ,  Steven Hansen ,  Jacob Schaller ,  Sean Smith

    Inventor： Jinping Dong ,  Steven Hansen ,  Jacob Schaller ,  Sean Smith

    IPC: G01N33/03 ,  G01J3/42 ,  G01N21/3577 ,  G01N21/359

    Abstract: A characteristic of edible oil may be evaluated using a spectrometer. For example, optical reflectance data may be obtained from edible oil in situ in a frying apparatus housing the edible oil, the reflectance data corresponding to a specified range of infra-red wavelengths. A model profile corresponding to the characteristic being assessed may be obtained, such as from a repository housing a secured library of such profiles. The model profile may define a regression vector for use in transforming the reflectance data to generate a value corresponding to the characteristic being assessed. A criterion may be applied to the value to establish a simplified representation of the characteristic for presentation to a user for assessment of oil quality.

    Optimization to avoid sidelobe printing
    26.
    发明授权
    Optimization to avoid sidelobe printing 有权
    优化避免旁瓣打印

    公开(公告)号：US07496882B2

    公开(公告)日：2009-02-24

    申请号：US11019128

    申请日：2004-12-22

    Applicant: Steven Hansen

    Inventor： Steven Hansen

    IPC: G06F17/50 ,  G06F19/00 ,  G03F1/00 ,  G06K9/00

    CPC classification number: G03F7/70425 ,  G03F7/705

    Abstract: A method for configuring the optical transfer of a mask pattern onto a substrate using a lithographic apparatus is presented. In an embodiment of the invention, the method includes calculating a size of a printed sidelobe to be generated as a result of optical transfer of the mask pattern onto the substrate; and determining a plurality of lithographic parameters for optical transfer of the mask pattern onto the substrate that yields an optimization of a high latitude for the mask pattern and a small printed sidelobe size.

    Abstract translation: 提出了使用光刻设备将掩模图案光学传递到基板上的方法。 在本发明的一个实施例中，该方法包括计算由于将掩模图案光学转移到衬底上而产生的打印旁瓣的尺寸; 以及确定多个光刻参数，用于将掩模图案光学传递到衬底上，其产生用于掩模图案的高纬度和小的印刷旁瓣尺寸的优化。

    Lithographic apparatus and device manufacturing method
    28.
    发明申请
    Lithographic apparatus and device manufacturing method 审中-公开
    光刻设备和器件制造方法

    公开(公告)号：US20070121090A1

    公开(公告)日：2007-05-31

    申请号：US11289626

    申请日：2005-11-30

    Applicant: Alek Chen ,  Steven Hansen

    Inventor： Alek Chen ,  Steven Hansen

    IPC: G03B27/54

    CPC classification number: G03F7/70283 ,  G03F1/32 ,  G03F1/34 ,  G03F7/70308 ,  G03F7/70433 ,  G03F7/705

    Abstract: A method of configuring a transfer of an image of a pattern onto a substrate with a lithographic apparatus is presented. The method includes selecting a plurality of parameters including a pupil filter parameter; calculating an image of the pattern for the selected parameters; calculating a metric that represents a variation of an attribute of the calculated image over a process range; and adjusting the plurality of parameters based on a result of the metric.

    Abstract translation: 提出了一种使用光刻设备将图案的图像转移到衬底上的方法。 该方法包括选择包括瞳孔滤波器参数的多个参数; 计算所选参数的图案的图像; 计算表示在处理范围内计算的图像的属性的变化的度量; 以及基于所述度量的结果来调整所述多个参数。

    Lithographic apparatus and method for optimizing illumination using a photolithographic simulation
    30.
    发明申请
    Lithographic apparatus and method for optimizing illumination using a photolithographic simulation 有权
    使用光刻模拟优化照明的平版印刷设备和方法

    公开(公告)号：US20060126046A1

    公开(公告)日：2006-06-15

    申请号：US11280985

    申请日：2005-11-17

    Applicant: Steven Hansen

    Inventor： Steven Hansen

    IPC: G03B27/52

    CPC classification number: G03F7/705 ,  G03F7/70108

    Abstract: A method of configuring a transfer of an image of a patterning device pattern onto a substrate with a lithographic apparatus. The method includes determining an intermediate illumination arrangement parameter and an intermediate patterning device parameter by varying an initial illumination arrangement parameter and an initial patterning device parameter using a calibrated model until the calculated image of the pattern printed on the substrate is within predetermined specification; calculating a metric that represents a lithographic response of the printed pattern over a process range, where the pattern would be imaged with the intermediate illumination arrangement and patterning device parameters over the process range, and depending on a result of the metric, adjusting the initial patterning device and illumination arrangement parameters.

    Abstract translation: 一种配置利用光刻设备将图案形成装置图案的图像转印到衬底上的方法。 该方法包括通过使用校准模型改变初始照明布置参数和初始图案形成装置参数来确定中间照明布置参数和中间图案形成装置参数，直到印刷在基板上的图案的计算图像在预定规格内; 计算表示印刷图案在处理范围内的光刻响应的度量，其中图案将利用中间照明布置和在处理范围内的图案形成装置参数成像，并且根据度量的结果，调整初始图案 设备和照明布置参数。

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