公开(公告)号：US20100229311A1

公开(公告)日：2010-09-16

申请号：US12717207

申请日：2010-03-04

Applicant: Stephanie Nussbaum Cottrell ,  Tirthankar Ghosh

Inventor： Stephanie Nussbaum Cottrell ,  Tirthankar Ghosh

IPC: D06M15/21 ,  C08F8/00

CPC classification number: D06M16/00 ,  A01N59/16 ,  D06M11/83 ,  D06M13/352 ,  D06M15/21 ,  D06M15/356 ,  Y10T442/2525 ,  Y10T442/277 ,  Y10T442/2861 ,  A01N25/10

Abstract: A composition useful for treating fabrics. The composition contains a silver-containing copolymer having polymerized units of a monomer X which is an ethylenically unsaturated compound having a substituent group selected from an unsaturated or aromatic heterocyclic group having at least one nitrogen atom and polymerized units of a monomer Y which is an ethylenically unsaturated compound selected from carboxylic acids, organosulfuric acids, sulfonic acids, phosphonic acids and esters comprising polymerized units of ethylene oxide.

Abstract translation: 用于处理织物的组合物。 该组合物含有含有单体X的聚合单元的含银共聚物，单体X是具有选自具有至少一个氮原子的不饱和或芳族杂环基的取代基的烯键式不饱和化合物和作为烯键式的单体Y的聚合单元 选自羧酸，有机硫酸，磺酸，膦酸和包含环氧乙烷聚合单元的酯的不饱和化合物。

公开(公告)号：US20100190404A1

公开(公告)日：2010-07-29

申请号：US12759945

申请日：2010-04-14

Applicant: Tirthankar Ghosh ,  Barry Weinstein

Inventor： Tirthankar Ghosh ,  Barry Weinstein

IPC: D03D15/00 ,  C08K5/19 ,  C08K5/13 ,  C08K5/29 ,  C08K5/092 ,  D04B1/14 ,  D04H1/10

CPC classification number: D01F1/103 ,  D10B2401/041 ,  Y10T428/2913 ,  Y10T428/2929 ,  Y10T442/3146 ,  Y10T442/444 ,  Y10T442/56 ,  Y10T442/637

Abstract: Fibers that durably contain antimicrobial materials such that the antimicrobial materials are resistant to being abraided away or washed off during use. The antimicrobial materials contained in the fibers are not prone to the development of resistant strains of bacteria. Also disclosed are methods of making and using the fibers.

Abstract translation: 耐久地含有抗微生物材料的纤维，使得抗微生物材料在使用过程中抵抗被磨损或洗掉。 包含在纤维中的抗微生物材料不容易发展抗菌菌株。 还公开了制造和使用纤维的方法。

公开(公告)号：US20100029079A1

公开(公告)日：2010-02-04

申请号：US12185600

申请日：2008-08-04

Applicant: Tirthankar Ghosh ,  Terence M. Thomas ,  Hongyu Wang

Inventor： Tirthankar Ghosh ,  Terence M. Thomas ,  Hongyu Wang

IPC: H01L21/461 ,  C09K13/00

CPC classification number: C09K13/00 ,  C09G1/02 ,  C09G1/04 ,  H01L21/30625 ,  H01L21/3212

Abstract: A chemical mechanical polishing composition useful for chemical mechanical polishing of a patterned semiconductor wafer containing a nonferrous metal. The chemical mechanical polishing composition comprises an inhibitor for the nonferrous metal; a copolymer of poly(ethylene glycol)methyl ether (meth)acrylate and 1-vinylimidazole; and water.

Abstract translation: 用于化学机械抛光含有有色金属的图案化半导体晶片的化学机械抛光组合物。 化学机械抛光组合物包含有色金属的抑制剂; 聚（乙二醇）甲基醚（甲基）丙烯酸酯和1-乙烯基咪唑的共聚物; 和水。

公开(公告)号：US20070082935A1

公开(公告)日：2007-04-12

申请号：US11528935

申请日：2006-09-28

Applicant: Li-Liang Chia ,  Tirthankar Ghosh ,  Barry Weinstein ,  Terry Williams

Inventor： Li-Liang Chia ,  Tirthankar Ghosh ,  Barry Weinstein ,  Terry Williams

IPC: A01N43/80

CPC classification number: A61L2/22 ,  A01N31/02 ,  A01N59/16 ,  A61L2/18 ,  A01N25/10 ,  A01N25/22 ,  A01N59/20 ,  A01N2300/00

Abstract: A method for disinfecting or sanitizing a surface by applying an antimicrobial composition comprising a metal-polymer complex.

Abstract translation: 一种通过应用包含金属 - 聚合物复合物的抗微生物组合物对表面进行消毒或消毒的方法。

公开(公告)号：US20070006391A1

公开(公告)日：2007-01-11

申请号：US11482142

申请日：2006-07-06

Applicant: Tirthankar Ghosh ,  Barry Weinstein

Inventor： Tirthankar Ghosh ,  Barry Weinstein

IPC: C11D3/00

CPC classification number: D01F1/103 ,  D10B2401/041 ,  Y10T428/2913 ,  Y10T428/2929 ,  Y10T442/3146 ,  Y10T442/444 ,  Y10T442/56 ,  Y10T442/637

Abstract: Fibers that durably contain antimicrobial materials such that the antimicrobial materials are resistant to being abraided away or washed off during use. The antimicrobial materials contained in the fibers are not prone to the development of resistant strains of bacteria. Also disclosed are methods of making and using the fibers.

