BEAM DOSE COMPUTING METHOD AND WRITING METHOD AND RECORD CARRIER BODY AND WRITING APPARATUS
    42.
    发明申请
    BEAM DOSE COMPUTING METHOD AND WRITING METHOD AND RECORD CARRIER BODY AND WRITING APPARATUS 有权
    光束剂量计算方法和书写方法和记录载体体系和书写装置

    公开(公告)号:US20100015537A1

    公开(公告)日:2010-01-21

    申请号:US12566525

    申请日:2009-09-24

    Abstract: A beam dose computing method includes specifying a matrix of rows and columns of regions as divided from a surface area of a target object to include first, second and third regions of different sizes, the third regions being less in size than the first and second regions, determining first corrected doses of a charged particle beam for correcting fogging effects in the first regions, determining corrected size values for correcting pattern line width deviations occurring due to loading effects in the second regions, using said corrected size values in said second regions to create a map of base doses of the beam in respective ones of said second regions, using said corrected size values to prepare a map of proximity effect correction coefficients in respective ones of said second regions, using the maps to determine second corrected doses of said beam for correction of proximity effects in said third regions, and using the first and second corrected doses to determine an actual beam dose at each position on the surface of said object.

    Abstract translation: 光束剂量计算方法包括:从目标对象的表面区域划分出区域的行和列的矩阵,以包括不同大小的第一,第二和第三区域,第三区域的尺寸小于第一和第二区域 确定用于校正所述第一区域中的雾化效应的带电粒子束的第一校正剂量,确定用于校正由于所述第二区域中的负载效应而导致的图案线宽度偏差的校正大小值,使用所述第二区域中的所述校正大小值来创建 使用所述校正的大小值,在所述第二区域的各个区域中的所述光束的基本剂量的映射,以使用所述映射来确定所述第二区域中的相应的所述第二区域中的邻近效应校正系数的映射,以确定所述光束的第二校正剂量 校正所述第三区域中的邻近效应,并且使用第一和第二校正剂量来确定实际波束d 在所述对象的表面上的每个位置上。

    PATTERN INSPECTION APPARATUS AND METHOD
    43.
    发明申请
    PATTERN INSPECTION APPARATUS AND METHOD 有权
    图案检查装置及方法

    公开(公告)号:US20090129664A1

    公开(公告)日:2009-05-21

    申请号:US12274034

    申请日:2008-11-19

    CPC classification number: G06T7/001 G06T2207/30148

    Abstract: A pattern inspection apparatus includes a stage configured to mount thereon a target workpiece to be inspected where patterns are formed, at least one sensor configured to move relatively to the stage and capture optical images of the target workpiece to be inspected, a first comparing unit configured to compare first pixel data of an optical image captured by one of the at least one sensor with first reference data at a position corresponding to a position of the first pixel data, and a second comparing unit configured to compare second pixel data of an optical image captured by one of the at least one sensor at a position shifted by a sub-pixel unit from the position where the optical image of the first pixel data is captured, with second reference data at a position corresponding to the position of the second pixel data.

    Abstract translation: 图案检查装置包括:被配置为在其上安装待检查的目标工件的台阶,其中形成图案;至少一个传感器,被配置为相对于所述台移动并捕获待检查的目标工件的光学图像;第一比较单元, 将由所述至少一个传感器中的一个传感器捕获的光学图像的第一像素数据与对应于所述第一像素数据的位置的位置处的第一参考数据进行比较;以及第二比较单元,被配置为比较光学图像的第二像素数据 在与从第一像素数据的光学图像被捕获的位置移位的位置处的至少一个传感器中的一个被捕获的第二参考数据在与第二像素数据的位置相对应的位置处 。

    CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD THEREOF, AND METHOD FOR RESIZING DIMENSION VARIATION DUE TO LOADING EFFECT
    45.
    发明申请
    CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD THEREOF, AND METHOD FOR RESIZING DIMENSION VARIATION DUE TO LOADING EFFECT 有权
    充电颗粒光束写入装置及其方法,以及用于对装载效应进行尺寸变化的方法

