公开(公告)号：US5804041A

公开(公告)日：1998-09-08

申请号：US662731

申请日：1996-06-10

Applicant: Steven Hurwitt

Inventor： Steven Hurwitt

IPC: C23C14/35 ,  C23C14/34

CPC classification number: C23C14/351

Abstract: A method for forming a magnetically oriented thin film on a substrate is disclosed wherein deposition pulses are alternated with magnetic field pulses. In particular, the method includes sputtering a target to deposit a first incremental layer of target material on the substrate, wherein the target is sputtered for a first sputtering time period and the first incremental layer includes randomly oriented first domains. The method further includes generating a magnetic field for orienting the first in a desired direction, wherein the magnetic field is generated for a first magnetic field time period which begins after the first sputtering time period ends. In addition, the method includes sputtering the target to deposit a second incremental layer of target material upon the first incremental layer; wherein the target is sputtered for a second sputtering time period which begins after the first magnetic field time period ends and the second incremental layer includes randomly oriented second domains. The magnetic field is then generated which orients the second domains in the desired direction, the magnetic field being generated for a second magnetic field time period which begins after the second sputtering time period ends. The steps of sputtering the target and generating the magnetic field are then repeated to form successive incremental layers each having associated domains which are oriented in the desired direction by the magnetic field to form a thin film on the substrate whose domains are oriented in the desired direction.

Abstract translation: 公开了一种在衬底上形成磁取向薄膜的方法，其中沉积脉冲与磁场脉冲交替。 特别地，该方法包括溅射靶以在衬底上沉积目标材料的第一增量层，其中靶溅射第一溅射时间段，并且第一增量层包括随机取向的第一域。 该方法还包括产生用于在期望方向上定向第一磁场的磁场，其中在第一溅射时间段结束之后开始的第一磁场时间周期产生磁场。 此外，该方法包括溅射目标以在第一增量层上沉积目标材料的第二增量层; 其中所述靶被溅射在从所述第一磁场时间段结束之后开始的第二溅射时间段，并且所述第二增量层包括随机取向的第二域。 然后产生磁场，其在所需方向定向第二磁畴，在第二溅射时间段结束之后开始的第二磁场时间周期产生磁场。 然后重复溅射靶和产生磁场的步骤以形成各自具有相关畴的连续的增量层，所述相关结构域通过磁场在期望方向上取向以在基底上形成薄膜，该区域在期望方向上取向 。

公开(公告)号：US5795448A

公开(公告)日：1998-08-18

申请号：US570220

申请日：1995-12-08

Applicant: Steven Hurwitt ,  Ira Reiss ,  Marian Zielinski ,  Swie-In Tan

Inventor： Steven Hurwitt ,  Ira Reiss ,  Marian Zielinski ,  Swie-In Tan

IPC: C23C14/34 ,  C23C14/50 ,  H01L21/00 ,  H01L21/203 ,  H01L21/285

CPC classification number: H01L21/6715 ,  C23C14/505

Abstract: A device for rotating a substrate in a complex motion within a chamber which during a sputtering process. The device includes a first support element positioned within the chamber. The first support element includes a first rotating structure which is affixed between a platform for supporting the substrate and a first magnet positioned adjacent to the inner wall surface. Further, the first rotating structure is adapted to rotate about a first axis. The device further includes a second support element positioned outside of the chamber. The second support element includes a second rotating structure affixed between a planet gear adapted for engagement with a sun gear outside of the chamber and a second magnet positioned adjacent the outer wall surface and spaced apart from the first magnet. This causes the formation of a magnetic bond between the first and second magnets. Further, the second rotating structure is adapted to rotate about the first axis thereby enabling the first and second rotating structures to rotate in unison about the first axis. In addition, the device includes a drive element affixed to the first and second support elements, wherein rotation of the drive element causes a first rotation of the first and second rotating elements and thus the substrate about a center axis. This also causes a second rotation wherein the engagement of the sun gear and the planet gear causes simultaneous rotation of the substrate about the first axis.

