公开(公告)号：US20150285749A1

公开(公告)日：2015-10-08

申请号：US14678567

申请日：2015-04-03

Applicant: Massachusetts Institute of Technology

Inventor： David Eugene Moncton ,  William Sproull Graves ,  Franz Xaver Kaertner ,  Hua Lin ,  Emilio Alessandro Nanni ,  Luis E. Zapata ,  Boris Khaykovich

IPC: G01N23/201 ,  H05G2/00

CPC classification number: G01N23/201 ,  H05G2/00

Abstract: The structure of materials can be characterized (e.g., via CD-SAXS) by generating a burst of electron bunches in a pulse train and accelerating the electron bunches to relativistic energies. Meanwhile, an optical cavity is filled with a laser pulse; and the electron bunches collide with the laser pulse in the optical cavity, permitting a single laser pulse to interact with the electron bunch train to generate x-rays via inverse Compton scattering. The generated x-rays are then directed to a sample, and the sample is imaged by measuring the scattering of the x-rays from the sample.

Abstract translation: 材料的结构可以通过在脉冲串中产生电子束的脉冲串并将电子束加速到相对论能量来表征（例如通过CD-SAXS）。 同时，用激光脉冲填充光腔; 并且电子束与光学腔中的激光脉冲碰撞，允许单个激光脉冲与电子束串相互作用以通过反康普顿散射产生X射线。 然后将生成的X射线引导到样品，并且通过测量来自样品的X射线的散射来对样品成像。

公开(公告)号：US20150241366A1

公开(公告)日：2015-08-27

申请号：US14187832

申请日：2014-02-24

Applicant: Rigaku Innovative Technologies, Inc.

Inventor： Licai Jiang ,  Paul Ulrich Pennartz

IPC: G01N23/201 ,  G21K1/04

CPC classification number: G01N23/201 ,  G21K1/02 ,  G21K1/025 ,  G21K1/04 ,  G21K2201/062

Abstract: An assembly for Kratky collimator is provided. The assembly may be used for a small angle x-ray camera or system requiring such filtering. The assembly may include a first block with a first working surface and a second block with a second working surface. The first and second blocks may be aligned with the first working surface pointing an opposite direction of the second working surface and the first working surface being aligned in a common plane with the second working surface. In some implementations, the first block may comprise a crystal material. In some implementations, an extension may of the first block may be configured position a beamstop.

Abstract translation: 提供了Kratky准直器的组件。 组件可用于需要这种过滤的小角度X射线摄像机或系统。 组件可以包括具有第一工作表面的第一块和具有第二工作表面的第二块。 第一和第二块可以与第一工作表面对准，其指向第二工作表面的相反方向，并且第一工作表面与第二工作表面在公共平面中对准。 在一些实施方案中，第一块可以包括晶体材料。 在一些实施方案中，第一块的延伸部可以被配置为定位梁挡。

公开(公告)号：US09080944B2

公开(公告)日：2015-07-14

申请号：US13735509

申请日：2013-01-07

Applicant: Bruker AXS, Inc.

Inventor： Jonathan Giencke

IPC: G01N23/207 ,  G01N23/201

CPC classification number: G01N23/207 ,  G01N23/201 ,  G01N2223/501 ,  G01N2223/61 ,  G01N2223/6116

Abstract: An apparatus for examining the surface of a crystalline sample uses in-plane grazing incidence diffraction with a position-sensitive detector. The x-ray source illuminates an extended region of the sample and, for crystal sections having the appropriate lattice orientation, an elongated diffraction signal is produced. The relative position of the sample and the x-ray beam may then be changed to illuminate different regions of the sample so that the diffraction signal corresponds to these other regions. By scanning across the entire sample, a spatial profile of the sample surface may be generated. The system may be used to locate crystal boundaries, defects, or the presence of attenuating materials on the sample surface.

Abstract translation: 用于检查结晶样品的表面的装置使用位置敏感检测器进行平面内掠入射衍射。 x射线源照射样品的延伸区域，并且对于具有适当晶格取向的晶体部分，产生细长的衍射信号。 然后可以改变样品和x射线束的相对位置以照射样品的不同区域，使得衍射信号对应于这些其它区域。 通过扫描整个样品，可以产生样品表面的空间分布。 该系统可用于在样品表面上定位晶体边界，缺陷或衰减材料的存在。

公开(公告)号：US20150117610A1

公开(公告)日：2015-04-30

申请号：US14521966

申请日：2014-10-23

Applicant: KLA-Tencor Corporation

Inventor： Andrei Veldman ,  Michael S. Bakeman ,  Andrei V. Shchegrov ,  Walter D. Mieher

IPC: G03F7/20 ,  G01N23/201 ,  G01N21/95 ,  G01N23/203

CPC classification number: G03F7/70633 ,  G01N21/9501 ,  H01L22/12

Abstract: Disclosed are apparatus and methods for determining overlay error in a semiconductor target. For illumination x-rays having at least one angle of incidence (AOI), a correlation model is obtained, and the correlation model correlates overlay error of a target with a modulation intensity parameter for each of one or more diffraction orders (or a continuous diffraction intensity distribution) for x-rays scattered from the target in response to the illumination x-rays. A first target is illuminated with illumination x-rays having the at least one AOI and x-rays that are scattered from the first target in response to the illumination x-rays are collected. An overlay error of the first target is determined based on the modulation intensity parameter of the x-rays collected from the first target for each of the one or more diffraction orders (or the continuous diffraction intensity distribution) and the correlation model.

