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    CLEAN ISOLATION VALVE FOR REDUCED DEAD VOLUME
    32.
    发明申请
    CLEAN ISOLATION VALVE FOR REDUCED DEAD VOLUME 有权

    公开(公告)号：US20230017577A1

    公开(公告)日：2023-01-19

    申请号：US17948323

    申请日：2022-09-20

    Applicant: Applied Materials, Inc.

    Inventor： Ashutosh Agarwal ,  Sanjeev Baluja

    IPC: C23C16/455 ,  H01J37/32

    Abstract: Gas distribution apparatus, processing chambers and methods using a dead volume-free valve are described. The valve has a first inlet line with upstream and downstream ends and a second inlet line with a downstream end that connects to the first inlet line. A sealing surface at the downstream end of the second inlet line separates the first inlet line from the second inlet line preventing fluid communication between the first inlet line and the second inlet line.

    THERMALLY UNIFORM DEPOSITION STATION
    35.
    发明申请
    THERMALLY UNIFORM DEPOSITION STATION 有权

    公开(公告)号：US20220119948A1

    公开(公告)日：2022-04-21

    申请号：US17074035

    申请日：2020-10-19

    Applicant: Applied Materials, Inc.

    Inventor： Jared Ahmad Lee ,  Sanjeev Baluja ,  Joseph AuBuchon ,  Kenneth Brian Doering ,  Dhritiman Subha Kashyap ,  Kartik Shah

    IPC: C23C16/455 ,  C23C16/44

    Abstract: Gas distribution assemblies and methods for providing a flow of gases to a process station are described. The gas distribution assemblies comprise a pumping liner with a showerhead and a gas funnel positioned therein. The pumping liner has an inner wall that slants at a first angle relative to a central axis of the gas distribution assembly so that the inner wall adjacent the bottom wall of the pumping liner is closer to the central axis than the inner wall adjacent the top wall. The gas funnel and pumping liner form a plenum between the outer wall of the gas funnel, a cavity in the bottom wall of the gas funnel and the inner wall of the pumping liner.

    Deposition radial and edge profile tunability through independent control of TEOS flow
    37.
    发明授权
    Deposition radial and edge profile tunability through independent control of TEOS flow 有权

    公开(公告)号：US11017986B2

    公开(公告)日：2021-05-25

    申请号：US16001264

    申请日：2018-06-06

    Applicant: Applied Materials, Inc.

    Inventor： Sanjeev Baluja ,  Yi Yang ,  Truong Nguyen ,  Nattaworn Boss Nunta ,  Joseph F. Aubuchon ,  Tuan Anh Nguyen ,  Karthik Janakiraman

    IPC: H01J37/32 ,  C23C16/455 ,  C23C16/40 ,  C23C16/50 ,  C23C16/52 ,  C23C16/44 ,  C23C16/509

    Abstract: Disclosed embodiments generally relate to a processing chamber that includes a perforated lid, a gas blocker disposed on the perforated lid, and a substrate support disposed below the perforated lid. The gas blocker includes a gas manifold, a central gas channel formed in the gas manifold, a first gas distribution plate that includes inner and outer trenches surrounding the central gas channel, and a first and second gas channels formed in the gas manifold. The first gas channel is in fluid communication with a first gas source and the inner trench, and the second gas channel is in fluid communication with the first gas source and the outer trench and a second gas distribution plate The first gas channel is in further fluid communication with a third gas distribution plate that is disposed below the second gas distribution plate, and a plurality of pass-through channels that are disposed between the second gas distribution plate and the third gas distribution plate. The second gas distribution plate includes a plurality of through holes formed through a bottom of the second gas distribution plate as well as a central opening in fluid communication with the central gas channel The second gas distribution plate further includes a recess region formed in a top surface of the second gas distribution plate, and the recess region surrounds the central opening.

    Showerhead assembly with multiple fluid delivery zones
    39.
    发明授权
    Showerhead assembly with multiple fluid delivery zones 审中-公开

    公开(公告)号：US10669629B2

    公开(公告)日：2020-06-02

    申请号：US16192228

    申请日：2018-11-15

    Applicant: Applied Materials, Inc.

    Inventor： Amit Kumar Bansal ,  Juan Carlos Rocha-Alvarez ,  Sanjeev Baluja ,  Sam H. Kim ,  Tuan Anh Nguyen

    IPC: C23C16/455

    Abstract: The present disclosure relates to a semiconductor processing apparatus. The processing chamber includes a chamber body and lid defining an interior volume, a substrate support disposed in the interior volume and a showerhead assembly disposed between the lid and the substrate support. The showerhead assembly includes a faceplate configured to deliver a process gas to a processing region defined between the showerhead assembly and the substrate support and an underplate positioned above the faceplate, defining a first plenum between the lid and the underplate, the having multiple zones, wherein each zone has a plurality of openings that are configured to pass an amount of inert gas from the first plenum into a second plenum defined between the faceplate and the underplate, in fluid communication with the plurality of openings of each zone such that the inert gas mixes with the process gas before exiting the showerhead assembly.

    Thermal Management System
    40.
    发明申请
    Thermal Management System 审中-公开

    公开(公告)号：US20200075366A1

    公开(公告)日：2020-03-05

    申请号：US16555764

    申请日：2019-08-29

    Applicant: Applied Materials, Inc.

    Inventor： Tejas Ulavi ,  Dhritiman Subha Kashyap ,  Sanjeev Baluja

    IPC: H01L21/67 ,  F28F3/14 ,  F28F27/02

    Abstract: A thermal management system comprising a fluid channel with a plurality of parallel first flow paths extending along a first level in a first thermal mass and a plurality of parallel second flow paths extending along a second level in a second thermal mass are described. Methods for controlling the temperature of a substrate or heater surface and fluid manifolds are also described.

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