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公开(公告)号：US20080157006A1
公开(公告)日：2008-07-03
申请号：US11645809
申请日：2006-12-27
Applicant: Maarten Marinus Johannes Wilhelmus Van Herpen , Derk Jan Wilfred Klunder , Wouter Anthon Soer , Kurt Gielissen
Inventor： Maarten Marinus Johannes Wilhelmus Van Herpen , Derk Jan Wilfred Klunder , Wouter Anthon Soer , Kurt Gielissen
IPC: G21G5/00
CPC classification number: G03F7/70916 , G03F7/70858 , H05G2/003 , H05G2/005
Abstract: A debris mitigation system for trapping contaminant material coming from a debris-generating radiation source. The system includes a contamination barrier constructed and arranged to rotate about an axis, and a magnet structure constructed and arranged to provide a magnetic field for deflecting charged debris from the radiation source. The magnet structure is constructed and arranged to provide a magnetic field through the contamination barrier. The magnetic field, when passing through the contamination barrier, is oriented along planes generally coinciding with the axis of rotation of the contamination barrier.
Abstract translation: 用于捕集来自碎屑产生辐射源的污染物质的碎片缓解系统。 该系统包括构造和布置成围绕轴线旋转的污染屏障，以及构造和布置成提供用于使来自辐射源的带电碎片偏转的磁场的磁体结构。 磁体结构被构造和布置成通过污染屏障提供磁场。 当通过污染屏障时，磁场沿着通常与污染屏障旋转轴线重合的平面定向。
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42.发明申请Patterning device, method of providing a patterning device, photolithographic apparatus and device manufacturing method 有权图案化装置，提供图案形成装置的方法，光刻装置和装置制造方法公开(公告)号：US20080151215A1
公开(公告)日：2008-06-26
申请号：US11643953
申请日：2006-12-22
Applicant: Wouter Anthon Soer , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen
Inventor： Wouter Anthon Soer , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen
IPC: G03F1/00
CPC classification number: G03F7/70283 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/34 , G21K1/062 , G21K2201/067
Abstract: A patterning device for a photolithographic apparatus is used to form a patterned radiation beam, by imparting a cross-sectional pattern to the radiation beam during reflection from the patterning device. The patterning device comprises a layer of phase-change material that is capable of locally undergoing an induced structural phase change into respective ones of a plurality of stable and/or metastable states. Furthermore, the patterning device comprises a radiation reflective structure with periodically arranged layers adjacent to the layer of phase-change material. The radiation reflective structures do not partake in the phase changes. By locally changing the phase of the phase-change material, the reflectivity of the whole structure is modified, for example due to thickness changes in the layer of phase-change material that lead to destructive interference of different components of the reflected light or due to changes in surface roughness of the radiation reflective structure.
Abstract translation: 用于光刻设备的图案形成装置用于通过在从图案形成装置反射期间将辐射束赋予横截面图案来形成图案化的辐射束。 图案形成装置包括相变材料层，其能够局部地经历诱导的结构相变为多个稳定和/或亚稳态中的相应的相变。 此外，图案形成装置包括具有与相变材料层相邻的周期性排列的层的辐射反射结构。 辐射反射结构不参与相位变化。 通过局部改变相变材料的相位，整个结构的反射率被改变，例如由于相变材料层中的厚度变化导致反射光的不同分量的破坏性干扰或由于 辐射反射结构的表面粗糙度变化。
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公开(公告)号：US09726989B2
公开(公告)日：2017-08-08
申请号：US13643265
申请日：2011-02-22
Applicant: Wouter Anthon Soer , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak
Inventor： Wouter Anthon Soer , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak
CPC classification number: G03F7/70891 , G02B5/208 , G03F7/70191 , G03F7/70575
Abstract: A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from a material having a bulk reflectance of substantially greater than or equal to 70% at the first wavelength of radiation. The material has a melting point above 1000° C.
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44.发明授权Spectral purity filter, radiation source, lithographic apparatus, and device manufacturing method 有权光谱纯度滤光片，辐射源，光刻设备和器件制造方法公开(公告)号：US09195144B2
公开(公告)日：2015-11-24
申请号：US13059057
申请日：2009-07-09
Applicant: Martin Jacobus Johan Jak , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer , Andrei Mikhailovich Yakunin
Inventor： Martin Jacobus Johan Jak , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer , Andrei Mikhailovich Yakunin
CPC classification number: G03F7/702 , G03F7/70191 , G03F7/70575 , G21K1/10
Abstract: A spectral purity filter is configured to allow transmission therethrough of extreme ultraviolet (EUV) radiation and to refract or reflect non-EUV secondary radiation. The spectral purity filter may be part of a source module and/or a lithographic apparatus.
Abstract translation: 光谱纯度滤光器被配置为允许透射通过其中的极紫外（EUV）辐射并折射或反射非EUV次级辐射。 光谱纯度滤光片可以是源模块和/或光刻设备的一部分。
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公开(公告)号：US08390788B2
公开(公告)日：2013-03-05
申请号：US12500198
申请日：2009-07-09
Applicant: Wouter Anthon Soer , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Andrey Mikhailovich Yakunin , Martin Jacobus Johan Jak
Inventor： Wouter Anthon Soer , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Andrey Mikhailovich Yakunin , Martin Jacobus Johan Jak
CPC classification number: G03F7/702 , G03F7/70191 , G03F7/70575 , G21K1/10
Abstract: According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 μm.
