Lithographic apparatus and device manufacturing method
    1.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号:US20070002300A1

    公开(公告)日:2007-01-04

    申请号:US11436058

    申请日:2006-05-18

    CPC classification number: G03F7/70325 G03F7/70091 G03F7/70108 G03F7/7025

    Abstract: A lithographic apparatus includes an illumination unit including a radiation source configured to generate a radiation bundle, an illumination optics with a numerical aperture NA0 and an aperture system; a projection lens having a first numerical aperture NAOB1; a support arranged between the illumination unit and the projection lens and configured to support a patterning device; a substrate support configured to support a substrate on which structures on the patterning device are imaged, wherein the first numerical aperture NAOB1 of the projection lens is smaller than the numerical aperture NA0 of the illumination unit.

    Abstract translation: 光刻设备包括照明单元,其包括被配置为产生辐射束的辐射源,具有数值孔径NA <0>的照明光学器件和孔径系统; 具有第一数值孔径NA 的投影透镜; 布置在照明单元和投影透镜之间并被配置为支撑图案形成装置的支撑件; 衬底支撑件,被配置为支撑在其上成像图案形成装置上的结构的衬底,其中投影透镜的第一数值孔径NA 小于数值孔径NA < >照明单元。

    Enhanced lithographic resolution through double exposure
    2.
    发明申请
    Enhanced lithographic resolution through double exposure 失效
    通过双重曝光增强光刻分辨率

    公开(公告)号:US20050162627A1

    公开(公告)日:2005-07-28

    申请号:US10765218

    申请日:2004-01-28

    CPC classification number: G03F7/70433 G03F7/70466

    Abstract: A system and method for enhancing the image resolution in a lithographic system, is presented herein. The invention comprises decomposing a reticle pattern into at least two constituent sub-patterns that are capable of being optically resolved by the lithographic system, coating a substrate with a pre-specified photoresist layer, and exposing a first of the at least two constituent sub-patterns by directing a projection beam through the first sub-pattern such that the lithographic system produces a first sub-pattern image onto the pre-specified photoresist layer of the substrate. The invention further comprises processing the exposed substrate, exposing a second of the at least two constituent sub-patterns by directing the projection beam through the second sub-pattern such that the lithographic system produces a second sub-pattern image onto the pre-specified photoresist layer of the substrate, and then combining the first and second sub-pattern images to produce a desired pattern on the substrate.

    Abstract translation: 本文给出了用于增强光刻系统中的图像分辨率的系统和方法。 本发明包括将掩模版图案分解为能够被光刻系统光学分辨的至少两个构成子图案,用预定的光致抗蚀剂层涂覆基底,以及暴露至少两个构成子图案中的第一个, 通过将投影光束引导通过第一子图案使得光刻系统在基板的预定光致抗蚀剂层上产生第一子图案图像。 本发明还包括处理曝光的基板,通过将投影光束引导通过第二子图案来暴露至少两个构成子图案中的第二个,使得光刻系统在预定的光致抗蚀剂上产生第二子图案图像 层,然后组合第一和第二子图案图像以在衬底上产生期望的图案。

    SPECTROSCOPIC EVALUATION OF EDIBLE OIL USING PROFILES

    公开(公告)号:US20210270730A1

    公开(公告)日:2021-09-02

    申请号:US17258661

    申请日:2019-07-03

    Abstract: A characteristic of edible oil may be evaluated using a spectrometer. For example, optical reflectance data may be obtained from edible oil in situ in a frying apparatus housing the edible oil, the reflectance data corresponding to a specified range of infra-red wavelengths. A model profile corresponding to the characteristic being assessed may be obtained, such as from a repository housing a secured library of such profiles. The model profile may define a regression vector for use in transforming the reflectance data to generate a value corresponding to the characteristic being assessed. A criterion may be applied to the value to establish a simplified representation of the characteristic for presentation to a user for assessment of oil quality.

    Enhanced lithographic resolution through double exposure

    公开(公告)号:US20070258073A1

    公开(公告)日:2007-11-08

    申请号:US11822995

    申请日:2007-07-11

    CPC classification number: G03F7/70433 G03F7/70466

    Abstract: A system and method for enhancing the image resolution in a lithographic system, is presented herein. The invention comprises decomposing a reticle pattern into at least two constituent sub-patterns that are capable of being optically resolved by the lithographic system, coating a substrate with a pre-specified photoresist layer, and exposing a first of the at least two constituent sub-patterns by directing a projection beam through the first sub-pattern such that the lithographic system produces a first sub-pattern image onto the pre-specified photoresist layer of the substrate. The invention further comprises processing the exposed substrate, exposing a second of the at least two constituent sub-patterns by directing the projection beam through the second sub-pattern such that the lithographic system produces a second sub-pattern image onto the pre-specified photoresist layer of the substrate, and then combining the first and second sub-pattern images to produce a desired pattern on the substrate.

    Lithographic apparatus and device manufacturing method
    6.
    发明申请
    Lithographic apparatus and device manufacturing method 审中-公开
    平版印刷设备和器件制造方法

    公开(公告)号:US20060146307A1

    公开(公告)日:2006-07-06

    申请号:US11025602

    申请日:2004-12-30

    CPC classification number: G03F7/70283 G03F7/70125

    Abstract: A lithographic apparatus includes a support structure configured to hold a phase shift mask, the phase shift mask configured to pattern a beam of unpolarized radiation according to a desired pattern and a substrate table configured to hold a substrate. The lithographic apparatus also includes a projection system configured to project the patterned beam onto a target portion of the substrate on which a negative resist layer is deposited to form an image of the pattern on the negative resist layer.

