Semiconductor Device and Method of Integrating eWLB with E-bar Structures and RF Antenna Interposer

    公开(公告)号:US20250038101A1

    公开(公告)日:2025-01-30

    申请号:US18357361

    申请日:2023-07-24

    Abstract: A semiconductor device has an electrical component and a plurality of e-bar structures disposed adjacent to the electrical component. An antenna interposer is disposed over a first surface of the e-bar structures. A redistribution layer is formed over a second surface of the e-bar structures opposite the first surface of the e-bar structures. The redistribution layer has a conductive layer and an insulating layer formed over the conductive layer. An encapsulant is deposited over the electrical component. The antenna interposer has a first conductive layer, an insulating layer formed over the first conductive layer, and a second conductive layer formed over the insulating layer. The second conductive layer can be arranged as a plurality of islands or in a serpentine pattern.

    Split RDL connection between die and UBM

    公开(公告)号:US12107058B2

    公开(公告)日:2024-10-01

    申请号:US17445330

    申请日:2021-08-18

    Abstract: A semiconductor device has a semiconductor die. A first contact pad, second contact pad, and third contact pad are formed over the semiconductor die. An under-bump metallization layer (UBM) is formed over the first contact pad, second contact pad, and third contact pad. The UBM electrically connects the first contact pad to the second contact pad. The third contact pad is electrically isolated from the UBM. Conductive traces can be formed extending between the first contact pad and second contact pad under the UBM. A fourth contact pad can be formed over the first contact pad and a fifth contact pad can be formed over the second contact pad. The UBM is then formed over the fourth and fifth contact pads.

    Split RDL Connection Between Die and UBM

    公开(公告)号:US20230056780A1

    公开(公告)日:2023-02-23

    申请号:US17445330

    申请日:2021-08-18

    Abstract: A semiconductor device has a semiconductor die. A first contact pad, second contact pad, and third contact pad are formed over the semiconductor die. An under-bump metallization layer (UBM) is formed over the first contact pad, second contact pad, and third contact pad. The UBM electrically connects the first contact pad to the second contact pad. The third contact pad is electrically isolated from the UBM. Conductive traces can be formed extending between the first contact pad and second contact pad under the UBM. A fourth contact pad can be formed over the first contact pad and a fifth contact pad can be formed over the second contact pad. The UBM is then formed over the fourth and fifth contact pads.

    Semiconductor device and method of using a standardized carrier to form embedded wafer level chip scale packages

    公开(公告)号:US11488932B2

    公开(公告)日:2022-11-01

    申请号:US16827363

    申请日:2020-03-23

    Abstract: A semiconductor device includes a standardized carrier. A semiconductor wafer includes a plurality of semiconductor die and a base semiconductor material. The semiconductor wafer is singulated through a first portion of the base semiconductor material to separate the semiconductor die. The semiconductor die are disposed over the standardized carrier. A size of the standardized carrier is independent from a size of the semiconductor die. An encapsulant is deposited over the standardized carrier and around the semiconductor die. An interconnect structure is formed over the semiconductor die while leaving the encapsulant devoid of the interconnect structure. The semiconductor device is singulated through the encapsulant. Encapsulant remains disposed on a side of the semiconductor die. Alternatively, the semiconductor device is singulated through a second portion of the base semiconductor and through the encapsulant to remove the second portion of the base semiconductor and encapsulant from the side of the semiconductor die.

    Semiconductor device and method of forming MEMS package

    公开(公告)号:US11319207B2

    公开(公告)日:2022-05-03

    申请号:US16912902

    申请日:2020-06-26

    Abstract: A microelectromechanical system (MEMS) semiconductor device has a first and second semiconductor die. A first semiconductor die is embedded within an encapsulant together with a modular interconnect unit. Alternatively, the first semiconductor die is embedded within a substrate. A second semiconductor die, such as a MEMS die, is disposed over the first semiconductor die and electrically connected to the first semiconductor die through an interconnect structure. In another embodiment, the first semiconductor die is flip chip mounted to the substrate, and the second semiconductor die is wire bonded to the substrate adjacent to the first semiconductor die. In another embodiment, first and second semiconductor die are embedded in an encapsulant and are electrically connected through a build-up interconnect structure. A lid is disposed over the semiconductor die. In a MEMS microphone embodiment, the lid, substrate, or interconnect structure includes an opening over a surface of the MEMS die.

    Semiconductor device and method of forming openings through insulating layer over encapsulant for enhanced adhesion of interconnect structure

    公开(公告)号:US11127666B2

    公开(公告)日:2021-09-21

    申请号:US15428007

    申请日:2017-02-08

    Abstract: A semiconductor device has a semiconductor die mounted to a carrier. An encapsulant is deposited over the semiconductor die and carrier. The carrier is removed. A first insulating layer is formed over a portion of the encapsulant within an interconnect site outside a footprint of the semiconductor die. An opening is formed through the first insulating layer within the interconnect site to expose the encapsulant. The opening can be ring-shaped or vias around the interconnect site and within a central region of the interconnect site to expose the encapsulant. A first conductive layer is formed over the first insulating layer to follow a contour of the first insulating layer. A second conductive layer is formed over the first conductive layer and exposed encapsulant. A second insulating layer is formed over the second conductive layer. A bump is formed over the second conductive layer in the interconnect site.

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