公开(公告)号：US4526468A

公开(公告)日：1985-07-02

申请号：US509597

申请日：1983-06-30

Applicant: Edgar F. Steigmeier ,  Heinrich Auderset

Inventor： Edgar F. Steigmeier ,  Heinrich Auderset

IPC: G01N21/47 ,  G01N21/59 ,  G01N21/95 ,  G01N21/01

CPC classification number: G01N21/9501 ,  G01N21/4738 ,  G01N2021/5938 ,  G01N2201/1087

Abstract: A method of determining the crystalline or structural quality of phase transformable material such as silicon uses light scattering. The material is exposed to a beam of light of a selected wavelength. Scattered light having an intensity above a threshold is detected to provide a signal which is used to control the intensity of a display beam of a visual display device. The threshold is varied to thereby vary the display beam intensity so as to provide the minimum intensity of display beam which yields a full display. The value of the thusly adjusted threshold intensity is used as a direct measure of the structural quality of the material.The light scattering process is used to determine the phase of deposited material.A layer of silicon material annealed from as-deposited amorphous phase material is easily and quickly distinguished from material as-deposited crystalline phase material and subsequently annealed.

Abstract translation: 确定相变材料如硅的结晶或结构质量的方法使用光散射。 该材料暴露于所选波长的光束。 检测强度高于阈值的散射光，以提供用于控制视觉显示装置的显示光束强度的信号。 改变阈值从而改变显示光束强度，以便提供产生全显示的显示光束的最小强度。 将这样调整的阈值强度的值用作对材料的结构质量的直接测量。 光散射过程用于确定沉积材料的相位。 从沉积的非晶相材料退火的硅材料层容易且快速地与材料沉积的晶相材料区分开，随后退火。