公开(公告)号：US06750394B2

公开(公告)日：2004-06-15

申请号：US10041681

申请日：2002-01-10

Applicant: Hiroshi Yamamoto ,  Kenji Wada

Inventor： Hiroshi Yamamoto ,  Kenji Wada

IPC: H01L31075

CPC classification number: H01L31/075 ,  H01L31/022466 ,  H01L31/022483 ,  H01L31/02363 ,  H01L31/02366 ,  H01L31/028 ,  H01L31/03685 ,  H01L31/03762 ,  H01L31/0547 ,  H01L31/0747 ,  Y02E10/52 ,  Y02E10/545 ,  Y02E10/547 ,  Y02E10/548

Abstract: A thin-film solar cell comprises a set of a transparent conductive layer and a photoelectric conversion layer laminated in this order on a substrate, wherein the photoelectric conversion layer is made of a p-i-n junction, the i-layer is made of a crystalline layer and the transparent conductive layer is provided with a plurality of holes at its surface of the side of the photoelectric conversion layer, each of said holes having irregularities formed on its surface.

Abstract translation: 薄膜太阳能电池包括在基板上依次层叠的一组透明导电层和光电转换层，其中光电转换层由pin结形成，i层由结晶层制成， 透明导电层在其光电转换层的一侧的表面设置有多个孔，每个所述孔在其表面上形成有凹凸。

公开(公告)号：US06720661B2

公开(公告)日：2004-04-13

申请号：US09870710

申请日：2001-06-01

Applicant: Terunao Hanaoka ,  Kenji Wada

Inventor： Terunao Hanaoka ,  Kenji Wada

IPC: H01L2348

CPC classification number: H01L24/13 ,  H01L21/76898 ,  H01L23/3107 ,  H01L23/481 ,  H01L24/11 ,  H01L24/16 ,  H01L24/94 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/0231 ,  H01L2224/0401 ,  H01L2224/05124 ,  H01L2224/05147 ,  H01L2224/05155 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/11334 ,  H01L2224/114 ,  H01L2224/116 ,  H01L2224/13099 ,  H01L2224/131 ,  H01L2224/13144 ,  H01L2224/13155 ,  H01L2224/1319 ,  H01L2224/16237 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2225/06586 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01019 ,  H01L2924/01027 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/01033 ,  H01L2924/01046 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/07811 ,  H01L2924/12042 ,  H01L2924/14 ,  H01L2924/19041 ,  H01L2924/19043 ,  H01L2924/3025 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2924/013

Abstract: A method of fabricating a semiconductor device including: a first step of forming a through hole in a semiconductor element having electrodes on a first surface; and a second step of forming a conductive layer which is electrically connected to the electrodes and is provided from the first surface through an inner wall of the through hole to a second surface of the semiconductor element which is opposite to the first surface. The conductive layer is formed to have connecting portions on the first and second surfaces so that a distance between at least two electrodes among the electrodes is different from a distance between the connecting portions on at least one of the first and second surfaces, in the second step.

公开(公告)号：US06521826B2

公开(公告)日：2003-02-18

申请号：US09723277

申请日：2000-11-29

Applicant: Kenji Wada

Inventor： Kenji Wada

IPC: H01L31036

CPC classification number: H01L31/182 ,  H01L31/075 ,  H01L31/1824 ,  Y02E10/545 ,  Y02E10/546 ,  Y02E10/548 ,  Y02P70/521

Abstract: An n-type polysilicon thin film, an intrinsic polysilicon thin film and a p-type polysilicon thin film are formed on a transparent conductive film of a glass substrate by the plasma enhanced CVD method at a plasma excitation frequency of 81.36 MHz so as to obtain a photoelectric conversion layer. The n-type polysilicon thin film and the intrinsic polysilicon thin film are then formed so that the crystallization ratio of the n-doped layer located on the incident light side becomes equal to or greater than the crystallization ratio of the intrinsic layer. Thus, a thin film solar cell having an appropriate structure of a junction interface between the n-layer and the intrinsic layer is obtained.