Abstract translation: 公开了用于确定半导体目标中的重叠误差的装置和方法。 对于具有至少一个入射角（AOI）的照明x射线，获得相关模型，并且相关模型将目标的重叠误差与一个或多个衍射级（或连续衍射中的每一个）的调制强度参数相关联 强度分布），用于响应于照射x射线从目标散射的X射线。 利用具有至少一个AOI的照明x射线照射第一个目标，并且响应于照射x射线而从第一个目标物体散射的X射线被照射。 基于对于一个或多个衍射级（或连续衍射强度分布）和相关模型中的每一个而从第一目标收集的x射线的调制强度参数来确定第一目标的覆盖误差。

公开(公告)号：US20150110249A1

公开(公告)日：2015-04-23

申请号：US14515322

申请日：2014-10-15

Applicant: KLA-Tencor Corporation

Inventor： Michael S. Bakeman ,  Andrei V. Shchegrov ,  Ady Levy ,  Guorong V. Zhuang ,  John J. Hench

IPC: G01N23/201 ,  G01N33/00

CPC classification number: G01N23/201 ,  G01N2033/0095

Abstract: Disclosed are apparatus and methods for performing small angle x-ray scattering metrology. This system includes an x-ray source for generating x-rays and illumination optics for collecting and reflecting or refracting a portion of the generated x-rays towards a particular focus point on a semiconductor sample in the form of a plurality of incident beams at a plurality of different angles of incidence (AOIs). The system further includes a sensor for collecting output x-ray beams that are scattered from the sample in response to the incident beams on the sample at the different AOIs and a controller configured for controlling operation of the x-ray source and illumination optics and receiving the output x-rays beams and generating an image from such output x-rays.

Abstract translation: 公开了用于执行小角度X射线散射测量的装置和方法。 该系统包括用于产生X射线的X射线源和照明光学器件，用于收集并折射所产生的X射线的一部分朝着半导体样本上的特定聚焦点以多个入射光束的形式反射或折射 多个不同的入射角（AOI）。 该系统还包括传感器，用于响应于在不同AOI处的样品上的入射光束而从样品收集输出的X射线束，以及控制器，被配置为控制X射线源和照明光学器件的接收和接收 输出x射线束并从这样的输出x射线产生图像。

公开(公告)号：US20140067316A1

公开(公告)日：2014-03-06

申请号：US13752490

申请日：2013-01-29

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Yasuhiko ISHIBASHI

IPC: G01N23/201 ,  G06F17/00

CPC classification number: G01N23/201 ,  G01N2223/6116 ,  G06F17/00

Abstract: In accordance with an embodiment, a measuring apparatus includes a stage, an electromagnetic wave applying unit, a detector, a monitor, a detector location adjusting unit, and a measuring unit. The stage supports a substrate comprising a periodic structure on a main surface thereof. The electromagnetic wave applying unit generates electromagnetic waves and applies the electromagnetic waves to the substrate. The detector detects the intensity of the electromagnetic waves scattered or reflected by the substrate with the use of two-dimensionally arranged detection elements, and then outputs a signal. The monitor processes the signal from the detector to acquire a first scatter profile, and measure a positional deviation of the detector in accordance with the first scatter profile. The detector location adjusting unit corrects the positional deviation of the detector in accordance with the measured positional deviation. The measuring unit calculates a surface shape of the periodic structure.

Abstract translation: 根据实施例，测量装置包括台，电磁波施加单元，检测器，监视器，检测器位置调整单元和测量单元。 该载物台在其主表面上支撑包含周期性结构的基底。 电磁波施加单元产生电磁波并将电磁波施加到基板。 检测器利用二维排列的检测元件检测由基板散射或反射的电磁波的强度，然后输出信号。 监视器处理来自检测器的信号以获取第一散射分布，并且根据第一散射分布测量检测器的位置偏差。 检测器位置调整单元根据所测量的位置偏差校正检测器的位置偏差。 测量单元计算周期结构的表面形状。

公开(公告)号：US20130329858A1

公开(公告)日：2013-12-12

申请号：US13912338

申请日：2013-06-07

Applicant: Rigaku Innovative Technologies, Inc.

Inventor： Licai Jiang

IPC: G01N23/201

CPC classification number: G01N23/201 ,  G01N2223/308

Abstract: A system for analyzing a sample is provided. The system includes a beam selection device for selecting between a one-dimensional operation mode for providing a one-dimensional x-ray beam to the sample and a two-dimensional operation mode for providing a two-dimensional x-ray beam to the sample.