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Patent Agency Ranking
公开(公告)号：US20130038926A1
公开(公告)日：2013-02-14
申请号：US13643265
申请日：2011-02-22
Applicant: Wouter Anthon Soer , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak
Inventor： Wouter Anthon Soer , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak
CPC classification number: G03F7/70891 , G02B5/208 , G03F7/70191 , G03F7/70575
Abstract: A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from a material having a bulk reflectance of substantially greater than or equal to 70% at the first wavelength of radiation. The material has a melting point above 1000° C.
Abstract translation: 光谱纯度滤光器包括一组材料，多个孔通过它们延伸。 孔被布置成抑制具有第一波长的辐射并且允许具有第二波长的辐射的至少一部分透射通过孔。 辐射的第二波长比辐射的第一波长短。 材料体在第一波长辐射下由体积反射率基本上大于或等于70％的材料形成。 该材料的熔点高于1000℃
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47.发明授权公开(公告)号：US08242471B2
公开(公告)日：2012-08-14
申请号：US12431423
申请日：2009-04-28
Applicant: Wouter Anthon Soer , Vadim Yevgenyevich Banine , Tjarko Adriaan Rudolf Van Empel , Erik Roelof Loopstra , Maarten Marinus Johannes Wilhelmus Van Herpen
Inventor： Wouter Anthon Soer , Vadim Yevgenyevich Banine , Tjarko Adriaan Rudolf Van Empel , Erik Roelof Loopstra , Maarten Marinus Johannes Wilhelmus Van Herpen
IPC: G01J3/10
CPC classification number: G03F7/70916 , G21K2201/064 , H05G2/005
Abstract: A radiation source includes a radiation emitter configured to emit radiation, a collector configured to collect the radiation, and a contamination trap configured to trap contamination emitted by the radiation source. The contamination trap includes a plurality of foils that extend substantially radially, a first magnet ring configured to lie outside of an outer conical trajectory of radiation that is collected by the collector, and a second magnet ring configured to lie within the trajectory of radiation that is collected by the collector. The magnet rings are configured to provide a magnetic field that includes a component that is parallel to the foils.
Abstract translation: 辐射源包括被配置为发射辐射的辐射发射器，被配置为收集辐射的收集器以及被配置为捕获由辐射源发射的污染的污染阱。 污染物捕集器包括大致径向延伸的多个箔片，构造成位于由收集器收集的辐射的外锥形轨迹之外的第一磁环，以及构造成位于辐射轨迹内的第二磁环， 由收藏者收集。 磁环被配置成提供包括与箔片平行的部件的磁场。
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公开(公告)号：US08120752B2
公开(公告)日：2012-02-21
申请号：US12466185
申请日：2009-05-14
IPC: G03B27/72
CPC classification number: G02B27/44 , G02B5/1838 , G02B5/1876 , G02B27/4244 , G02F1/061 , G03F7/70191 , G21K1/06 , G21K2201/067
Abstract: A zone plate includes a plurality of consecutively arranged, adjacent, and alternating first and second regions. The first regions are arranged to be substantially transparent to a first predetermined wavelength of radiation and a second predetermined wavelength of radiation that is different from the first predetermined wavelength of radiation. The second regions are arranged to be substantially opaque, diffractive, or reflective to the first predetermined wavelength of radiation and substantially transparent to the second predetermined wavelength of radiation.
Abstract translation: 区域板包括多个连续布置的，相邻的和交替的第一和第二区域。 第一区域被布置成对于辐射的第一预定波长和不同于第一预定波长辐射的第二预定波长的辐射基本上是透明的。 第二区域被布置为基本上不透明，衍射或反射到第一预定波长的辐射并且对第二预定波长的辐射基本透明。
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49.发明申请公开(公告)号：US20110164237A1
公开(公告)日：2011-07-07
申请号：US13119895
申请日：2009-08-26
Applicant: Wouter Anthon Soer , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak , Denny Mathew , Hendrik Jan Kettelarij , Fredericus Christiaan Van Den Heuvel , Elizabeth Maria Kuijpers
Inventor： Wouter Anthon Soer , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak , Denny Mathew , Hendrik Jan Kettelarij , Fredericus Christiaan Van Den Heuvel , Elizabeth Maria Kuijpers
CPC classification number: G03F7/7095 , B82Y10/00 , G02B5/208 , G03F7/70191 , G03F7/70575 , G21K1/10 , G21K2201/061
Abstract: A transmissive spectral purity filter is configured to transmit extreme ultraviolet radiation. The spectral purity filter includes a filter part having a plurality of apertures configured to transmit extreme ultraviolet radiation and to suppress transmission of a second type of radiation. Each aperture has been manufactured by an anisotropic etching process.
Abstract translation: 透射光谱纯度滤光器被配置为透射极紫外辐射。 光谱纯度滤光器包括具有多个孔的滤光器部分，其被配置为透射极紫外辐射并抑制第二类型辐射的透射。 每个孔径均通过各向异性蚀刻工艺制造。
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公开(公告)号：US20110149262A1
公开(公告)日：2011-06-23
申请号：US13060581
申请日：2009-07-29
CPC classification number: G03F7/70958 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F7/70191 , G03F7/70308 , G03F7/70575 , G21K1/062
Abstract: A spectral purity filter is configured to reflect extreme ultraviolet radiation. The spectral purity filter includes a substrate, and an anti-reflective coating on a top surface of the substrate. The anti-reflective coating is configured to transmit infrared radiation. The filter also includes a multi-layer stack configured to reflect extreme ultraviolet radiation and to substantially transmit infrared radiation.
Abstract translation: 光谱纯度滤光器被配置为反射极紫外辐射。 光谱纯度滤光器包括基板和在基板顶表面上的抗反射涂层。 抗反射涂层被配置为透射红外辐射。 该滤波器还包括配置成反射极紫外辐射并基本上透射红外辐射的多层叠层。
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