Abstract:
A measurement apparatus 1 according to the present invention includes a table 10 that has an axis of rotation 14 and supports a disc-shaped object 40, a first driving unit that rotates the table 10 around the axis of rotation 14, a light source 50 that produces illumination light with which an end portion 45 of the disc-shaped object 40 is illuminated, an objective lens 60 that collects the illumination light reflected from the end portion 45, a second driving unit that moves the objective lens 60 along an optical axis 64, an imaging unit 70 that captures an image of the end portion 45 by detecting the reflected light collected by the objective lens 60, and an autofocus optical system 80 that determines a position of the objective lens 60 where the image of the end portion 45 is brought into focus in the imaging unit 70.
Abstract:
A correction method according to an embodiment includes illuminating an object to be inspected by using critical illumination by illumination light L11 generated by a light source 11, concentrating light from the object to be inspected illuminated by the illumination light L11 and acquiring image data of the object to be inspected by detecting the concentrated light by a first detector 23, concentrating part of the illumination light L11, and acquiring image data of a brightness distribution of the illumination light L11 by detecting the concentrated illumination light L11 by a second detector 33, and correcting the image data of the object to be inspected based on the image data of the brightness distribution.
Abstract:
An optical apparatus and its vibration removing method capable of stabilizing a place where light is applied are provided. An optical apparatus according to an aspect of the present disclosure includes a light source chamber, an EUV light source, an optical system chamber, an optical system configured to guide light entering the optical system chamber to an object through a bellows, an optical sensor configured to detect EUV light L2 emitted from the EUV light source, a position sensor disposed to detect a relative position of the optical system chamber with respect to the light source chamber, and a second vibration removal unit configured to remove vibrations from the light source chamber based on detection results of the optical sensor and the position sensor.
Abstract:
Provided are a mask inspection apparatus and a mask inspection method that can prevent a reduction in a reflectance of a drop-in mirror, which is caused by carbon contaminants. A mask inspection apparatus according to the present invention includes a drop-in mirror including multi-layer film and a reflective surface. The drop-in mirror is configured to reflect illumination light incident on the reflective surface and illuminate the mask. An area of the reflective surface is configured to be greater than an area of an illuminated spot irradiated with the illumination light on the reflective surface. The drop-in mirror is configured to be movable. A position of the illuminated spot on the reflective surface is configured to be moved when the drop-in mirror is moved.
Abstract:
In an inspection apparatus according to one aspect of the present invention, a processing apparatus includes: a profile data generation unit that divides each of a plurality of images according to a circumferential position to generate profile data in which a radial direction position and luminance data are associated with each other; a deconvolution operation unit that carries out a deconvolution operation using a one-dimensional point spread function to generate deconvolution operation data based on the profile data; an estimation unit that estimates estimation data of the deconvolution operation data in a desired focus position in the optical axis direction using the deconvolution operation data; and a synthesis unit that synthesizes the estimation data estimated by the estimation unit for each radial direction position to generate the image in the desired focus position.
Abstract:
An inspection apparatus and an inspection method capable of performing an inspection more accurately are provided. An inspection apparatus according to the present invention includes a light source 10 that illuminates a sample 30 in which a pattern is formed, a detector 11 that detects light reflected from the sample 30 illuminated by the light source, and a processing device 50 that performs an inspection based on a correlation between a brightness value of a sample image obtained by the detector and a size in a surface shape or a size in a width direction of the pattern of the sample 30. The processing device 50 performs the inspection based on a summation value obtained by adding up brightness values of sample images with weights, the sample images being obtained under a plurality of shooting conditions.
Abstract:
Provided are an analysis apparatus and an analysis method which are capable of recognizing a local state change of an internal structure of a secondary battery. The analysis apparatus includes: an observation cell that houses a secondary battery; a charging and discharging controller that controls charging and discharging of the secondary battery; an image pickup device that captures color images of the secondary battery at a predetermined time interval; and a charging and discharging data detection unit that acquires charging and discharging data on the secondary battery during charging and discharging. Color image signals output from the image pickup device and charging and discharging data signals output from the charging and discharging data detection unit are supplied to a signal processing device. The signal processing device outputs a unit that temporally links time-series color image signals and time-series charging and discharging data signals, and designated analysis data.
Abstract:
Resolution is improved in a required direction while maintaining contrast in inspection of an anamorphic mask. A photodetector detects light from a mask with a reduction rate at the time of exposure in a longitudinal direction different from a reduction rate at the time of exposure in a lateral direction. The photodetector includes a rectangular pixel, a ratio of a dimension of the rectangular pixel in the longitudinal direction to a dimension of the rectangular pixel in the lateral direction being equal to an inverse ratio of the reduction rate in the longitudinal direction to the reduction rate in the lateral direction.
Abstract:
An optical apparatus according to the present embodiment includes a detector for detecting detection light of illumination light reflected by a sample, an optical system for illuminating the sample with the illumination light and guiding the detection light reflected by the sample to the detector, a displacement measurement unit for measuring a displacement drift indicating the amount of drift in the position of an optical element included in the optical system, a storage unit for storing the correlation between the displacement drift and a focus drift indicating the amount of drift in the distance between the sample and the optical system when the detection light detected by the detector is brought into focus, and a prediction unit for predicting a focus drift from the measured displacement drift by using the correlation.
Abstract:
Provided are a position detection apparatus and a position detection method capable of detecting a position of plasma on a target. The position detection apparatus according to the present disclosure includes: a visible light optical system configured to condense visible light generated together with EUV light from plasma generated by condensing laser light onto a target with a condensing lens; a position detection sensor configured to detect the visible light condensed by the visible light optical system; and a position detection processing unit configured to detect a change in a position of the plasma on the target, from a change in a spot of the visible light detected by the position detection sensor.