Abstract translation: 提供了一种用于分析样品的系统。 该系统包括用于在用于向样本提供一维x射线束的一维操作模式和用于向样本提供二维X射线束的二维操作模式之间进行选择的束选择装置。

公开(公告)号：US20130110421A1

公开(公告)日：2013-05-02

申请号：US13696157

申请日：2011-05-06

Applicant: Kay Lederer

Inventor： Kay Lederer

IPC: G01R31/28 ,  G06F15/00 ,  G01N23/201

CPC classification number: G01R31/28 ,  G01N1/286 ,  G01N23/201 ,  G06F15/00 ,  H01J2237/28 ,  H01J2237/31745 ,  H01J2237/31749 ,  H01L22/12 ,  H01L22/24

Abstract: Performing an analysis of an electronic device sample by measuring a property at a plurality of points of said electronic device sample, and in advance of said analysis subjecting said plurality of points to at least one treatment that increases the difference in said property between at least two elements of said electronic device sample.

Abstract translation: 通过测量所述电子设备样本的多个点处的属性来进行对电子设备样本的分析，并且在所述分析之前，对所述多个点进行至少一个处理，所述处理增加所述属性的差异至少在两个 所述电子设备样品的元件。

公开(公告)号：US08406375B2

公开(公告)日：2013-03-26

申请号：US13142712

申请日：2010-12-28

Applicant: Yigang Yang ,  Tiezhu Li ,  Qinjiar Zhang ,  Yi Zhang ,  Yingkang Jin ,  Qinghao Chen ,  Yuanjing Li ,  Yinong Liu

Inventor： Yigang Yang ,  Tiezhu Li ,  Qinjiar Zhang ,  Yi Zhang ,  Yingkang Jin ,  Qinghao Chen ,  Yuanjing Li ,  Yinong Liu

IPC: G01N23/201

CPC classification number: G01V5/0016 ,  G01N23/046 ,  G01N23/05 ,  G01N2223/419 ,  G01V5/0025

Abstract: The present invention discloses an article inspection device, comprising: an x-ray machine, a collimation unit, a transmission detector array and a scattering detector array. The scattering detector array comprising a plurality of same scattering detector modules arranged in a matrix of i-rows and j-columns. A transmission cross section of the article transmitted by the x-rays is divided into a plurality of same sub-regions arranged in a matrix of i-rows and j-columns. The plurality of scattering detector modules arranged in i-rows and j-columns correspond to the plurality of sub-regions arranged in i-rows and j-columns one by one for detecting pair production effect annihilation photons and Compton-effect scattering photons from the respective sub-regions. Obtaining atomic numbers of the respective sub-regions based on a ratio of the pair production effect annihilation photon count to the Compton-effect scattering photon count, so as to form a three-dimensional image of the article. In addition, the present invention further discloses an article inspection method.

Abstract translation: 本发明公开了一种物品检查装置，包括：x射线机，准直单元，透射检测器阵列和散射检测器阵列。 散射检测器阵列包括以i行和j列的矩阵排列的多个相同的散射检测器模块。 通过X射线透射的物品的透射截面被划分成以i行和j列的矩阵排列的多个相同的子区域。 布置在i行和j列中的多个散射检测器模块对应于一排一列地排列在i行和j列中的多个子区域，用于检测来自该对象的生成效应湮灭光子和康普顿效应散射光子 各分区域。 基于对生产效应湮灭光子计数与康普顿效应散射光子计数的比率，获得各个子区域的原子序数，以形成物品的三维图像。 此外，本发明还公开了一种物品检查方法。

公开(公告)号：US20130012812A1

公开(公告)日：2013-01-10

申请号：US13177402

申请日：2011-07-06

Applicant: Edward J. SEPPI

Inventor： Edward J. SEPPI

IPC: A61B6/00 ,  G01N23/223 ,  G01N23/201

CPC classification number: A61B6/4071 ,  A61B6/032 ,  A61B6/06 ,  A61B6/4078 ,  A61B6/4241 ,  A61B6/4429 ,  A61B6/481 ,  A61B6/483

Abstract: An apparatus to examine a target volume in a patient includes an x-ray source generating a first x-ray beam targeting the target volume, and a detector which is placed at an angle less than 180 degrees relative to a beam path of the first x-ray beam to receive a second x-ray beam generated from the first x-ray beam interacting with the target volume. A method to image a target volume in a patient includes directing a first x-ray beam generated from an x-ray source at the target volume, wherein a second x-ray beam is generated by an interaction of the first x-ray beam with the target volume, detecting the second x-ray beam using a detector that is placed at less than 180 degrees relative to a path of the first x-ray beam, and obtaining spatial and temporal information of the target volume using the detected second x-ray beam.

Abstract translation: 用于检查患者中的目标体积的装置包括产生靶向目标体积的第一X射线束的X射线源和相对于第一x的束路径以小于180度的角度放置的检测器 射线束以接收从与目标体积相互作用的第一x射线束产生的第二x射线束。 用于对患者中的目标体积进行成像的方法包括将从X射线源产生的第一X射线束引导到目标体积，其中第二X射线束由第一x射线束与 使用相对于第一x射线束的路径放置在小于180度的检测器来检测第二X射线束，以及使用检测到的第二x射线束获得目标体积的空间和时间信息， 射线束。