Organic film vapor deposition method and a scintillator panel
    41.
    发明授权
    Organic film vapor deposition method and a scintillator panel 有权
    有机薄膜蒸镀法和闪烁体面板

    公开(公告)号:US06762420B2

    公开(公告)日:2004-07-13

    申请号:US10218130

    申请日:2002-08-14

    Abstract: Comprising a first step of supporting a substrate formed with a scintillator on at least three protrusions of a target-support element disposed on a vapor deposition table so as to keep a distance from said vapor deposition table; a second step of introducing said vapor deposition table having said substrate supported by said target-support element into a vapor deposition chamber of a CVD apparatus; and a third step of depositing an organic film by CVD method onto all surfaces of said substrate, provided with said. scintillator, introduced into said vapor deposition chamber.

    Abstract translation: 包括在设置在气相沉积台上的靶支撑元件的至少三个突起上支撑由闪烁体形成的衬底以便保持距离所述气相沉积台的距离的第一步骤; 将具有由所述靶支撑元件支撑的所述基板的所述蒸镀台引入CVD装置的蒸镀室的第二工序; 以及通过CVD法将所述有机膜沉积到所述基板的所有表面上的第三步骤。 闪烁体,引入所述蒸镀室。

    Scintillator panel and radiation image sensor
    42.
    发明授权
    Scintillator panel and radiation image sensor 有权
    闪烁面板和辐射图像传感器

    公开(公告)号:US06753531B2

    公开(公告)日:2004-06-22

    申请号:US09971644

    申请日:2001-10-09

    CPC classification number: G01T1/2002

    Abstract: A surface of a substrate made of Al in a scintillator panel 1 is sandblasted, whereas one surface thereof is formed with an MgF2 film as a low refractive index material. The surface of MgF2 film is formed with a scintillator having a columnar structure for converting incident radiation into visible light. Together with the substrate, the scintillator is covered with a polyparaxylylene film.

    Abstract translation: 在闪烁体面板1中由Al制成的基板的表面喷砂,而其一个表面形成有作为低折射率材料的MgF 2膜。 MgF2膜的表面由具有用于将入射辐射转换成可见光的柱状结构的闪烁体形成。 与基底一起,闪烁体被聚对二甲苯膜覆盖。

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