    Abstract translation: 光刻设备包括被配置为保持相移掩模的支撑结构,所述相移掩模被配置为根据期望的图案对非偏振辐射束进行图案化,以及被配置为保持基板的基板台。 光刻设备还包括投影系统,该投影系统配置成将图案化的光束投影到其上沉积有负的抗蚀剂层的基板的目标部分上,以在负的抗蚀剂层上形成图案的图像。

    Ring light guide
    7.
    发明申请

    公开(公告)号:US20060039692A1

    公开(公告)日:2006-02-23

    申请号:US10922312

    申请日:2004-08-19

    Abstract: A ring illuminator (20) has a light channeling section (22) with an input face (24) optically coupling the light channeling section (22) to a flash unit (16) of a camera (12) for obtaining flash illumination therefrom. A ring section (26) is optically coupled to the light channeling section and extends around an aperture for fitting the ring illuminator around a lens (14). The ring section has a rear surface (30) for positioning toward the body of the camera. The rear surface has a plurality of light redirecting features (28) for redirecting at least a portion of the flash illumination from within the ring section outward from the camera, around the lens of the camera.

    Bismuth-indium amalgam, fluorescent lamps, and methods of manufacture
    8.
    发明申请
    Bismuth-indium amalgam, fluorescent lamps, and methods of manufacture 失效
    铋铟汞齐,荧光灯和制造方法

    公开(公告)号:US20070071635A1

    公开(公告)日:2007-03-29

    申请号:US11526720

    申请日:2006-09-26

    Applicant: Steven Hansen

    Inventor: Steven Hansen

    Abstract: The disclosure relates to fluorescent lamps and methods of manufacture wherein the mercury is dosed into the lamp in a solid material containing mercury, bismuth, indium and another metal. In one embodiment, the metal is selected from the group consisting of zinc, tin, lead, silver, gold, copper, gallium, titanium, nickel, and manganese. Preferably, the atomic ratio of the indium to the bismuth is in the range of about 0.4:0.6 to 0.7:0.3. The atomic ratio of zinc to the combination indium and bismuth may preferably be in the range of about 0.01:0.99 to 0.20:0.80, and the atomic ratio of mercury to the combination of the indium, bismuth and zinc is preferably in the range of about 0.01:0.99 and 0.15:0.85.

    Abstract translation: 本公开涉及荧光灯及其制造方法,其中汞以含有汞,铋,铟和其它金属的固体材料投入灯中。 在一个实施方案中,金属选自锌,锡,铅,银,金,铜,镓,钛,镍和锰。 优选地,铟与铋的原子比在约0.4:0.6至0.7:0.3的范围内。 锌与铟和铋的组合的原子比可以优选在约0.01:0.99:0.20:0.80的范围内,并且汞与铟,铋和锌的组合的原子比优选在约 0.01:0.99和0.15:0.85。

    Polyesters and slurries containing microfiber and micropowder, and methods for using and making same
    9.
    发明申请
    Polyesters and slurries containing microfiber and micropowder, and methods for using and making same 审中-公开
    含有超细纤维和微粉的聚酯和浆料,以及使用和制造方法

    公开(公告)号:US20060155064A1

    公开(公告)日:2006-07-13

    申请号:US11032575

    申请日:2005-01-10

    Applicant: Steven Hansen

    Inventor: Steven Hansen

    CPC classification number: C08K7/02 C08K3/22 C08L27/18 C08L67/02 C08L2666/04

    Abstract: Polyester compositions comprising microfibers and micropowders are disclosed. The polyester compositions are made by contacting microfibers and micropowders with polymerizable components, such as monomers, suitable for making polyesters, and polymerizing the polymerizable components. The microfibers and micropowders can be provided in the form of either separate slurries, or a single slurry. The micropowders can also alternatively be provided in the form of a powder rather than a slurry. A slurry containing microfiber and micropowders, and a process for making such a slurry, is also disclosed. Incorporating microfibers and micropowders into a polyester improves the properties of the molded parts, films and/or fibers that are made from such a polyester. A slurry containing microfibers and micropowders is more stable and easier to process, wherein the micropowder is less likely to separate out of the slurry or agglomerate when compared to a slurry containing only micropowder.

    Abstract translation: 公开了包含微纤维和微粉末的聚酯组合物。 聚酯组合物通过使微纤维和微粉与可聚合组分(例如单体)接触,制备聚酯并使可聚合组分聚合来制备。 微纤维和微粉可以以单独的浆液或单一浆料的形式提供。 微粉也可以以粉末形式而不是浆料提供。 还公开了含有超细纤维和微粉的浆料,以及制备这种浆料的方法。 将微纤维和微粉掺入聚酯中改善了由这种聚酯制成的模塑部件,膜和/或纤维的性能。 含有微纤维和微粉的浆料更稳定并且易于加工,其中当与仅含有微粉末的浆料相比时,该微粉不太可能分离出浆料或附聚物。

Patent Agency Ranking