公开(公告)号：US20070251813A1

公开(公告)日：2007-11-01

申请号：US11413434

申请日：2006-04-28

Applicant: Milan Ilic ,  Robert Huff ,  George McDonough

Inventor： Milan Ilic ,  Robert Huff ,  George McDonough

IPC: C23C14/32 ,  C23C14/00

CPC classification number: C23C14/34 ,  C23C14/54 ,  H01J37/32935 ,  H01J37/3299

Abstract: A method and system for conditioning a vapor deposition target is described. In one illustrative embodiment, a vapor deposition system is operated in which a vapor deposition target is used, the occurrence of electrical arcs in the vapor deposition system is detected, and the vapor deposition target is conditioned by adjusting an output current of a power supply that powers the vapor deposition system and adjusting an interval during which energy is delivered to each arc to deliver substantially the same energy to each arc. In some embodiments, the energy delivered to each arc is approximately equal to the maximum energy that the vapor deposition target can withstand without being damaged. The described method and system significantly reduces the time required to remove impurities from a target and does not require the venting of the vacuum chamber or the removal of the target from the chamber.

Abstract translation: 描述了用于调节气相沉积靶的方法和系统。 在一个说明性实施例中，操作气相沉积系统，其中使用气相沉积靶，在气相沉积系统中发现电弧，并且通过调节电源的输出电流来调节气相沉积靶， 为蒸镀系统提供动力并调整能量传送到每个电弧的时间间隔，以向每个电弧输送基本相同的能量。 在一些实施例中，输送到每个电弧的能量近似等于气相沉积靶材能够承受而不被损坏的最大能量。 所描述的方法和系统显着地减少了从靶中除去杂质所需的时间，并且不需要真空室的排放或者从室中移出靶。

公开(公告)号：US20070047275A1

公开(公告)日：2007-03-01

申请号：US11215878

申请日：2005-08-30

Applicant: Bryce Hesterman ,  Milan Ilic ,  Andrev Malinin

Inventor： Bryce Hesterman ,  Milan Ilic ,  Andrev Malinin

IPC: H02M3/24

CPC classification number: H02M3/335

Abstract: In one aspect of the invention, an isolated power converter suitable for high power and high voltage applications comprises stacked rectifiers and lossless snubber circuits with inductors that prevent snubber diodes from delivering large current pulses into output filter capacitors when the duty cycle of the inverter is low, thereby allowing effective snubbing without unduly restricting the voltage conversion range of the power supply. In another aspect of the invention, control circuitry of a power supply comprises both a high bandwidth input current regulator and a low bandwidth output voltage regulator. The combination of a wide bandwidth input current regulator and a low bandwidth output voltage regulator allows the power supply to emulate an inductively loaded uncontrolled rectifier while restricting negative input impedance characteristics to frequencies that are substantially lower than the frequency of the ac power system.

Abstract translation: 在本发明的一个方面，适用于高功率和高电压应用的隔离式功率转换器包括堆叠整流器和具有电感器的无损耗缓冲电路，当逆变器的占空比为低时，阻抗二极管将大电流脉冲输送到输出滤波电容器 从而允许有效地缓冲而不会不适当地限制电源的电压转换范围。 在本发明的另一方面，电源的控制电路包括高带宽输入电流调节器和低带宽输出电压调节器。 宽带输入电流调节器和低带宽输出电压调节器的组合允许电源模拟感应加载的不受控制的整流器，同时将负输入阻抗特性限制在基本上低于交流电源系统的频率的频率。

公开(公告)号：US07105075B2

公开(公告)日：2006-09-12

申请号：US10884027

申请日：2004-07-02

Applicant: Milan Ilic ,  Kalyan N. C. Siddabattula ,  Gerald C. Roop, Jr. ,  David J. Christie

Inventor： Milan Ilic ,  Kalyan N. C. Siddabattula ,  Gerald C. Roop, Jr. ,  David J. Christie

IPC: C23F1/02 ,  C23C16/00

CPC classification number: H01J37/3405 ,  H01J37/32027 ,  H01J37/3299 ,  H05H1/46

Abstract: There is provided by this invention an apparatus and method for controlling a dc magnetron plasma processing system that automatically adjusts the control signal to the power supply based upon the dynamic impedance of the load to control the output power to the plasma. The output voltage and the output current of the power supply that supplies power to the plasma is sampled over at a sampling frequency at least four to five times higher than the switching frequency and the dynamic impedance of the plasma is calculated based upon the sampled voltage and current from the algorithm R plasma = Δ ⁢ ⁢ V n Δ ⁢ ⁢ I n wherein ΔVn and ΔIn is the maximum difference among samples on one switching cycle. If the dynamic impedance seen is negative in nature then the control signal is compensated accordingly.

Abstract translation: 本发明提供一种用于控制直流磁控管等离子体处理系统的装置和方法，该系统基于负载的动态阻抗自动调节对电源的控制信号，以控制等离子体的输出功率。 向等离子体供电的电源的输出电压和输出电流以比开关频率高至少四至五倍的采样频率被采样，并且基于采样电压来计算等离子体的动态阻抗， 来自算法的电流