Abstract translation: 在81.36MHz的等离子体激发频率下，通过等离子体增强CVD法在玻璃基板的透明导电膜上形成n型多晶硅薄膜，本征多晶硅薄膜和p型多晶硅薄膜，以获得 光电转换层。 然后形成n型多晶硅薄膜和本征多晶硅薄膜，使得位于入射光侧的n掺杂层的结晶比变得等于或大于本征层的结晶比。 因此，获得具有n层和本征层之间的结界面的适当结构的薄膜太阳能电池。

公开(公告)号：US08507174B2

公开(公告)日：2013-08-13

申请号：US12673096

申请日：2008-08-11

Applicant: Hidenori Takahashi ,  Kenji Wada ,  Sou Kamimura

Inventor： Hidenori Takahashi ,  Kenji Wada ,  Sou Kamimura

IPC: G03F7/039 ,  G03F7/20 ,  G03F7/30

CPC classification number: C07C309/72 ,  C07C69/716 ,  C07C309/65 ,  C07C309/74 ,  C07C311/48 ,  C07C317/44 ,  C07C317/46 ,  C07C323/20 ,  C07C2601/14 ,  C07C2602/08 ,  C07C2602/10 ,  C07C2602/42 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041

Abstract: A positive resist composition comprising (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (B) a resin capable of increasing the solubility in an alkali developer by the action of an acid, and (C) a compound having a specific structure, which decomposes by the action of an acid to generate an acid, a pattern forming method using the positive resist composition, and a compound for use in the positive resist composition are provided as a positive resist composition exhibiting good performance in terms of pattern profile, line edge roughness, pattern collapse, sensitivity and resolution in normal exposure (dry exposure), immersion exposure and double exposure, a pattern forming method using the positive resist composition and a compound for use in the positive resist composition.

Abstract translation: 一种正型抗蚀剂组合物，其包含（A）在通过光化射线或辐射照射时能够产生酸的化合物，（B）能够通过酸的作用增加在碱性显影剂中的溶解度的树脂，和（C） 提供具有特定结构的化合物，其通过酸的作用而分解以产生酸，使用正性抗蚀剂组合物的图案形成方法和用于正性抗蚀剂组合物的化合物作为正性抗蚀剂组合物，其表现出良好的性能 使用正性抗蚀剂组合物的图案形成方法和用于正性抗蚀剂组合物的化合物的图案形成方法，线条粗糙度，图案塌陷，在正常曝光（干曝光）中的灵敏度和分辨率，浸渍曝光和双重曝光。

公开(公告)号：US08426101B2

公开(公告)日：2013-04-23

申请号：US11642540

申请日：2006-12-21

Applicant: Kenji Wada ,  Hiromi Kanda

Inventor： Kenji Wada ,  Hiromi Kanda

IPC: G03C1/00 ,  G03F7/00 ,  C07C315/00 ,  C07C309/00

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041

Abstract: A photosensitive composition containing a compound having a specific structure as described in the specification, a pattern-forming method using the photosensitive composition and the compound having a specific structure used in the photosensitive composition.

Abstract translation: 含有本说明书中记载的具有特定结构的化合物的感光性组合物，使用感光性组合物的图案形成方法和在感光性组合物中使用的具有特定结构的化合物。

公开(公告)号：US07879633B2

公开(公告)日：2011-02-01

申请号：US12453301

申请日：2009-05-06

Applicant: Kenji Wada

Inventor： Kenji Wada

IPC: H01L21/00

CPC classification number: H01L27/14683 ,  H01L21/76898 ,  H01L23/481 ,  H01L24/48 ,  H01L24/73 ,  H01L27/14618 ,  H01L27/1462 ,  H01L27/14621 ,  H01L27/14627 ,  H01L27/14632 ,  H01L27/14636 ,  H01L27/14687 ,  H01L31/0203 ,  H01L31/18 ,  H01L33/382 ,  H01L2224/32225 ,  H01L2224/48227 ,  H01L2224/48465 ,  H01L2224/73265 ,  H01L2924/00014 ,  H01L2924/00015 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01046 ,  H01L2924/01057 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/12042 ,  H01L2924/15153 ,  H01L2924/15165 ,  H01L2924/15312 ,  H01L2924/16195 ,  H01L2924/3025 ,  H01L2933/0016 ,  Y10S257/911 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/85399 ,  H01L2224/05599 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A method of manufacturing an optical element including the steps of: forming a through hole in a semiconductor element which has an optical section and an electrode electrically connected to the optical section; and forming a conductive layer extending from a first surface of the semiconductor element on which the optical section is formed, through an inner wall surface of the through hole, to a second surface opposite to the first surface.

Abstract translation: 一种制造光学元件的方法，包括以下步骤：在具有光学部分和电连接到光学部分的电极的半导体元件中形成通孔; 以及形成从其上形成有所述光学部分的所述半导体元件的第一表面延伸穿过所述通孔的内壁表面到与所述第一表面相对的第二表面的导电层。

公开(公告)号：US20100330507A1

公开(公告)日：2010-12-30

申请号：US12825088

申请日：2010-06-28

Applicant: Hideaki TSUBAKI ,  Shinji Tarutani ,  Kazuyoshi Mizuyoshi ,  Kenji Wada ,  Wataru Hoshino

Inventor： Hideaki TSUBAKI ,  Shinji Tarutani ,  Kazuyoshi Mizuyoshi ,  Kenji Wada ,  Wataru Hoshino

