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    CONTROL SYSTEM TRUNK LINE ARCHITECTURE
    32.
    发明申请
    CONTROL SYSTEM TRUNK LINE ARCHITECTURE 审中-公开
    控制系统TRUNK LINE ARCHITECTURE

    公开(公告)号：US20140368899A1

    公开(公告)日：2014-12-18

    申请号：US13920651

    申请日：2013-06-18

    Applicant: SAGE Electrochromics, Inc.

    Inventor： Bryan D. Greer

    IPC: G02F1/163 ,  H01R43/26

    CPC classification number: E06B9/24 ,  E06B2009/2464 ,  G05B15/02 ,  G05B2219/2642 ,  Y10T29/49117

    Abstract: The present disclosure relates generally to a wiring system for controlling one or more smart windows located within a building, and methods for installing such systems and/or replacing higher wattage systems with such systems.

    Abstract translation: 本公开总体上涉及用于控制位于建筑物内的一个或多个智能窗户的布线系统，以及用于安装这种系统和/或用这种系统代替更高功率系统的方法。

    LASER CUTS TO REDUCE ELECTRICAL LEAKAGE
    33.
    发明申请
    LASER CUTS TO REDUCE ELECTRICAL LEAKAGE 有权
    激光可减少电气泄漏

    公开(公告)号：US20140253996A1

    公开(公告)日：2014-09-11

    申请号：US13786934

    申请日：2013-03-06

    Applicant: SAGE ELECTROCHROMICS, INC.

    Inventor： Mark Samuel Burdis ,  Jean-Christophe Giron ,  Harvey Kalweit

    IPC: G02F1/155

    CPC classification number: G02F1/155 ,  G02F2001/1536 ,  G02F2001/1552 ,  G02F2001/1555

    Abstract: One object of the present invention is to provide an electrochromic device having improved insulating film structure to reduce electrical leakage. The improved structure includes a lower conductive layer, upper conductive layer, an electrochromic electrode layer, a counter electrode layer, and at least one ion-conductor layer sandwiched between the electrochromic electrode layer and the counter electrode layer. The lower conductive layer and the electrochromic electrode layer are scribed and the gap formed from the scribing is filled with the layers formed above the electrochromic electrode layer. In some aspects, the ion-conductor layer is also scribed with the lower conductor and electrochromic electrode layers and the gap formed from the scribing is filled with the layers formed above the ion-conductor layer. In further aspects, the insulating film may include one or more buffer layers formed above an ion-conductor layer, further separating the upper conductive layer from the lower conductive layer.

    Abstract translation: 本发明的一个目的是提供一种具有改进的绝缘膜结构以减少漏电的电致变色装置。 改进的结构包括下导电层，上导电层，电致变色电极层，对电极层和夹在电致变色电极层和对电极层之间的至少一个离子导体层。 对下导电层和电致变色电极层进行刻划，并且由划线形成的间隙填充在电致变色电极层上形成的层。 在一些方面，离子导体层也用下导体和电致变色电极层划刻，并且由划线形成的间隙填充有形成在离子导体层上方的层。 在另外的方面，绝缘膜可以包括形成在离子导体层上方的一个或多个缓冲层，进一步将上导电层与下导电层分开。

    Apparatus and method for repair of defects in an electronic energy control or display device
    34.
    发明授权
    Apparatus and method for repair of defects in an electronic energy control or display device 有权
    用于修复电子能量控制或显示装置中的缺陷的装置和方法

    公开(公告)号：US08784149B2

    公开(公告)日：2014-07-22

    申请号：US13857217

    申请日：2013-04-05

    Applicant: SAGE Electrochromics, Inc.

    Inventor： Neil L. Sbar ,  Harvey Kalweit

    IPC: H01J9/50

    CPC classification number: H01J9/50 ,  B23K26/0096 ,  B23K26/032 ,  B23K26/0622 ,  B23K26/082 ,  B23K26/361 ,  B23K26/40 ,  B23K2101/38 ,  B23K2103/50 ,  G02F1/15

    Abstract: An apparatus for repair of a defect in an electronic energy control device may include a position indicating means for indicating a position at which to fixedly position a mounting unit relative to a portion of an electronic energy control device including a defect to be repaired, where the device is fixed in position. An imaging and repair assembly of the apparatus has an optical imaging range and a laser repair range. When the mounting unit is mounted to a support surface to fixedly position the mounting unit at the position indicated by the position indicating means and the imaging and repair assembly is attached to the mounting unit, the portion of the electronic energy control device is within the imaging range and the repair range.

    Abstract translation: 用于修复电子能量控制装置中的缺陷的装置可以包括位置指示装置，用于指示相对于包括要修复的缺陷的电子能量控制装置的一部分固定地定位安装单元的位置，其中 设备固定就位。 该装置的成像和维修组件具有光学成像范围和激光修复范围。 当安装单元安装到支撑表面上以将安装单元固定地定位在由位置指示装置指示的位置处，并且成像和修理组件附接到安装单元时，电子能量控制装置的部分在成像 范围和维修范围。

    Made-to-stock patterned transparent conductive layer
    35.
    发明授权
    Made-to-stock patterned transparent conductive layer 有权

    公开(公告)号：US12013622B2

    公开(公告)日：2024-06-18

    申请号：US17934418

    申请日：2022-09-22

    Applicant: SAGE ELECTROCHROMICS, INC.

