公开(公告)号：US10731210B2

公开(公告)日：2020-08-04

申请号：US15886511

申请日：2018-02-01

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： Kim Yang Lee ,  Thomas Young Chang ,  David S. Kuo ,  ShuaiGang Xiao ,  Xiaomin Yang ,  Koichi Wago

IPC: G01N27/327 ,  C12Q1/6869 ,  B81C1/00 ,  G01N27/447 ,  B01L3/00

Abstract: A DNA sequencing device and related methods, wherein the device includes a substrate, a nanochannel formed in the substrate, a first electrode positioned on a first side of the nanochannel, and a second electrode. The second electrode is positioned on a second side of the nanochannel opposite the first electrode, and is spaced apart from the first electrode to form an electrode gap that is exposed in the nanochannel. At least a portion of first electrode is movable relative to the second electrode to decrease a size of the electrode gap.

公开(公告)号：US09489974B2

公开(公告)日：2016-11-08

申请号：US14251303

申请日：2014-04-11

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： XiaoMin Yang ,  Shuaigang Xiao ,  Kim Y. Lee ,  Koichi Wago ,  Philip Steiner

IPC: G06F7/00 ,  G11B5/855 ,  G03F7/00

CPC classification number: G11B5/746 ,  G03F7/0002 ,  G11B5/855

Abstract: The embodiments disclose a method including patterning a template substrate to have different densities using hierarchical block copolymer density patterns in different zones including a first pattern and a second pattern, using a first directed self-assembly to pattern a first zone in the substrate using a first block copolymer material, and using a second directed self-assembly to pattern a second zone in the substrate using a second block copolymer material.

Abstract translation: 实施方案公开了一种方法，其包括使用第一定向自组装使用第一和第二图案在第一图案和第二图案中分层嵌段共聚物密度图案在不同区域中图案化模板基底以具有不同的密度，以使用第一 嵌段共聚物材料，并且使用第二定向自组装来使用第二嵌段共聚物材料在基材中图案化第二区域。

公开(公告)号：US09460747B2

公开(公告)日：2016-10-04

申请号：US14830534

申请日：2015-08-19

Applicant: Seagate Technology LLC

Inventor： Yuan Xu ,  Kim Y. Lee ,  David S. Kuo ,  Koichi Wago ,  Wei Hu

IPC: G11B5/84 ,  G11B5/74 ,  G11B5/855

CPC classification number: G11B5/84 ,  G11B5/746 ,  G11B5/855 ,  Y10T428/24479 ,  Y10T428/24802

Abstract: A method for nano-patterning includes imprinting features in a resist with an imprint mold to form one or more topographic surface patterns on the imprinted resist. A block copolymer (“BCP”) material is deposited on the imprinted resist, wherein a molecular dimension L0 of the BCP material correlates by an integer multiple to a spacing dimension of the one or more topographic surface patterns on the imprinted resist. The deposited BCP is annealed and at least a portion of the annealed BCP is removed, forming a template having discrete domains.

Abstract translation: 纳米图案的方法包括在抗蚀剂中用压印模具压印特征以在印刷抗蚀剂上形成一个或多个形貌表面图案。 在印刷抗蚀剂上沉积嵌段共聚物（“BCP”）材料，其中BCP材料的分子尺寸L0与印迹抗蚀剂上的一个或多个形貌表面图案的间隔尺寸相关联。 将沉积的BCP退火，并且去除退火的BCP的至少一部分，形成具有离散区域的模板。

公开(公告)号：US20150266233A1

公开(公告)日：2015-09-24

申请号：US14221165

申请日：2014-03-20

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： Michael R. Feldbaum ,  Koichi Wago ,  Gennady Gauzner ,  Kim Y. Lee ,  David S. Kuo

IPC: B29C59/02 ,  B29D17/00 ,  G03F7/00 ,  G11B5/84 ,  B29C33/38

CPC classification number: C23F1/00 ,  B29C33/3842 ,  B29D17/00 ,  B29K2101/00 ,  B29K2909/00 ,  G03F7/0002 ,  G03F7/0017 ,  G03F7/09 ,  G03F7/2002 ,  G11B5/855 ,  Y10T428/24802 ,  Y10T428/24851 ,  Y10T428/24917

Abstract: Provided herein is an apparatus, including a substrate; an etch stop layer overlying the substrate, wherein the etch stop layer is substantially resistant to etching conditions; and a patterned layer overlying the etch stop layer, wherein the patterned layer is substantially labile to the etching conditions, and wherein the patterned layer comprises a number of features including substantially consistent feature profiles among regions of high feature density and regions of low feature density.

