公开(公告)号：US20130344247A1

公开(公告)日：2013-12-26

申请号：US14012033

申请日：2013-08-28

Applicant: Sanyo Electric Co., Ltd.

Inventor： Tomonori Ueyama ,  Motohide Kai

IPC: B05C11/00 ,  B01J38/04

CPC classification number: B05C11/00 ,  B01J38/04 ,  C23C16/24 ,  C23C16/4488 ,  H01L21/02532 ,  H01L21/02592 ,  H01L21/0262

Abstract: A configuration is provided for a deposition device using the catalytic CVD method which reduces problems associated with extension of the catalyst and is superior in terms of running costs and productivity. The configuration provides a chamber 1 able to maintain reduced interior pressure; a source gas introducing route 32, 33a for introducing source gas into the chamber; a catalyst 4 of tantalum wire having a boride layer on the surface and provided inside the chamber 1 so as to allow the source gas introduced via the source gas introducing route to come into contact with the surface of the catalyst; a gas introducing route 36, 33b for introducing boron-containing gas to the chamber 1 for the reformation of the boride layer on the surface of the catalyst 4; and a power supply unit 5 for applying energy to the catalyst 4 to maintain the catalyst at a predetermined temperature. In this configuration, the introduction of the source gas is stopped, the catalyst 4 is heated while introducing diborane gas from the gas introducing route for reformation of the surface layer, and more boride is formed on the surface of the boride layer of the catalyst 4.

Abstract translation: 提供了一种使用催化CVD方法的沉积装置的结构，其减少了与催化剂的延伸相关的问题，并且在运行成本和生产率方面是优异的。 该配置提供了能够保持内部压力降低的腔室1; 源气体导入路径32，33a，用于将原料气体引入到室内; 在表面上具有硼化物层的钽丝线的催化剂4，设置在室1的内部，以使经由原料气体导入路径导入的原料气体与催化剂的表面接触; 用于将含硼气体引入到室1中用于重新形成催化剂4表面上的硼化物层的气体引入路径36,33b; 以及用于向催化剂4施加能量以将催化剂维持在预定温度的供电单元5。 在该结构中，停止引入原料气体，同时从引入路线的气体引入路线引入乙硼烷气体，同时引入催化剂4，使表面层重新形成，在催化剂4的硼化物层的表面形成更多的硼化物 。

公开(公告)号：US20130337164A1

公开(公告)日：2013-12-19

申请号：US13912614

申请日：2013-06-07

Applicant: HON HAI PRECISION INDUSTRY CO., LTD. ,  HONG FU JIN PRECISION INDUSTRY (ShenZhen) CO., LTD.

Inventor： TENG-TSUNG HUANG ,  GUO-JUN YU ,  GONG-SHUI CHENG

IPC: B05C21/00

CPC classification number: B05C21/00 ,  B05C5/0212 ,  B05C11/00

Abstract: An adhesive dispenser includes a moving assembly, a detecting assembly, and an adhesive dispensing assembly. The detecting assembly includes two pairs of light elements, which transmits light beams from a first element of each pair to the second element of each pair. The adhesive dispensing assembly includes a control unit, a drive unit, and an adhesive nozzle, the control unit is for driving the adhesive nozzle to move. The control unit drives the adhesive nozzle to block the light beams of the two pairs of light elements and records the coordinate position of the adhesive nozzle when blocking both the light beams, and calculates a variety of the recorded coordinate position and a reference coordinate position, then controls the drive unit to regulate the position of the adhesive nozzle according to the variety. An adhesive nozzle regulating method is also described.

Abstract translation: 粘合剂分配器包括移动组件，检测组件和粘合剂分配组件。 检测组件包括两对光元件，其将来自每对的第一元件的光束透射到每对的第二元件。 粘合剂分配组件包括控制单元，驱动单元和粘合剂喷嘴，所述控制单元用于驱动粘合剂喷嘴移动。 控制单元驱动粘合剂喷嘴以阻挡两对光元件的光束，并且当阻挡两个光束时记录粘合剂喷嘴的坐标位置，并计算各种记录的坐标位置和参考坐标位置， 然后控制驱动单元根据品种来调节粘合剂喷嘴的位置。 还描述了粘合剂喷嘴调节方法。

