Integrated cooling assemblies including signal redistribution and methods of manufacturing the same

    公开(公告)号:US12191235B2

    公开(公告)日:2025-01-07

    申请号:US18512567

    申请日:2023-11-17

    Abstract: The present disclosure provides for integrated cooling systems including an integrated cooling assembly. The integrated cooling assembly includes a semiconductor device having an active side and a backside opposite the active side. The integrated cooling assembly includes a plurality of stacked and bonded layers that collectively form a cold plate, the cold plate comprising (i) a first side and a second side opposite the first side, the first side having a base surface, a support feature that extends downwardly from the base surface, and sidewalls that extend downwardly from the base surface and surround base surface and the support feature, and (ii) a first interconnect vertically disposed through the support feature, where the first interconnect is electrically coupled to the semiconductor device through direct hybrid bonds formed between the cold plate and the semiconductor device.

    METHODS AND STRUCTURES FOR LOW TEMPERATURE HYBRID BONDING

    公开(公告)号:US20250006674A1

    公开(公告)日:2025-01-02

    申请号:US18497585

    申请日:2023-10-30

    Abstract: A semiconductor element is provided with a micro-structured metal layer over conductive features of a hybrid bonding surface. The micro-structured metal layer comprises fine metal grain microstructure, such as nanograins. The micro-structured metal layer can be formed over the conductive features by providing a metal oxide and reducing the metal oxide to metal. The micro-structured metal layer can be formed selectively if the metal oxide is formed by oxidation. When directly bonded to another element, the micro-structured metal layer forming strong bonds at the bonding interface can substantially reduce annealing temperature.

    HYBRID BONDING METHODS AND DEVICE ASSEMBLIES FORMED USING THE SAME

    公开(公告)号:US20250006672A1

    公开(公告)日:2025-01-02

    申请号:US18379053

    申请日:2023-10-11

    Abstract: A first conductive feature of a first substrate is bonded to a second conductive feature of a second substrate. The first conductive feature is formed by depositing a conductive base layer on the first substrate, the first substrate having an opening formed therein, recessing the conductive base layer in the opening, and depositing a conductive surface layer on the recessed conductive base layer. Hybrid bonding of the first substrate to the second substrate is performed without use of an intervening adhesive to connect the first conductive feature and the second conductive feature.

    EMBEDDED CHIPLETS WITH BACKSIDE POWER DELIVERY NETWORK

    公开(公告)号:US20250006632A1

    公开(公告)日:2025-01-02

    申请号:US18401082

    申请日:2023-12-29

    Abstract: An assembly may include a base element comprising a base substrate having a frontside with active circuitry and a backside opposite the frontside, a first bonding layer disposed on the frontside of the base substrate and including a signal pad to convey an electrical signal to the active circuitry. The assembly may further include a first functional element comprising a first semiconductor substrate having a frontside with active circuitry and a backside opposite the frontside, a second bonding layer disposed on the frontside of the first semiconductor substrate, and a back surface of the first functional element having a first contact feature to connect to power or ground, wherein the first bonding layer is hybrid bonded to the second bonding layer.

    Wafer-level bonding of obstructive elements

    公开(公告)号:US12176303B2

    公开(公告)日:2024-12-24

    申请号:US18346396

    申请日:2023-07-03

    Abstract: A bonded structure is disclosed. The bonded structure can include a semiconductor element comprising active circuitry. The bonded structure can include an obstructive element bonded to the semiconductor element along a bond interface, the obstructive element including an obstructive material disposed over the active circuitry, the obstructive material configured to obstruct external access to the active circuitry. The bonded element can include an artifact structure indicative of a wafer-level bond in which the semiconductor element and the obstructive element formed part of respective wafers directly bonded prior to singulation.

    Integrated cooling assembly including coolant channel on the backside semiconductor device

    公开(公告)号:US12176263B2

    公开(公告)日:2024-12-24

    申请号:US18620753

    申请日:2024-03-28

    Abstract: The present disclosure provides for integrated cooling systems including backside power delivery and methods of manufacturing the same. An integrated cooling assembly may include a device and a cold plate. The cold plate has a first side and an opposite second side, the first side having a recessed surface, sidewalls around the recessed surface that extend downwardly therefrom to define a cavity, and a plurality of support features disposed in the cavity. The first side of the cold plate is attached to a backside of the device to define a coolant channel therebetween. The cold plate includes a substrate, a dielectric layer disposed on a first surface of the substrate, a first conductive layer disposed between the first surface and the dielectric layer, a second conductive layer disposed on a second surface of the substrate, and thru-substrate interconnects connecting the first conductive layer to the second conductive layer.

    Bonded optical devices
    57.
    发明授权

    公开(公告)号:US12153222B2

    公开(公告)日:2024-11-26

    申请号:US18360193

    申请日:2023-07-27

    Abstract: A bonded optical device is disclosed. The bonded optical device can include a first optical element, a second optical element, and an optical pathway. The first optical element has a first array of optical emitters configured to emit light of a first color. The first optical element is bonded to at least one processor element, the at least one processor element including active circuitry configured to control operation of the first optical element. The second optical element has a second array of optical emitters configured to emit light of a second color different from the first color. The second optical element is bonded to the at least one processor element. The optical pathway is optically coupled with the first and second optical elements. The optical pathway is configured to transmit a superposition of light from the first and second optical emitters to an optical output to be viewed by users.

    INTEGRATED COOLING ASSEMBLIES INCLUDING SIGNAL REDISTRIBUTION AND METHODS OF MANUFACTURING THE SAME

    公开(公告)号:US20240387323A1

    公开(公告)日:2024-11-21

    申请号:US18512547

    申请日:2023-11-17

    Abstract: The present disclosure provides for integrated cooling systems including an integrated cooling assembly. The integrated cooling assembly includes a semiconductor device having an active side and a backside opposite the active side. The integrated cooling assembly includes a plurality of stacked and bonded layers that collectively form a cold plate, the cold plate comprising (i) a first side and a second side opposite the first side, the first side having a base surface, a support feature that extends downwardly from the base surface, and sidewalls that extend downwardly from the base surface and surround base surface and the support feature, and (ii) a first interconnect vertically disposed through the support feature, where the first interconnect is electrically coupled to the semiconductor device through direct hybrid bonds formed between the cold plate and the semiconductor device.

    INTERCONNECT STRUCTURES
    60.
    发明申请

    公开(公告)号:US20240379539A1

    公开(公告)日:2024-11-14

    申请号:US18782629

    申请日:2024-07-24

    Abstract: Representative techniques and devices, including process steps may be employed to mitigate undesired dishing in conductive interconnect structures and erosion of dielectric bonding surfaces. For example, an embedded layer may be added to the dished or eroded surface to eliminate unwanted dishing or voids and to form a planar bonding surface. Additional techniques and devices, including process steps may be employed to form desired openings in conductive interconnect structures, where the openings can have a predetermined or desired volume relative to the volume of conductive material of the interconnect structures. Each of these techniques, devices, and processes can provide for the use of larger diameter, larger volume, or mixed-sized conductive interconnect structures at the bonding surface of bonded dies and wafers.

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