    公开(公告)号:US20080182185A1

    公开(公告)日:2008-07-31

    申请号:US11942307

    申请日:2007-11-19

    Abstract: A charged particle beam writing apparatus includes a first part configured, based on pattern data, to estimate a total writing time, a second part configured to acquire a base dose at an arbitrary time, after writing start time and within the total writing time by using a first correlation among a time having passed since the writing start time, the total writing time, and the base dose, a third part configured to acquire a fogging effect correction coefficient at the arbitrary time by using a second correlation among the time, the total writing time and the coefficient, a forth part configured to calculate a beam dose at the arbitrary time by using the base dose and the coefficient, a fifth part configured to calculate a beam irradiation time based on the beam dose, a deflector for deflecting the beam, and an aperture for blocking the beam.

    Abstract translation: 带电粒子束写入装置包括:第一部分,基于图案数据构造,以估计总写入时间;第二部分,被配置为在写入开始时间之后并且在总写入时间内通过使用在任意时间获取基本剂量 从写入开始时刻起的时间,总写入时间和基本剂量之间的时间之间的第一相关性,第三部分,被配置为通过使用时间之间的第二相关性在任意时间获取起雾效果校正系数,总和 写入时间和系数,配置为通过使用基本剂量和系数来计算任意时间的束剂量的第四部分,被配置为基于束剂量计算束照射时间的第五部分,用于偏转光束的偏转器 ,以及用于阻挡光束的孔。

    PATTERN GENERATION METHOD AND CHARGED PARTICLE BEAM WRITING APPARATUS
    46.
    发明申请
    PATTERN GENERATION METHOD AND CHARGED PARTICLE BEAM WRITING APPARATUS 有权
    图案生成方法和充电颗粒光束写字装置

    公开(公告)号:US20070192757A1

    公开(公告)日:2007-08-16

    申请号:US11671243

    申请日:2007-02-05

    CPC classification number: H01J37/3174 B82Y10/00 B82Y40/00 H01J2237/31764

    Abstract: A pattern generation method includes changing a dimension of a pattern included in each mesh-like region of a plurality of mesh-like regions by using an area of the pattern and a total sum of lengths of circumferential sides of the pattern included in each mesh-like region to correct a dimension error of the pattern, wherein the dimension error being caused by loading effects and the plurality of mesh-like regions being virtually divided from a pattern forming region of a target object, and generating a pattern of the dimension changed on the target object.

    Abstract translation: 图案生成方法包括通过使用图案的区域和包括在每个网状区域中的图案的周边的长度的总和来改变包括在多个网状区域的每个网格区域中的图案的尺寸, 以校正图案的尺寸误差,其中所述尺寸误差是由加载效应引起的,并且所述多个网状区域从目标对象的图案形成区域虚拟地分割,并且生成维度上的尺寸的图案 目标对象。

    Rotation detecting method and apparatus and photo film retention detecting method and apparatus
    47.
    发明申请
    Rotation detecting method and apparatus and photo film retention detecting method and apparatus 审中-公开
    旋转检测方法及装置及相片保留检测方法及装置

    公开(公告)号:US20070063087A1

    公开(公告)日:2007-03-22

    申请号:US11495783

    申请日:2006-07-31

    CPC classification number: G03B17/30 B65H20/02 B65H26/06

    Abstract: A rotation detecting apparatus for use in producing a photo film cassette has an opaque detecting dog device secured in a manner rotatable together with a rotatable inserter. A light source device applies collimated light flux to the detecting dog device. A detection hole is formed through the detecting dog device, for receiving application of the collimated light flux, and passing light through the detection hole when openings at ends thereof are aligned with one another in a direction of the collimated light flux. A photo receptor receives the passed light passed through the detection hole, and outputs a detection signal according to an amount of the received passed light. In the retention, a trailer of photo film is picked up by the inserter. The inserter is rotationally inserted through a passageway of the photo film cassette. The trailer is fastened on a trailer fastener of a spool.