Abstract translation: 耐久地含有抗微生物材料的纤维，使得抗微生物材料在使用过程中抵抗被磨损或洗掉。 包含在纤维中的抗微生物材料不容易发展抗菌菌株。 还公开了制造和使用纤维的方法。

公开(公告)号：US20060240263A1

公开(公告)日：2006-10-26

申请号：US11408425

申请日：2006-04-21

Applicant: John Ashmore ,  Tirthankar Ghosh ,  Jose Lalas

Inventor： John Ashmore ,  Tirthankar Ghosh ,  Jose Lalas

IPC: B32B27/38

CPC classification number: B27K3/343 ,  B27K3/007 ,  B27K3/15 ,  C08L25/14 ,  C08L31/04 ,  C08L75/04 ,  C08L97/02 ,  Y10T428/31515

Abstract: A method for preserving wood by contacting wood with a composition comprising an aqueous polymer dispersion, at least one surfactant, and a wood preservative.

Abstract translation: 通过使木材与包含聚合物水分散体，至少一种表面活性剂和木材防腐剂的组合物接触来保存木材的方法。

公开(公告)号：US06679928B2

公开(公告)日：2004-01-20

申请号：US10121887

申请日：2002-04-12

Applicant: Wesley D. Costas ,  Tirthankar Ghosh ,  Jinru Bian ,  Karel-Anne Valentine

Inventor： Wesley D. Costas ,  Tirthankar Ghosh ,  Jinru Bian ,  Karel-Anne Valentine

IPC: C09C168

CPC classification number: C09G1/02

Abstract: A polishing composition for polishing a semiconductor substrate has a pH of under 5.0 and comprises (a) a carboxylic acid polymer comprising polymerized unsaturated carboxylic acid monomers having a number average molecular weight of about 20,000 to 1,500,000 or blends of high and low number average molecular weight polymers of polymerized unsaturated carboxylic acid monomers, (b) 1 to 15% by weight of an oxidizing agent, (c) up to 3.0% by weight of abrasive particles, (d) 50-5,000 ppm (parts per million) of an inhibitor, (e) up to 3.0% by weight of a complexing agent, such as, malic acid, and (f) 0.1 to 5.0% by weight of a surfactant.

Abstract translation: 用于研磨半导体衬底的抛光组合物的pH值低于5.0，并且包含（a）包含数均分子量为约20,000至1,500,000的聚合的不饱和羧酸单体的羧酸聚合物或高和低数均分子量的共混物 聚合的不饱和羧酸单体的聚合物，（b）1至15重量％的氧化剂，（c）至多3.0重量％的磨料颗粒，（d）50-5,000ppm（百万分之几）的抑制剂 ，（e）至多3.0重量％的络合剂如苹果酸，和（f）0.1-5.0重量％的表面活性剂。

公开(公告)号：US06610282B1

公开(公告)日：2003-08-26

申请号：US09291780

申请日：1999-04-14

Applicant: Tirthankar Ghosh

Inventor： Tirthankar Ghosh

IPC: H01N2510

CPC classification number: C09D5/1668 ,  A01N25/10 ,  A01N43/80 ,  C09D5/14 ,  C09D5/1625 ,  A01N2300/00

Abstract: Disclosed are compositions containing biologically active compounds that slowly release the biologically active compound. These compositions may be directly incorporated into the locus to be protected or may be applied to a structure in a coating.

Abstract translation: 公开了含有缓慢释放生物活性化合物的生物活性化合物的组合物。 这些组合物可以直接掺入待保护的场所中或可以施加到涂层中的结构。

公开(公告)号：US06605537B2

公开(公告)日：2003-08-12

申请号：US10043664

申请日：2001-10-26

Applicant: Jinru Bian ,  Tirthankar Ghosh ,  Terence M. Thomas

Inventor： Jinru Bian ,  Tirthankar Ghosh ,  Terence M. Thomas

IPC: H01L21302

CPC classification number: H01L21/3212 ,  B24B37/0056 ,  B24B37/042

Abstract: A method of polishing a semiconductor substrate by adjusting the polishing composition with a BTA concentration that raises the metal removal rate when polishing at a relatively high polishing pressure, and that minimizes the metal removal rate when polishing metal in trough at a lower polishing pressure; and adjusting the polishing pressure on metal in each trough to a level that removes metal from trough at a minimized removal rate, while simultaneously polishing the excess metal with a higher polishing pressure.

公开(公告)号：US09060511B2

公开(公告)日：2015-06-23

申请号：US13814525

申请日：2011-08-03

Applicant: Freddie L. Singleton ,  Tirthankar Ghosh ,  Kimberly S. Cagle

Inventor： Freddie L. Singleton ,  Tirthankar Ghosh ,  Kimberly S. Cagle

IPC: A01N59/00 ,  A01N37/18 ,  A01N59/20 ,  A01N37/30 ,  C02F103/02 ,  C02F1/50

CPC classification number: A01N37/18 ,  A01N37/30 ,  A01N59/00 ,  A01N59/20 ,  C02F1/50 ,  C02F2103/023 ,  C02F2303/08 ,  A01N59/16 ,  A01N2300/00

Abstract: A biocidal composition comprising 2,2-dibromomalonamide and a metal selected from silver, copper, and mixtures thereof, and its use for the control of microorganisms in aqueous and water-containing systems.

Abstract translation: 包含2,2-二溴马来酰亚胺和选自银，铜及其混合物的金属的杀生物组合物及其在含水和含水体系中控制微生物的用途。