公开(公告)号：US20130192523A1

公开(公告)日：2013-08-01

申请号：US13784813

申请日：2013-03-04

Applicant: TEREPAC CORPORATION

Inventor： Douglas Knox ,  Jayna Sheats ,  Ric Asselstine

IPC: B05C11/00

CPC classification number: B05C11/00 ,  H01L21/67282 ,  H01L21/6835 ,  H01L24/95 ,  H01L2221/68322 ,  H01L2224/95 ,  H01L2924/01013 ,  H01L2924/01075 ,  H01L2924/10253 ,  H01L2924/12042 ,  H01L2924/14 ,  H01L2924/1461 ,  H01L2924/19041 ,  H01L2924/19043 ,  Y10T29/49 ,  Y10T29/49002 ,  Y10T29/49004 ,  Y10T29/53 ,  Y10T29/5313 ,  H01L2924/00

Abstract: The present invention discloses systems and methods for printing functional blocks from a plurality of printheads to a target substrate. In exemplary embodiments, the printing system comprises a main printhead for the majority of printing process, and a secondary printhead for supplemental printing. The system further comprises a controller, utilizing a positioning intelligence system to distribute the printing of the functional blocks between the main printhead and the secondary printhead, to minimize the motions of the printheads while maximize the printing speed.

公开(公告)号：US20130180955A1

公开(公告)日：2013-07-18

申请号：US13367854

申请日：2012-02-07

Applicant: Gregory Gibson ,  Scott Snodgrass

Inventor： Gregory Gibson ,  Scott Snodgrass

IPC: B05C11/00

CPC classification number: B05C11/00 ,  B05C5/0216 ,  B05D1/26 ,  H01L21/6715 ,  H01L27/1292

Abstract: An apparatus for forming selectively coated areas on a substrate comprises an extrudate remover configured to selectively remove coating from a selected portion of the substrate. A chuck is configured to secure the substrate. A coating die is arranged proximal the substrate and is in fluid communication with a source of fluid extrudate. During relative motion between the substrate and the coating die, fluid extrudate is deposited onto the substrate. A controller is configured to selectively control the relative motion between the substrate and coating remover, and to control operation of the extrudate remover. The invention also provides a method of forming selectively coated areas on a substrate comprising the steps of inducing relative movement between a coating dispenser and the substrate, applying fluid material from the coating dispenser onto the substrate during the relative movement, and selectively removing a portion of the applied fluid from the substrate.

Abstract translation: 用于在衬底上形成选择性涂覆区域的装置包括被配置为选择性地从衬底的选定部分去除涂层的挤出物去除器。 卡盘构造成固定基板。 涂层模具设置在基底附近并与流体挤出物源流体连通。 在衬底和涂层模具之间的相对运动期间，流体挤出物沉积在衬底上。 控制器被配置为选择性地控制基板和涂层去除器之间的相对运动，并且控制挤出物去除器的操作。 本发明还提供了一种在衬底上形成选择性涂覆区域的方法，包括以下步骤：在涂层分配器和衬底之间引起相对运动，在相对运动期间将流体材料从涂层分配器施加到衬底上，并且选择性地去除部分 所施加的流体从基底。

公开(公告)号：US20130167772A1

公开(公告)日：2013-07-04

申请号：US13537597

申请日：2012-06-29

Applicant: Izumi SATO ,  Isao SHIRATANI ,  Satoshi ASARI ,  Tsuyoshi MURAKAMI

Inventor： Izumi SATO ,  Isao SHIRATANI ,  Satoshi ASARI ,  Tsuyoshi MURAKAMI

IPC: C23C16/44

CPC classification number: C23C16/44 ,  B05C11/00 ,  C23C16/00

Abstract: A film forming apparatus includes a substrate holding unit holding substrates at intervals; a reaction chamber accommodating the substrate holding unit; a raw material gas supply pipe supplying a raw material gas of a thin film to the substrate; a support unit supporting the reaction chamber; a heating unit being disposed outside the reaction chamber and heating the substrates; a protection pipe including one end portion fixed to the support unit, being extended along an arrangement direction of the substrates between the substrate holding unit and the reaction chamber, and including a temperature measuring unit inserted therein; and a protrusion portion being provided on at least one of an outer surface of the protection pipe and an inner surface of the reaction chamber, and providing a gap between the outer surface of the protection pipe and the inner surface of the reaction chamber.