    Abstract translation: 用于制作摄影胶片盒的旋转检测装置具有以可旋转的插入件可转动的方式固定的不透明检测狗装置。 光源装置将准直光束施加到检测狗装置。 通过检测爪装置形成检测孔,用于接收准直光束的施加,并且当其端部的开口在准直光束的方向上彼此对准时,使光通过检测孔。 光接收器接收通过检测孔的通过的光,并根据接收到的光的量输出检测信号。 在保留期间,插入器拾取照片胶片的拖车。 插入器被旋转地插入通过照相胶片暗盒的通道。 拖车被固定在卷轴的拖车紧固件上。

    Method for producing thin film
    49.
    发明授权
    Method for producing thin film 有权
    薄膜制造方法

    公开(公告)号:US06773506B2

    公开(公告)日:2004-08-10

    申请号:US10162728

    申请日:2002-06-04

    CPC classification number: C23C16/52 C23C16/44 H01L21/31604 H01L21/3185

    Abstract: A thin film producing method in which the wafer film forming processing for a wafer to be a product may be carried out efficiently to shorten the processing time and to raise the operating ratio of the device. In a thin film deposition method using a single wafer processing for forming a thin film by chemical reaction under heat, a pseudo-process is provided which operates to suppress variations in the film thickness caused by the temperature in a reaction chamber 11. This pseudo process is the pre-heating processing of heating the reaction chamber 11 before actually charging the wafer W into the reaction chamber 11.

    Abstract translation: 可以有效地进行用于制造晶片的晶片成膜处理以缩短处理时间并提高装置的操作比的薄膜制造方法。 在使用通过加热下的化学反应形成薄膜的单晶片处理的薄膜沉积方法中,提供了用于抑制由反应室11中的温度引起的膜厚度变化的伪工艺。该伪工艺 是在将晶片W实际装入反应室11之前加热反应室11的预热处理。

    Magnetic resonance imaging device
    50.
    发明授权
    Magnetic resonance imaging device 有权
    磁共振成像装置

    公开(公告)号:US06611144B2

    公开(公告)日:2003-08-26

    申请号:US10203260

    申请日:2002-08-07

    Applicant: Takayuki Abe

    Inventor: Takayuki Abe

    CPC classification number: G01R33/563 G01R33/281

    Abstract: In a contrast MRA measurement, sampling order of k-space is controlled considering the distance from the origin such that sampling the low-frequency data is performed a time when the contrast concentration reaches it peak. First, the sampling points of k-space are divided into two groups. Then, a measurement of the first group is started a time when the contrast concentration of a blood vessel of interest becomes high and is controlled from the high-frequency component to the low-frequency component such that the distance of a sampling point from the origin progressively decreases. A measurement of the other group, which is performed successively, is controlled from the low-frequency component to the high-frequency component such that the distance of a sampling point from the origin progressively increases. According to this ordering, influence of measurement time error in the contrast MRA measurement can be reduced and the whole blood vessel can be imaged with high contrast. In addition, an artery can be selectively imaged.

    Abstract translation: 在对比MRA测量中,考虑到与原点的距离来控制k空间的采样顺序,使得当对比度浓度达到峰值时执行低频数据的采样。 首先,将k空间的采样点分为两组。 然后,当感兴趣的血管的对比度浓度变高并且从高频分量控制到低频分量时,开始测量第一组,使得采样点与原点的距离 逐渐减少 连续执行的另一组的测量从低频分量控制到高频分量,使得采样点与原点的距离逐渐增加。 根据该顺序,可以减少对比度MRA测量中的测量时间误差的影响,并且可以以高对比度对整个血管进行成像。 此外,可以选择性地成像动脉。

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