    Inventor： Yigang Wang ,  Jean-Christophe Giron ,  Bryan D. Greer ,  Sebastian Marius Sarrach ,  Thomas Doublein

    IPC: G02F1/163 ,  G02F1/155 ,  G02F1/157

    CPC classification number: G02F1/163 ,  G02F1/155 ,  G02F1/157 ,  G02F2001/1552

    Abstract: An electrochemical device and method of forming said device is disclosed. The method can include providing a substrate and stack overlying the substrate. The stack can include a first transparent conductive layer over the substrate, a cathodic electrochemical layer over the first transparent conductive layer, an anodic electrochemical layer over the electrochromic layer, and a second transparent conductive layer overlying the anodic electrochemical layer. The method can include depositing an insulating layer over the stack and determining a first pattern for the second transparent conductive layer. The first pattern can include a first region and a second region. The first region and the second region can be the same material. The method can include patterning the first region of the second transparent conductive layer without removing the material from the first region. The first region can have a first resistivity and the second region can have a second resistivity.

    Forming electrochromic stacks using at most one metallic lithium deposition station
    37.
    发明授权
    Forming electrochromic stacks using at most one metallic lithium deposition station 有权

    公开(公告)号：US11703737B2

    公开(公告)日：2023-07-18

    申请号：US17172960

    申请日：2021-02-10

    Applicant: SAGE Electrochromics, Inc.

    Inventor： Paul Mogensen ,  Wen Li ,  Jean-Christophe Giron ,  Nicolas Antoine Mercadier

    IPC: G02F1/155

    CPC classification number: G02F1/155

    Abstract: The present disclosure describes various processes of forming an electrochromic stack using at most one metallic lithium deposition station. In some aspects, a process may include depositing metallic lithium only within an electrochromic counter-electrode of an electrochromic stack. In some aspects, a process may include using a lithium-containing ceramic counter-electrode target to form an electrochromic counter-electrode and depositing metallic lithium only within or above an electrochromic electrode of the electrochromic stack. In some embodiments, a process may include using a lithium-containing ceramic electrode target, and optionally additionally depositing metallic lithium to add mobile lithium to the electrochromic stack. In some embodiments, a process may include using a single metallic lithium deposition station to deposit metallic lithium between an ion-conducting layer and an electrochromic electrode of the electrochromic stack.

    CLOAKING PATTERN IN ELECTROCHROMIC DEVICES
    38.
    发明申请
    CLOAKING PATTERN IN ELECTROCHROMIC DEVICES 有权

    公开(公告)号：US20230092228A1

    公开(公告)日：2023-03-23

    申请号：US17932652

    申请日：2022-09-15

    Applicant: SAGE ELECTROCHROMICS, INC.

    Inventor： Cody Daniel VanDerVeen ,  Jean-Christophe GIRON

    IPC: G02F1/153 ,  G02F1/1514

    Abstract: An electrochromic device and method of cloaking an electrochromic device is disclosed. The electrochromic device can include a first transparent conductive layer on a substrate, a second transparent conductive layer, a cathodic electrochromic layer between the first transparent conductive layer and the second transparent conductive layer, and an anodic electrochromic layer between the first transparent conductive layer and the second transparent conductive layer. The stack of layers can be patterned to be parallel to a voltage gradient of the electrochromic device and extend through all layers of the electrochromic device. The electrochromic device can also include a masking layer that covers the patterned inactive area. A method can include determining a pattern of inactive areas within a visible area, determining a cloaking pattern that corresponds to the pattern of inactive areas, and depositing a masking layer in the areas of the cloaking pattern.

    SYSTEMS AND METHODS FOR REMOTE MONITORING AND CONTROLLING ELECTROCHROMIC GLASS
    40.
    发明申请
    SYSTEMS AND METHODS FOR REMOTE MONITORING AND CONTROLLING ELECTROCHROMIC GLASS 有权

    公开(公告)号：US20220299832A1

    公开(公告)日：2022-09-22

    申请号：US17600534

    申请日：2020-10-21

    Applicant: SAGE Electrochromics, Inc.

    Inventor： Dallas J. Akre ,  Zachary Edward Vollen ,  Dmitry A Mefed ,  Artem Tarasov

    IPC: G02F1/163 ,  G05B11/01

    Abstract: Various embodiments of systems and methods for remote monitoring and controlling of electrochromic glass are described. In some embodiments, a device monitoring and control system can receive messages via a communication hub from a plurality of remote installation sites for electrochromic glass units. The messages include telemetry data associated with the electrochromic glass units. The system can stream the telemetry data to a data analytics engine that can perform analytics functions on the telemetry data. The system provides results of the analytics functions to remote destinations via a data analytics interface. The system can also receive, via a control interface, control instructions from remote sources to control one or more of the electrochromic glass units. The system can transmit control messages to the installation sites to implement the control instructions. The system can also establish a connection for a requestor to an installation site using a site's specific connection protocol.

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