IPC: G03F7/20

CPC classification number: G03F7/0397 ,  G03F7/325 ,  Y10S430/106 ,  Y10S430/111

Abstract: A pattern forming method includes (a) coating a substrate with a resist composition including a resin that includes a repeating unit represented by a following general formula (NGH-1), and, by the action of an acid, increases the polarity and decreases the solubility in a negative developing solution; (b) exposing; and (d) developing with a negative developing solution: wherein RNGH1 represents a hydrogen atom or an alkyl group; and RNGH2 to RNGH4 each independently represents a hydrogen atom or a hydroxyl group, provided that at least one of RNGH2 to RNGH4 represents a hydroxyl group.

Abstract translation: 图案形成方法包括：（a）用包含由以下通式（NGH-1）表示的重复单元的树脂的抗蚀剂组合物涂布基材，并且通过酸的作用增加极性，并降低 在负显影液中的溶解度; （b）曝光; 和（d）用负显影液显影：其中RNGH1表示氢原子或烷基; 并且RNGH 2至RNGH 4各自独立地表示氢原子或羟基，条件是RNGH 2至RNGH 4中的至少一个表示羟基。

公开(公告)号：US07718344B2

公开(公告)日：2010-05-18

申请号：US11864049

申请日：2007-09-28

Applicant: Sou Kamimura ,  Kenji Wada ,  Yasutomo Kawanishi

Inventor： Sou Kamimura ,  Kenji Wada ,  Yasutomo Kawanishi

IPC: G03F7/039 ,  G03F7/20 ,  G03F7/30

CPC classification number: G03F7/0045 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/123 ,  Y10S430/126

Abstract: A resist composition, includes: (B) a polymer having a group capable of decomposing under an action of an acid and having a weight average molecular weight of 1,000 to 5,000, of which solubility in an alkali developer increases under an action of an acid; and (Z) a compound containing a sulfonium cation having a structure represented by formula (Z-1): wherein Y1 to Y13 each independently represents a hydrogen atom or a substituent, and adjacent members of Y1 to Y13 may combine with each other to form a ring; and Z represents a single bond or a divalent linking group.

Abstract translation: 抗蚀剂组合物包括：（B）具有能够在酸的作用下分解并且重均分子量为1,000至5,000的基团的聚合物，其在碱性显影剂中的溶解度在酸的作用下增加; 和（Z）含有具有由式（Z-1）表示的结构的锍阳离子的化合物：其中Y 1至Y 13各自独立地表示氢原子或取代基，并且Y 1至Y 13的相邻成员可以相互结合形成 戒指; Z表示单键或二价连接基团。

公开(公告)号：US07695891B2

公开(公告)日：2010-04-13

申请号：US11471713

申请日：2006-06-21

Applicant: Kenji Wada

Inventor： Kenji Wada

IPC: G03F7/004 ,  C07C309/00

CPC classification number: C07C309/80 ,  C07C311/48 ,  C07C381/12 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/122 ,  Y10S430/124 ,  Y10S430/126

Abstract: A photosensitive composition comprising a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation; a pattern forming method using the photosensitive composition; a compound having a specific structure; and a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation.

Abstract translation: 一种光敏组合物，其包含能够在用光化射线或辐射照射时产生具有特定结构的化合物的化合物; 使用该感光性组合物的图案形成方法; 具有特定结构的化合物; 以及能够在用光化射线或辐射照射时产生具有特定结构的化合物的化合物。

公开(公告)号：US07615330B2

公开(公告)日：2009-11-10

申请号：US11727267

申请日：2007-03-26

Applicant: Sou Kamimura ,  Tomoya Sasaki ,  Yasutomo Kawanishi ,  Kenji Wada

Inventor： Sou Kamimura ,  Tomoya Sasaki ,  Yasutomo Kawanishi ,  Kenji Wada

IPC: G03F7/004 ,  G03F7/30

CPC classification number: G03F7/0045 ,  G03F7/0392 ,  Y10S430/122 ,  Y10S430/123

Abstract: A positive resist composition containing a compound including a sulfonium cation having a structure represented by the formula (Z-I) as defined herein, a low molecular weight compound which increases solubility in an alkali developing solution by an action of an acid, and a compound which generates a compound having a structure represented by the formula (A-I) as defined herein upon irradiation of an actinic ray or a radiation.

Abstract translation: 含有具有本文定义的式（ZI）所示结构的锍阳离子的化合物的正性抗蚀剂组合物，通过酸的作用增加在碱性显影液中的溶解度的低分子量化合物和产生 在通过光化射线或辐射照射时具有如本文所定义的式（AI）表示的结构的化合物。