Abstract translation: 一种用于在溅射过程中在腔室内以复杂运动旋转衬底的装置。 该装置包括位于腔室内的第一支撑元件。 第一支撑元件包括第一旋转结构，其被固定在用于支撑基板的平台和邻近内壁表面定位的第一磁体之间。 此外，第一旋转结构适于围绕第一轴线旋转。 该装置还包括位于腔室外部的第二支撑元件。 第二支撑元件包括固定在适于与室外的太阳轮啮合的行星齿轮之间的第二旋转结构，以及邻近外壁表面定位并与第一磁体隔开的第二磁体。 这导致在第一和第二磁体之间形成磁性结合。 此外，第二旋转结构适于围绕第一轴线旋转，从而使得第一和第二旋转结构能够围绕第一轴线一致地旋转。 此外，该装置包括固定到第一和第二支撑元件的驱动元件，其中驱动元件的旋转引起第一和第二旋转元件的第一旋转，从而使基板围绕中心轴线进行第一旋转。 这也导致第二旋转，其中太阳齿轮和行星齿轮的接合导致基板围绕第一轴线的同时旋转。

公开(公告)号：US5620578A

公开(公告)日：1997-04-15

申请号：US583200

申请日：1996-01-04

Applicant: Steven Hurwitt

Inventor： Steven Hurwitt

IPC: C23C14/34 ,  C23C14/50 ,  C23C14/56 ,  H01L21/203 ,  C23C16/00

CPC classification number: C23C14/564

Abstract: A system for sputtering a substrate is disclosed. The system includes a central housing having at least one process module for forming the layer, wherein the process module is in fluid communication with the central housing and includes a first device used in conjunction with forming the layer on the substrate. In addition, the system includes at least one service module in fluid communication with the central housing, wherein the service module includes at least one replacement device suitable for replacing the first device. The central housing includes a robotic element for transporting the first device from the process module to the service module and for transporting the replacement device from the service module to the process module in order to replace the first device. In addition, the service module includes a dedicated pump for evacuating the service module to a high vacuum in order to reduce surface outgassing of the replacement device to a desired level before use.

Abstract translation: 公开了一种用于溅射衬底的系统。 该系统包括具有至少一个用于形成该层的处理模块的中央壳体，其中该处理模块与该中心壳体流体连通，并且包括与该基底上形成层结合使用的第一装置。 此外，该系统包括与中央壳体流体连通的至少一个服务模块，其中服务模块包括适于替换第一设备的至少一个替换设备。 中央壳体包括用于将第一装置从处理模块运送到服务模块并用于将替换装置从服务模块运送到处理模块以便更换第一装置的机器人元件。 此外，服务模块包括用于将服务模块排空到高真空的专用泵，以便在使用之前将替换装置的表面除气减少到期望的水平。

公开(公告)号：US5449445A

公开(公告)日：1995-09-12

申请号：US164759

申请日：1993-12-10

Applicant: Frank M. Shinneman ,  Steven Hurwitt

Inventor： Frank M. Shinneman ,  Steven Hurwitt

IPC: C23C14/34 ,  C23C14/54 ,  H01J37/34

CPC classification number: H01J37/3414 ,  C23C14/3407 ,  C23C14/54 ,  H01J37/34

Abstract: An expendable target of sputter coating material is provided having secured thereto a storage medium having recorded thereon, in machine readable indicia, information relating to a characteristic of the target. The information preferably includes target identifying information and may also include information relating to the target composition, the history of the use of the target, and other information usable by the apparatus to automatically set machine parameters or to record process information. Information, particularly of the use of the target, may be updated and written to a medium on the target or target assembly, or to a machine readable medium which may be affixed to the target assembly when the target is removed. The target is preferably one piece with a cooling surface opposite its sputtering surface, and having the indicia fixed to the sputtering material at the periphery or rim of the target.