Abstract translation: 一种成膜设备包括：一个保持基板的基板保持单元; 容纳所述基板保持单元的反应室; 原料气体供给管，其向所述基板供给薄膜的原料气体; 支撑反应室的支撑单元; 加热单元设置在反应室外部并加热基板; 保护管，其包括固定到所述支撑单元的一个端部，沿着所述基板保持单元和所述反应室之间的所述基板的排列方向延伸，并且包括插入其中的温度测量单元; 并且在所述保护管的外表面和所述反应室的内表面中的至少一个上设置有突起部，并且在所述保护管的外表面和所述反应室的内表面之间设置间隙。

公开(公告)号：US20130164451A1

公开(公告)日：2013-06-27

申请号：US13809257

申请日：2011-07-06

Applicant: Helmut Bruckner ,  Andreas Skupin ,  Christian Lowinski ,  Bernhard Schachtner

Inventor： Helmut Bruckner ,  Andreas Skupin ,  Christian Lowinski ,  Bernhard Schachtner

IPC: B05C11/00 ,  B05D1/18

CPC classification number: B05C11/00 ,  B05D1/18 ,  C23C18/1617 ,  C23C18/54

Abstract: A method for depositing a coating of a first metal onto a workpiece 12 which exposes a second metal by a) providing a bath liquid 16 containing components containing ions of the first metal to be deposited, at least one complexing agent for the second metal and at least one acid, b) depositing the coating of first metal from the bath liquid 16 onto the workpiece 12, c) feeding the bath liquid 16 into a tank 18, d) cooling the bath liquid 16 in the settling tank 18 for generating a precipitate and filtrate, the precipitate comprised of the second metal and the at least one complexing agent, f) returning the filtrate to the bath liquid 16 and g) replenishing bath components to the bath liquid 16. In separating precipitate from the filtrate a pressure difference is generated by the filter.

Abstract translation: 一种用于将第一金属的涂层沉积到工件12上的方法，其通过以下步骤：a）提供包含含有待沉积的第一金属离子的成分的浴液16，至少一种用于第二金属的络合剂 至少一种酸，b）将第一金属的涂层从浴液16沉积到工件12上，c）将浴液16进料到罐18中，d）冷却沉淀槽18中的浴液16以产生沉淀物 和滤液，由第二金属和至少一种络合剂组成的沉淀物，f）将滤液返回到浴液16，g）将浴组分补充至浴液16.在从滤液中分离沉淀物时，压力差为 由过滤器生成。

公开(公告)号：US08465791B2

公开(公告)日：2013-06-18

申请号：US12872697

申请日：2010-08-31

Applicant: Benjamin Y. H. Liu ,  Thuc M. Dinh ,  William D. Dick ,  Aaron M. Collins ,  Francisco J. Romay

Inventor： Benjamin Y. H. Liu ,  Thuc M. Dinh ,  William D. Dick ,  Aaron M. Collins ,  Francisco J. Romay

IPC: C23C16/52

CPC classification number: B05C11/00 ,  G01N15/065

Abstract: A method for detecting particles in a gas by saturating the gas with vapor and causing the gas to flow through a chamber with walls that are at a temperature different than the temperature of the entering gas creating a gas turbulence within the chamber resulting in the gas becoming super-saturated with vapor and causing said super-saturated vapor to condense on said particles and form droplets, which are then detected and counted by an optical light-scattering detector.

Abstract translation: 一种通过用气体饱和气体并使气体流过室的气体中的颗粒的方法，其中壁的温度不同于进入气体的温度，在室内产生气体湍流，导致气体变成 用蒸汽过饱和并使所述超饱和蒸汽冷凝在所述颗粒上并形成液滴，然后通过光学散射检测器检测并计数。

公开(公告)号：US08424486B2

公开(公告)日：2013-04-23

申请号：US12429947

申请日：2009-04-24

Applicant: Steven E. Nielsen ,  Jeffrey Farr ,  Curtis Chambers

Inventor： Steven E. Nielsen ,  Jeffrey Farr ,  Curtis Chambers

IPC: B05C11/00 ,  B67D7/56 ,  B05D1/02

CPC classification number: B05B12/004 ,  A63C19/065 ,  A63C2019/067 ,  B05B12/081 ,  B05B12/082 ,  B05C11/00 ,  B65D83/203 ,  E01C23/227 ,  G01G17/06 ,  G01G19/18 ,  G01G23/3735

Abstract: Marking devices for dispensing a marking substance on the ground and marking methods are provided. The marking devices and marking methods use one or more detection mechanisms to detect one or more characteristics of the marking substance. In some embodiments, the detection mechanism may be, but is not limited to, an optical sensor, an olfactory sensor, a weight sensor, a switch device, and any combination thereof. The one or more detection mechanisms may provide, for example, the capability to: (1) determine the type of marking substance that is installed in the marking device; (2) determine in advance of or during a marking operation the amount of marking substance within the marking dispenser; and (3) determine when the marking dispenser is becoming empty.