Abstract translation: 本文提供了一种包括基板的装置; 覆盖衬底的蚀刻停止层，其中蚀刻停止层基本上抵抗蚀刻条件; 以及覆盖在蚀刻停止层上的图案层，其中所述图案化层对于蚀刻条件基本不稳定，并且其中所述图案化层包括多个特征，所述特征包括高特征密度区域和低特征密度区域之间的基本一致的特征轮廓。

公开(公告)号：US20150246476A1

公开(公告)日：2015-09-03

申请号：US14194733

申请日：2014-03-02

Applicant: Seagate Technology LLC

Inventor： Philip Steiner ,  Kim Y. Lee ,  Koichi Wago ,  Bruce Buch ,  David S. Kuo

IPC: B29C59/02 ,  B29C59/00

CPC classification number: G03F7/0002

Abstract: The embodiments disclose an analyzer configured to determine positions of circumferential gratings track features and alignment patterns in a first template and a phase device configured to determine positions of radial gratings features and interspersed pattern fields in a second template, wherein the first template is transferred and cross-imprinted with the second template features and patterns to form a third template substrate as a rectangular patterned stack imprint template.

Abstract translation: 实施例公开了一种分析器，被配置为确定第一模板中的圆周光栅轨迹特征和对准图案的位置，以及被配置为确定第二模板中的径向光栅特征和散布图案场的位置的相位装置，其中第一模板被传送和交叉 用第二模板特征和图案打印，以形成第三模板底物作为矩形图案堆叠印模板。

公开(公告)号：US08941938B1

公开(公告)日：2015-01-27

申请号：US14255280

申请日：2014-04-17

Applicant: Seagate Technology LLC

Inventor： Shuaigang Xiao ,  XiaoMin Yang ,  David S. Kuo ,  Kim Y. Lee ,  Koichi Wago ,  Yautzong Hsu

IPC: G11B5/09

CPC classification number: G11B5/746 ,  G11B5/59655

Abstract: Provided herein is an apparatus, including a first region corresponding to a data region in a patterned recording medium; a first set of features in the first region; a second region corresponding to a servo region in a patterned recording medium; and a second set of features in the second region including rhomboidal protrusions, wherein the first set of features and the second set of features are circumferentially aligned in accordance with concentrically circular lines etched into the apparatus across the first region and the second region.

Abstract translation: 本文提供的装置包括对应于图案化记录介质中的数据区域的第一区域; 第一个区域的第一组特征; 对应于图案化记录介质中的伺服区域的第二区域; 以及第二区域中的第二组特征，包括菱形突起，其中第一组特征和第二组特征根据在整个第一区域和第二区域上蚀刻到该装置中的同心圆形线沿周向对准。

公开(公告)号：US20150016774A1

公开(公告)日：2015-01-15

申请号：US14055773

申请日：2013-10-16

Applicant: SEAGATE TECHNOLOGY LLC

Inventor： Ganping Ju ,  Chubing Peng ,  Xiaobin Zhu ,  Yingguo Peng ,  Yukiko A Kubota ,  Timothy J Klemmer ,  Jan-Ulrich Thiele ,  Michael A. Seigler ,  Werner Scholz ,  Kim Y. Lee ,  David S. Kuo ,  Koichi Wago

IPC: G02B6/26 ,  F28F27/00

CPC classification number: G02B6/1226 ,  H01L2924/0002 ,  Y10T29/49 ,  H01L2924/00

Abstract: The embodiments disclose a stack feature of a stack configured to confine optical fields within and to a patterned plasmonic underlayer in the stack configured to guide light from a light source to regulate optical coupling.

Abstract translation: 实施例公开了一种堆叠的堆叠特征，其被配置为将光场限制在堆叠中的图案化等离子体激元底层内，其被配置成引导来自光源的光以调节光耦合。

公开(公告)号：US20130169315A1

公开(公告)日：2013-07-04

申请号：US13775098

申请日：2013-02-22

Applicant: SEAGATE TECHNOLOGY, LLC

Inventor： Koichi Wago ,  Sundeep Chauhan ,  David M. Tung

IPC: H03L7/06 ,  H03B21/00 ,  H03L7/08

CPC classification number: H03L7/06 ,  H01J37/3174 ,  H03B21/00 ,  H03L7/08

Abstract: A method for encoder frequency-shift compensation includes determining frequency values of an input encoder signal, determining repeatable frequency-shifts of the frequency values and generating a frequency-shift compensated clock using the repeatable frequency-shifts. A frequency-shift compensated clock includes a synthesizer configured to generate a frequency-shift compensated clock signal using repeatable frequency shifts and encoder clock signals.

Abstract translation: 一种用于编码器频移补偿的方法包括：确定输入编码器信号的频率值，确定频率值的可重复频移，并使用可重复的频移产生频移补偿时钟。 频移补偿时钟包括合成器，其被配置为使用可重复的频移和编码器时钟信号来产生频移补偿的时钟信号。