Abstract translation: 提供溅射涂层材料的消耗性目标，其上固定有以机器可读标记记录有关于目标特征的信息的存储介质。 信息优选地包括目标识别信息，并且还可以包括与目标组合有关的信息，目标的使用历史以及该装置可用于自动设置机器参数或记录处理信息的其他信息。 可以将特别是目标的使用的信息更新并写入目标组件或目标组件上的介质，或者可以在移除目标时可以固定到目标组件的机器可读介质。 靶材优选为一片，其表面与溅射表面相反，并且在靶材的周边或边缘处将标记固定在溅射材料上。

公开(公告)号：US5130005A

公开(公告)日：1992-07-14

申请号：US626987

申请日：1990-12-13

Applicant: Steven Hurwitt ,  Robert Hieronymi ,  Israel Wagner

Inventor： Steven Hurwitt ,  Robert Hieronymi ,  Israel Wagner

IPC: C23C14/34 ,  C23C14/35 ,  H01J37/34

CPC classification number: H01J37/3497 ,  C23C14/3407 ,  C23C14/35 ,  H01J37/3408 ,  H01J37/3455 ,  H01J37/3458

Abstract: A target of a thickness, which varies across its radius according to the amount of material required to be sputtered, is supported in a nest in a chamber of a sputter coating apparatus. Positioned behind the nest is a rotating magnet carrier having arranged thereon in a closed loop a permanent or electro magnetic strip, but preferably a flexible permanently magnetic material, with portions near the rim of the target and portions near, but not on, the target center about which the magnet rotates. The magnetic loop is transversely polarized with one pole toward the target rim and one toward the target center so that its field will enclose the rim of the target within a magnetic tunnel that traps a plasma over the target. Lumped magnets across the center from the strip support the plasma near the center so as to cause some sputtering at the target center. Other lumped magnets adjacent the strip help sharpen the field so that a desired distribution of sputtering can be achieved. Enclosed in a sealed space behind and in thermal contact with the target nest is the carrier from which the magnets project to facilitate the flow of cooling fluid across the back surface of the nest to cool the target as the carrier rotates.

Abstract translation: 根据溅射需要的材料的量，其半径上的厚度变化的靶被支撑在溅射涂覆装置的腔室中。 位于巢后面的是旋转磁体载体，其在闭合环中布置有永久或电磁条，但优选地是柔性永久磁性材料，其中靠近靶的边缘的部分和靠近但不在目标中心的部分 磁体绕其旋转。 磁环以一极朝向目标边缘横向极化，一个朝向目标中心，使其磁场将围绕目标的边缘封闭在通过目标的等离子体上的磁通道内。 从中心穿过中心的集中磁体支撑中心附近的等离子体，从而在目标中心处引起一些溅射。 与带相邻的其他集中磁体有助于锐化场，从而可以实现期望的溅射分布。 封闭在与目标巢后面并与之接触的密封空间中是磁体突出以承载冷却流体穿过巢背面的载体，以在载体旋转时冷却目标物。

公开(公告)号：US3991149A

公开(公告)日：1976-11-09

申请号：US511713

申请日：1974-10-03

Applicant: Steven Hurwitt

Inventor： Steven Hurwitt

IPC: B28B1/26 ,  B28B3/12 ,  B28B1/30 ,  B28B5/00

CPC classification number: B28B3/123 ,  B28B1/26 ,  B28B1/267

Abstract: In the manufacture of ceramic substrates by the tape casting process, improved control of thickness variations in the "green" ceramic tape is achieved by using a free-riding roller positioned within a drying chamber at a preselected location at which the cast slip has formed a dry skin yet remains fluidly deformable. The roller pressure is adjusted to a value just sufficient to redistribute the surface of the cast slip into a straight line without changing the cross-sectional area of the tape along the line of roller contact to avoid "bubble" buildup ahead of the roller and rupture of the surface skin.

Abstract translation: 在通过带铸工艺制造陶瓷基板时，通过使用位于干燥室内的自由滚轮来实现对“绿色”陶瓷带的厚度变化的改进控制，该预定辊位于预先选定的位置处，其中铸造滑块形成 干燥的皮肤仍然保持流体变形。 滚筒压力被调整到恰好足以将铸造滑块的表面重新分布成直线而不改变沿着辊接触线的带的横截面积的值，以避免在辊之前的“气泡”积聚和破裂 的表皮。