Abstract translation: 提供了用于在地面上分配标记物质的标记装置和标记方法。 标记装置和标记方法使用一个或多个检测机构来检测标记物质的一个或多个特征。 在一些实施例中，检测机构可以是但不限于光学传感器，嗅觉传感器，重量传感器，开关装置及其任何组合。 一个或多个检测机构可以提供例如以下能力：（1）确定安装在标记装置中的标记物质的类型; （2）在标记操作之前或期间确定标记分配器内的标记物质的量; 和（3）确定标记分配器何时变空。

公开(公告)号：US20130074763A1

公开(公告)日：2013-03-28

申请号：US13679391

申请日：2012-11-16

Applicant: Semiconductor Energy Laboratory Co., Ltd.

Inventor： Hisao Ikeda ,  Tomoya Aoyama ,  Takahiro Ibe ,  Yoshiharu Hirakata ,  Shunpei Yamazaki

IPC: B05C11/00

CPC classification number: B05C11/00 ,  C23C14/042 ,  C23C14/12 ,  C23C14/26 ,  C23C14/28 ,  C23C14/568 ,  H01L51/0081 ,  H01L51/56

Abstract: An object is to improve use efficiency of an evaporation material, to reduce manufacturing cost of a light-emitting device, and to reduce manufacturing time needed for a light-emitting device including a layer containing an organic compound. The pressure of a film formation chamber is reduced, a plate is rapidly heated by heat conduction or heat radiation by using a heat source, a material layer on a plate is vaporized in a short time to be evaporated to a substrate on which the material layer is to be formed (formation substrate), and then the material layer is formed on the formation substrate. The area of the plate that is heated rapidly is set to have the same size as the formation substrate and film formation on the formation substrate is completed by one application of heat.

Abstract translation: 本发明的目的在于提高蒸发材料的使用效率，降低发光元件的制造成本，减少含有有机化合物的层的发光元件所需的制造时间。 成膜室的压力减小，通过使用热源的热传导或热辐射快速加热板，在短时间内蒸发板上的材料层以蒸发到其上的材料层 （形成衬底），然后在形成衬底上形成材料层。 将快速加热的板的面积设定为与形成基板相同的尺寸，并且通过一次加热完成在形成基板上的成膜。

公开(公告)号：US08278224B1

公开(公告)日：2012-10-02

申请号：US12566085

申请日：2009-09-24

Applicant: Collin K. L. Mui ,  Lakshminarayana Nittala ,  Nerissa S. Draeger

Inventor： Collin K. L. Mui ,  Lakshminarayana Nittala ,  Nerissa S. Draeger

IPC: H01L21/469

CPC classification number: H01L21/00 ,  B05C1/00 ,  B05C11/00 ,  C23C16/44 ,  C23C16/45523 ,  H01L21/02107 ,  H01L21/02126 ,  H01L21/02164 ,  H01L21/02216 ,  H01L21/02271 ,  H01L21/02274 ,  H01L21/02312 ,  H01L21/02337 ,  H01L21/0234 ,  H01L21/02345

Abstract: Methods and apparatus for filling gaps on partially manufactured semiconductor substrates with dielectric material are provided. In certain embodiments, the methods include introducing a first process gas into the processing chamber and accumulating a second process gas in an accumulator maintained at a pressure level substantially highest than that of the processing chamber pressure level. The second process gas is then rapidly introduced from the accumulator into the processing chamber. An excess amount of the second process gas may be provided in the processing chamber during the introduction of the second process gas. Flowable silicon-containing films forms on a surface of the substrate to at least partially fill the gaps.

Abstract translation: 提供了用电介质材料在部分制造的半导体衬底上填充间隙的方法和装置。 在某些实施方案中，所述方法包括将第一工艺气体引入处理室并将第二工艺气体积聚在保持在基本上高于处理室压力水平的压力水平的蓄能器中。 然后将第二工艺气体从蓄能器快速地引入到处理室中。 在引入第二处理气体期间，可以在处理室中设置过量的第二处理气体。 可流动的含硅膜在基材的表面上形成以至少部分地填充间隙。